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公开(公告)号：JPH11173946A
公开(公告)日：1999-07-02
申请号：JP33753797
申请日：1997-12-08
Applicant: CANON KK
Inventor： SUZUKI TAKASHI , OSAKI YOSHINORI
Abstract: PROBLEM TO BE SOLVED: To improve the accuracy for measuring optical characteristics and facilitate confirmation of the position of a measurement area. SOLUTION: Since a filter means 57 having a small hole 57b is arranged between a hemispherical glass 2 and a light detector 11, a luminous flux B2 reflected at a specific interface is detected by the light detector 11, and a luminous flux B4 reflected at an interface other than the specific interface is not detected by the light detector 11. The measurement accuracy by the light detector 11 is accordingly improved. Since a hemispherical glass member is not arranged above a liquid crystal element 22, not line conventional examples, the position of a measurement area can be easily confirmed by a microscope 58.
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公开(公告)号：JPH10206317A
公开(公告)日：1998-08-07
申请号：JP697997
申请日：1997-01-17
Applicant: CANON KK
Inventor： OSAKI YOSHINORI
Abstract: PROBLEM TO BE SOLVED: To calculate a large pretilt angle. SOLUTION: The relationship between a pretilt angle and light intensity is previously found. First of all, in a condition where the polarizing direction of a polarizer 12 and an analyzer 13 is not inclined, an He-Ne laser device 10 is started, and light intensity is measured by a light detector 11. When the pretilt angle is large and can not be calculated, a polarizer tilting device 32 and an analyzer tilting device 33 are started, and the polarizing direction of the polarizer 12 and the analyzer 13 is inclined. The He-Ne laser is restarted, and light intensity is measured by the light detector 11. Next, a pretilt angle is calculated by the relationship with the pretilt angle on the basis of the measured light intensity. Therefore, a large pretilt angle can be calculated.
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公开(公告)号：JPH09105704A
公开(公告)日：1997-04-22
申请号：JP1338896
申请日：1996-01-29
Applicant: CANON KK
Inventor： OSAKI YOSHINORI , SUZUKI TAKASHI
Abstract: PROBLEM TO BE SOLVED: To precisely measure optical anisotropy of a body to be tested in a desired micro area. SOLUTION: A bundle of incident rays (a bundle of horizontal rays) A radiated from a He-Ne laser device 1 is linearly polarized by means of a polarizer 2 so as to be converged in the vicinity of a measurement area of a liquid crystal cell 92 serving as a body to be tested placed on a flat face part 3a in a spherical segment glass 3 via a refractive index matching liquid 91 by means of an incident optical system (convex lens) 101, so that optical anisotropy in a micro area can be precisely measured.
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公开(公告)号：JP2002093691A
公开(公告)日：2002-03-29
申请号：JP2000284616
申请日：2000-09-20
Applicant: CANON KK
Inventor： OSAKI YOSHINORI
Abstract: PROBLEM TO BE SOLVED: To perform exposure in a state of superior imaging performance by calculating the imaging performance of a projection optical system with a simple constitution, without having to developer measure SEM. SOLUTION: The aligner, which projects a transfer pattern on an original plate on a substrate arranged on a movable stage through the projection optical system for exposing the substrate, is provided with a step mark which is arranged on the movable stage and composed of steps, an image-capturing means which images the step mark on an image pickup element with exposure wavelength through the projection optical system, and a data processing means which calculates the imaging performance of the projection optical system, according to image data obtained by the image-capturing means.
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公开(公告)号：JPH09325087A
公开(公告)日：1997-12-16
申请号：JP14329896
申请日：1996-06-05
Applicant: CANON KK
Inventor： OSAKI YOSHINORI
Abstract: PROBLEM TO BE SOLVED: To accurately measure optical anisotropy by suppressing leakage of refractive index matching liquid. SOLUTION: By detecting a measurement light flux B which has transmitted a sample A, optical anisotropy is measured. Here, between hemisphere glasses 21 and 21 and the sample A, a refractive index matching liquid 22 is filled, and the viscosity of the liquid is 1000cm Stokes or more. Therefore, even when the hemisphere glasses 21 and 21 are rotated, etc., the leakage of the refractive index matching liquid 22 is suppressed.
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Patent Agency Ranking
公开(公告)号：JPH09190250A
公开(公告)日：1997-07-22
申请号：JP187596
申请日：1996-01-10
Applicant: CANON KK
Inventor： OSAKI YOSHINORI
IPC: G06F3/02
Abstract: PROBLEM TO BE SOLVED: To improve operability on the key stroke of a keyboard inputting information to an information unit with the depressing operation of plural keys. SOLUTION: In the main body frame 16 of the keyboard, a key stroke adjusting substrate 1 is horizontally arranged below keys 5, and it is provided so that it can slide along a guide 2 in a vertical direction. It is energized in a lower direction with an adjusting spring 3 and a leg part 1a is pressed to the upper end of an adjusting screw 4 screwed to the screw groove of a hole 18a on a base 18. The length of moving quantity from the initial position of the key 5 at the time of a depressing operation to a position where the key abuts on the substrate 1 and movement to the lower direction is inhibited, namely, the key stroke can be adjusted by turning the screw 4 and moving the substrate 1 in the vertical direction with the screw 4. Thus, a user can desirably and suitably adjust the key stroke and operability can be improved.
