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公开(公告)号:GB2192095A
公开(公告)日:1987-12-31
申请号:GB8711344
申请日:1987-05-14
Applicant: CANON KK
Inventor: MIYAZAWA SEIICHI , HARA TOSHITAMI , NOJIRI HIDETOSHI , SEKIGUCHI YOSHINOBU , HASEGAWA MITSUTOSHI , IKEDA SOTOMITSU
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公开(公告)号:DE69330845T2
公开(公告)日:2002-04-04
申请号:DE69330845
申请日:1993-03-25
Applicant: CANON KK
Inventor: MIYAZAWA SEIICHI , MIZUTANI NATSUHIKO
IPC: H01L21/20 , H01L21/324 , H01L33/00 , H01S5/02 , H01S5/34 , H01S5/343 , H01L21/335 , H01L21/203
Abstract: In a method for producing a compound semiconductor device such as laser diodes, FET and HEMT, compound semiconductor is grown at a substrate temperature not greater than 500 DEG C to form a semiconductor layer on a substrate of the semiconductor device. Then, an appropriate treatment, such as heat-treatment in reducing atmosphere, current flow treatment and hydrogen plasma treatment, is conducted to reduce crystal defects in the semiconductor layer attributable to the crystal growth at the low substrate temperature not greater than 500 DEG C.
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公开(公告)号:FR2582154B1
公开(公告)日:1989-03-17
申请号:FR8516920
申请日:1985-11-15
Applicant: CANON KK
Inventor: HARA TOSHITAMI , SHIMIZU AKIRA , SEKIGUCHI YOSHINOBU , MIYAZAWA SEIICHI , NOJIRI HIDETOSHI , HAKAMADA ISAO
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公开(公告)号:GB2169134B
公开(公告)日:1988-11-16
申请号:GB8528248
申请日:1985-11-15
Applicant: CANON KK
Inventor: HARA TOSHITAMI , SHIMIZU AKIRA , SEKIGUCHI YOSHINOBU , MIYAZAWA SEIICHI , NOJIRI HIDETOSHI , HAKAMADA ISAO
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公开(公告)号:GB2170044A
公开(公告)日:1986-07-23
申请号:GB8531215
申请日:1985-12-18
Applicant: CANON KK
Inventor: HARA TOSHITAMI , SEKIGUCHI YOSHINOBU , MIYAZAWA SEIICHI , NOJIRI HIDETOSHI , SHIMIZU AKIRA , HAKAMADA ISAO
Abstract: There is disclosed a semiconductor laser having a super lattice structure near an active layer, in which the super lattice structure consists of at least two types of materials which have different bandgaps, the materials are regularly and alternately arranged, and thickness of adjacent layers of the materials change such that a ratio of the thicknesses changes within the super lattice structure toward an active layer.
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公开(公告)号:DE69323127T2
公开(公告)日:1999-07-22
申请号:DE69323127
申请日:1993-08-09
Applicant: CANON KK
Inventor: MIYAZAWA SEIICHI , OHTSUKA MITSURU , MIZUTANI NATSUHIKO
IPC: H01L29/12 , H01L29/775 , H01L33/16 , H01S5/02 , H01S5/10 , H01S5/12 , H01S5/183 , H01S5/187 , H01S5/30 , H01S5/32 , H01S5/34 , H01S3/085 , H01S3/19 , H01L33/00
Abstract: A semiconductor device has a substrate composed of a semiconductor which has one of sphalerite and diamond crystal structures. The substrate has a plane orientation inclined at 0.5 DEG to 15 DEG with respect to one of {111} and {110} planes indicated by Miller indices. A first semiconductor layer is formed on the substrate. The first semiconductor layer has a sawtooth-shaped first periodic structure consisting of one of the {111} and {110} planes indicated by the Miller indices and at least one plane indicated by another index. A second semiconductor layer is formed on the first semiconductor layer. The second semiconductor layer has a second periodic structure having a phase shifted from a phase of the first periodic structure. An embodiment of the semiconductor device is a distributed feedback diode laser incorporating a quantum-well or quantum-wire structure.
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公开(公告)号:DE69323127D1
公开(公告)日:1999-03-04
申请号:DE69323127
申请日:1993-08-09
Applicant: CANON KK
Inventor: MIYAZAWA SEIICHI , OHTSUKA MITSURU , MIZUTANI NATSUHIKO
IPC: H01L29/12 , H01L29/775 , H01L33/16 , H01S5/02 , H01S5/10 , H01S5/12 , H01S5/183 , H01S5/187 , H01S5/30 , H01S5/32 , H01S5/34 , H01S3/085 , H01S3/19 , H01L33/00
Abstract: A semiconductor device has a substrate composed of a semiconductor which has one of sphalerite and diamond crystal structures. The substrate has a plane orientation inclined at 0.5 DEG to 15 DEG with respect to one of {111} and {110} planes indicated by Miller indices. A first semiconductor layer is formed on the substrate. The first semiconductor layer has a sawtooth-shaped first periodic structure consisting of one of the {111} and {110} planes indicated by the Miller indices and at least one plane indicated by another index. A second semiconductor layer is formed on the first semiconductor layer. The second semiconductor layer has a second periodic structure having a phase shifted from a phase of the first periodic structure. An embodiment of the semiconductor device is a distributed feedback diode laser incorporating a quantum-well or quantum-wire structure.
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公开(公告)号:DE3716191A1
公开(公告)日:1987-11-19
申请号:DE3716191
申请日:1987-05-14
Applicant: CANON KK
Inventor: MIYAZAWA SEIICHI , HARA TOSHITAMI , NOJIRI HIDETOSHI , SEKIGUCHI YOSHINOBU , HASEGAWA MITSUTOSHI , IKEDA SOTOMITSU
Abstract: A semiconductor laser array 21 is disclosed, comprising plural semiconductor laser elements each emitting light from two end faces (26,27) constituting resonant planes and monolithically formed on a semiconductor substrate, in which the mutual angle of the beams emerging from one end face of semiconductor lasers is different from that from the other end face and in which said beam angle is selected as a non-zero finite value at least at one end. This may be achieved where the current injection area of each laser element is limited to a stripe-shaped area 24,25 by making stripe-shaped areas of curved or bent form.
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公开(公告)号:FR2582154A1
公开(公告)日:1986-11-21
申请号:FR8516920
申请日:1985-11-15
Applicant: CANON KK
Inventor: HARA TOSHITAMI , SHIMIZU AKIRA , SEKIGUCHI YOSHINOBU , MIYAZAWA SEIICHI , NOJIRI HIDETOSHI , HAKAMADA ISAO
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公开(公告)号:DE3605130A1
公开(公告)日:1986-08-21
申请号:DE3605130
申请日:1986-02-18
Applicant: CANON KK
Inventor: SHIMIZU AKIRA , HARA TOSHITAMI , NOJIRI HIDETOSHI , HAKAMADA ISAO , MIYAZAWA SEIICHI , SEKIGUCHI YOSHINOBU
IPC: H01L29/80 , H01L21/331 , H01L29/15 , H01L29/201 , H01L29/73 , H01L29/737 , H01L29/812 , H01S5/00 , H01S5/343 , H01L29/267 , H01L29/72 , H01S3/19 , H01L29/76
Abstract: A semiconductor device having a plurality of laminated semiconductor layers in which a current flows in the direction of lamination. A superlattice layer is formed in at least one of the layers and the potential of the quantum well of the superlattice layer is lower than the potential of the semiconductor layer in which the superlattice layer is formed. The potential of the barrier of the superlattice layer is higher than the potential of the semiconductor layer in which said superlattice layer is formed.
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