公开(公告)号：AT196018T

公开(公告)日：2000-09-15

申请号：AT93304986

申请日：1993-06-25

Applicant: CANON KK

Inventor： SHIOZAWA TAKAHISA

IPC: G03F7/20 ,  H01L21/027

Abstract: The illumination device includes first and second optical integrators (6,7) disposed along an optical axis and each having lens elements arrayed in a direction intersecting the optical axis; a condensing optical system for collecting light which has passed through the first and second optical integrator, to form a secondary light source; and a mechanism (20) for shifting the second optical integrator relative to the first optical integrator in a direction intersecting the optical axis. The shifting mechanism is operated to switch the illumination device between normal illumination mode (Figure 2) and oblique illumination mode (Figure 3) according to the orientation and linewidth of the circuit pattern of the retide (14).

公开(公告)号：DE69625093T2

公开(公告)日：2003-07-31

申请号：DE69625093

申请日：1996-09-27

Applicant: CANON KK

Inventor： TAKAHASHI KAZUHIRO ,  SHIOZAWA TAKAHISA

IPC: G03F7/20

Abstract: An exposure apparatus includes an illumination optical system (100), a first light receiving system (5,12) for receiving a portion of exposure light from the illumination optical system, a movable reticle stage (9) having a transmitting portion for transmitting exposure light, and a second light receiving system (13) for receiving the exposure light transmitted through the transmitting portion.

公开(公告)号：DE69625093D1

公开(公告)日：2003-01-09

申请号：DE69625093

申请日：1996-09-27

Applicant: CANON KK

Inventor： TAKAHASHI KAZUHIRO ,  SHIOZAWA TAKAHISA

IPC: G03F7/20

Abstract: An exposure apparatus includes an illumination optical system (100), a first light receiving system (5,12) for receiving a portion of exposure light from the illumination optical system, a movable reticle stage (9) having a transmitting portion for transmitting exposure light, and a second light receiving system (13) for receiving the exposure light transmitted through the transmitting portion.

公开(公告)号：SG75793A1

公开(公告)日：2000-10-24

申请号：SG1996009372

申请日：1994-06-17

Applicant: CANON KK

Inventor： SHIOZAWA TAKAHISA

IPC: G03F7/20

公开(公告)号：DE69326630D1

公开(公告)日：1999-11-11

申请号：DE69326630

申请日：1993-03-31

Applicant: CANON KK

Inventor： SHIOZAWA TAKAHISA ,  MURAKI MASATO ,  ISHII HIROYUKI ,  HAYATA SHIGERU

IPC: G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE69412548T2

公开(公告)日：1999-01-21

申请号：DE69412548

申请日：1994-06-17

Applicant: CANON KK

Inventor： SHIOZAWA TAKAHISA

IPC: G03F7/20 ,  H01L21/027

Abstract: An exposure apparatus is disclosed for exposing a substrate with pulses of light supplied sequentially. The apparatus includes a detector (12) for detecting the light quantity of each pulse, and a controller (103) for controlling the timing of exposure of the substrate (11) with a pulse to be emitted, on the basis of the light quantity provided by at least one pulse preceding the pulse to be emitted.

公开(公告)号：DE69621547T2

公开(公告)日：2003-01-16

申请号：DE69621547

申请日：1996-09-27

Applicant: CANON KK

Inventor： TAKAHASHI KAZUHIRO ,  SHIOZAWA TAKAHISA

IPC: G03F7/20

Abstract: An exposure apparatus includes an illumination optical system (100), a first light receiving system (5,12) for receiving a portion of exposure light from the illumination optical system, a movable reticle stage (9) having a transmitting portion for transmitting exposure light, and a second light receiving system (13) for receiving the exposure light transmitted through the transmitting portion.

公开(公告)号：DE69621547D1

公开(公告)日：2002-07-11

申请号：DE69621547

申请日：1996-09-27

Applicant: CANON KK

Inventor： TAKAHASHI KAZUHIRO ,  SHIOZAWA TAKAHISA

IPC: G03F7/20

Abstract: An exposure apparatus includes an illumination optical system (100), a first light receiving system (5,12) for receiving a portion of exposure light from the illumination optical system, a movable reticle stage (9) having a transmitting portion for transmitting exposure light, and a second light receiving system (13) for receiving the exposure light transmitted through the transmitting portion.

公开(公告)号：DE69329317D1

公开(公告)日：2000-10-05

申请号：DE69329317

申请日：1993-06-25

Applicant: CANON KK

Inventor： SHIOZAWA TAKAHISA

IPC: G03F7/20 ,  H01L21/027

Abstract: The illumination device includes first and second optical integrators (6,7) disposed along an optical axis and each having lens elements arrayed in a direction intersecting the optical axis; a condensing optical system for collecting light which has passed through the first and second optical integrator, to form a secondary light source; and a mechanism (20) for shifting the second optical integrator relative to the first optical integrator in a direction intersecting the optical axis. The shifting mechanism is operated to switch the illumination device between normal illumination mode (Figure 2) and oblique illumination mode (Figure 3) according to the orientation and linewidth of the circuit pattern of the retide (14).

公开(公告)号：DE69412548D1

公开(公告)日：1998-09-24

申请号：DE69412548

申请日：1994-06-17

Applicant: CANON KK

Inventor： SHIOZAWA TAKAHISA

IPC: G03F7/20 ,  H01L21/027

Abstract: An exposure apparatus is disclosed for exposing a substrate with pulses of light supplied sequentially. The apparatus includes a detector (12) for detecting the light quantity of each pulse, and a controller (103) for controlling the timing of exposure of the substrate (11) with a pulse to be emitted, on the basis of the light quantity provided by at least one pulse preceding the pulse to be emitted.