公开(公告)号：DE68925604D1

公开(公告)日：1996-03-21

申请号：DE68925604

申请日：1989-09-04

Applicant: CANON KK

Inventor： UDA KOJI ,  TANAKA YUTAKA ,  MORI TETSUZO ,  SHIMODA ISAMU ,  UZAWA SCHUNICHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

公开(公告)号：DE68925604T2

公开(公告)日：1996-07-11

申请号：DE68925604

申请日：1989-09-04

Applicant: CANON KK

Inventor： UDA KOJI ,  TANAKA YUTAKA ,  MORI TETSUZO ,  SHIMODA ISAMU ,  UZAWA SCHUNICHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.