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    BONDING COLOUR SEPARATION FILTERS
    1.
    发明专利
    BONDING COLOUR SEPARATION FILTERS 未知

    公开(公告)号：GB2130789A

    公开(公告)日：1984-06-06

    申请号：GB8327167

    申请日：1983-10-11

    Applicant: CANON KK

    Inventor： KAMIO MASARU ,  IIJIMA SHIGEHARU ,  YOSHIHARA SATOSHI ,  OGURA YASUTSUGU

    IPC: C09J5/00 ,  H01L31/18 ,  H01L31/02

    Abstract: A method for bonding of a color separation filter comprises placing a color separation filter through an intermediary UV-ray curable type bonding agent on a solid state image pick-up device, effecting registration between the solid state image pick-up device and the color separation filter, then applying irradiation of UV-ray at a luminous intensity of 30 mW/cm2 or higher from the side of the color separation filter thereby to subject said bonding agent to partial curing, and thereafter applying UV-ray irradiation at a luminous intensity of 5 mW/cm2 or lower from the side of the color separation filter thereby to subject said bonding agent to full curing.

    BONDING COLOUR SEPARATION FILTERS
    2.
    发明专利
    BONDING COLOUR SEPARATION FILTERS 未知

    公开(公告)号：GB2130789B

    公开(公告)日：1986-05-14

    申请号：GB8327167

    申请日：1983-10-11

    Applicant: CANON KK

    Inventor： KAMIO MASARU ,  IIJIMA SHIGEHARU ,  YOSHIHARA SATOSHI ,  OGURA YASUTSUGU

    IPC: C09J5/00 ,  H01L31/18 ,  H01L31/02

    Abstract: A method for bonding of a color separation filter comprises placing a color separation filter through an intermediary UV-ray curable type bonding agent on a solid state image pick-up device, effecting registration between the solid state image pick-up device and the color separation filter, then applying irradiation of UV-ray at a luminous intensity of 30 mW/cm2 or higher from the side of the color separation filter thereby to subject said bonding agent to partial curing, and thereafter applying UV-ray irradiation at a luminous intensity of 5 mW/cm2 or lower from the side of the color separation filter thereby to subject said bonding agent to full curing.

    3.
    发明专利
    未知

    公开(公告)号：DE3338003A1

    公开(公告)日：1984-04-26

    申请号：DE3338003

    申请日：1983-10-19

    Applicant: CANON KK

    Inventor： KAMIO MASAO ,  IIJIMA SHIGEHARU ,  YOSHIHARA SATOSHI ,  OGURA YASUTSUGU

    IPC: C09J5/00 ,  H01L21/98 ,  H01L27/14

    Abstract: A method for bonding of a color separation filter comprises placing a color separation filter through an intermediary UV-ray curable type bonding agent on a solid state image pick-up device, effecting registration between the solid state image pick-up device and the color separation filter, then applying irradiation of UV-ray at a luminous intensity of 30 mW/cm2 or higher from the side of the color separation filter thereby to subject said bonding agent to partial curing, and thereafter applying UV-ray irradiation at a luminous intensity of 5 mW/cm2 or lower from the side of the color separation filter thereby to subject said bonding agent to full curing.

    PRODUCTION OF FINE COLOR FILTER
    5.
    发明专利
    PRODUCTION OF FINE COLOR FILTER 失效

    公开(公告)号：JPS60114807A

    公开(公告)日：1985-06-21

    申请号：JP22199383

    申请日：1983-11-28

    Applicant: CANON KK

    Inventor： OGURA YASUTSUGU ,  YOSHIHARA SATOSHI ,  SASAMORI EIZOU ,  KAMIO MASARU

    IPC: G02B5/20 ,  H01L27/14 ,  H04N9/04

    Abstract: PURPOSE:To simplify the process of production and to reduce delicate work by using one or more coloring matter layers already formed on a substrate as the substitute of an exposure mask and exposing a photoresist film from the side on which the color layer is not formed on the transparent substrate. CONSTITUTION:A positive type photoresist layer 4 is formed on one or more coloring matter films formed on the substrate 1. After being dried, the resist layer is prebaked under a proper temperature condition. Subsequently, the resist film is exposed to ultraviolet ray, far ultraviolet rays, or the like from the side on which the resist film 4 is not formed on the transparent substrate 1. The resist film on the exposed part is selectively dissolved by using a developing solution to obtain a resist pattern 4' leaving the resist only on the upper part of the coloring matter layer. Then, the final coloring matter layer 6 is evaporated on the substrate 1. Finally, the resist pattern 4' is removed by the resist developing solution or the like, so that the unnecessary coloring matter layer is also removed together with the resist pattern.

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