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公开(公告)号：JP2001230193A
公开(公告)日：2001-08-24
申请号：JP2000041676
申请日：2000-02-18
Applicant: CANON KK
Inventor： SASAKI AKIRA , OSAKI YOSHINORI
IPC: G03F7/20 , G03F7/207 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To obtain a wave front aberration measuring method and a projection aligner which can measure precisely the wave front aberration at a high speed for grasping imagery performance of a projection optical system which is changed by an exposing load and environmental change in the projection aligner. SOLUTION: In a wave front measuring method of a projection optical system of a projection aligner wherein a pattern formed on a first object is image- formed on a second object via the projection optical system and exposed to a light, an optical intensity detecting means for measuring optical intensity distribution of a specified pattern on a surface of the first object via the projection optical system, a wave front aberration operating means for the calculating wave front aberration of the projection optical system by using the optical intensity distribution detected by the optical intensity detecting means, and a control means which measures the wave front aberration of the projection optical system in the case that the exposing load and/or the environmental change or the like are measured and these values exceed constant values, are used.
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公开(公告)号：JP2000195782A
公开(公告)日：2000-07-14
申请号：JP37370698
申请日：1998-12-28
Applicant: CANON KK
Inventor： OSAKI YOSHINORI
IPC: H01L21/027 , G02B13/24 , G03F7/20 , G03F7/207
Abstract: PROBLEM TO BE SOLVED: To enable wave front aberration to be more precisely calculated by measuring with double sensitivity symmetrical aberrations such as spherical aberration and astigmatism among the components of the wave front aberration of a projection optical system. SOLUTION: An aligner is constructed to transfer the image of a mask to a photosensitive material etc., arranged on a stage 4 by means of a light through a projection optical system 1. In this case, a reflecting section 6 is provided at the stage 4. The wave front aberration of the projection optical system can be obtained based on the light intensity distribution of the image of the mask formed by the light which passes through the projection optical system and is reflected by the reflecting section 6 and again passes through the projection optical system.
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公开(公告)号：JPH1123225A
公开(公告)日：1999-01-29
申请号：JP13113298
申请日：1998-04-25
Applicant: CANON KK
Inventor： HASEGAWA MASANORI , OSAKI YOSHINORI , YOSHII MINORU
Abstract: PROBLEM TO BE SOLVED: To obtain an inspection device by which position information or the like on the direction of an optical axis on the surface of a wafer is detected with high accuracy and by which a high-integration-degree device can be manufactured easily by a method wherein a pattern which is formed by a pattern generator is projected on an object face from an oblique direction. SOLUTION: In a projection optical system 23, a pattern which is formed by a pattern generator is projected on an object face from an oblique direction, and a pattern image is formed on the object face. In a light-receiving optical system, a light-receiving element detects light from the pattern image. That is to say, by using respective face detecting devices 1 to 5, 11 to 16, 19, face-position information on a wafer 6 is detected. Thereby, the height in the direction of the optical axis of the projection optical system 23 in the face position of the wafer 6 is set to a conjugate relationship with a reticle 21 regarding the projection optical system 23. Then, a stage 10 is driven and controlled by a driver 25 in such a way that the wafer 6 is situated in the best image formation face of the projection optical system 23. Thereby, position information and inclination information on the direction of an optical axis on the surface of the wafer 6 are detected with high accuracy, and the wafer 6 can be situated in the image formation position of the projection optical system 23.
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公开(公告)号：JPH1068673A
公开(公告)日：1998-03-10
申请号：JP14828397
申请日：1997-06-05
Applicant: CANON KK
Inventor： OSAKI YOSHINORI , SUZUKI TAKASHI
Abstract: PROBLEM TO BE SOLVED: To minimize a measuring region in a method for measuring optical anisotropy. SOLUTION: In an apparatus for measuring the optical anisotropy of specimen 22, which irradiates a measuring light flux A and detects the whole reflected light to measure the optical anisotropy of the specimen 22, a portion of the light flux A is irradiated to the specimen at an angle smaller than an critical angle and is constituted to transmit the specimen 22, so that a region producing the total reflection in the light flux irradiating region at the specimen interface will approach a circle to thereby minimize the measuring region. Thus, for example, fine orientation defects in a liquid crystal can be detected. Also, the optical anisotropy except for that of the interface of the specimen 22 can be measured.
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