公开(公告)号：KR20180067718A

公开(公告)日：2018-06-20

申请号：KR20187016244

申请日：2014-09-05

Applicant: CANON KK

Inventor： ITO TOSHIKI ,  HONMA TAKESHI ,  YONEZAWA SHIORI ,  KAWASAKI YOUJI

IPC: G03F7/00 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031

CPC classification number: G03F7/031 ,  C08F222/1006 ,  C08F2222/1013 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/029

Abstract: 막의제조방법은기판상에광경화성조성물을배치하는배치단계; 상기광경화성조성물과몰드를서로접촉시키는몰드접촉단계; 상기광경화성조성물에광을조사하여경화물을형성하는광조사단계; 및상기경화물과상기몰드를서로분리시키는몰드분리단계를포함하며, 상기광조사단계전에, 상기몰드와상기기판을서로위치정렬시키는위치정렬단계를추가로포함하고, 상기광경화성조성물은성분 (A)로서제공되는중합성화합물및 성분 (B)로서제공되는광중합개시제를적어도함유하고, 조도 0.12 mW/cm및노광시간 11.0초의조건하에노광시켰을때에, 상기중합성화합물은 50% 이상의중합전환율을갖는다.

公开(公告)号：SG11201609356RA

公开(公告)日：2016-12-29

申请号：SG11201609356R

申请日：2015-04-28

Applicant: CANON KK

Inventor： KATO JUN ,  KAWASAKI YOUJI ,  YONEZAWA SHIORI ,  ITO TOSHIKI

IPC: B29C59/02 ,  C08F2/50 ,  H01L21/027 ,  H01L21/3065

Abstract: wherein Er1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er2 denotes the internal reduced modulus (GPa) of the cured product.

公开(公告)号：SG11201700447VA

公开(公告)日：2017-02-27

申请号：SG11201700447V

申请日：2015-07-22

Applicant: CANON KK

Inventor： ITO TOSHIKI ,  HONMA TAKESHI ,  YONEZAWA SHIORI ,  OTANI TOMONORI ,  IWASHITA KAZUMI

IPC: C08F20/20 ,  C08F2/46 ,  H01L21/027 ,  H01L21/3065

Abstract: A photocurable composition contains a polymerizable compound; and a photopolymerization initiator, in which the photocurable composition contains a compound represented by General Formula (1) shown below as the polymerizable compound, and in which, in General Formula (1), Ar represents a monovalent aromatic group which may have a substituent, R1 represents an alkyl group which may have a substituent or a hydrogen atom, R2 represents an alkyl group having (m + n) valences which may have a substituent, m is an integer of 2 or more, and n is an integer of 1 or more.

公开(公告)号：SG11201701196SA

公开(公告)日：2017-03-30

申请号：SG11201701196S

申请日：2015-08-18

Applicant: CANON KK

Inventor： ITO TOSHIKI ,  HONMA TAKESHI ,  YONEZAWA SHIORI

IPC: C08F2/44 ,  C08F2/50 ,  H01L21/027

Abstract: A photocurable composition contains a polymerizable compound (A) satisfying OA=NA/(NC,A−NO,A), wherein NA, NC,A and NO,A represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in (A); and a non-polymerizable component (E) containing at least one compound (X) including a photopolymerization initiator (B), in a proportion of 10% to 50% relative to the total weight of (A) and (E). The component (E) has a weight average molecular weight of 250 or less. The compound (X) satisfies OX=NX/(NC,X−NO,X). NX, NC,X and NO,X represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in the corresponding compound (X). The composition satisfies: OA−OE>1.00; and OAE

公开(公告)号：SG11201606713QA

公开(公告)日：2016-09-29

申请号：SG11201606713Q

申请日：2015-02-10

Applicant: CANON KK

Inventor： HONMA TAKESHI ,  ITO TOSHIKI ,  YONEZAWA SHIORI ,  KAWASAKI YOUJI ,  IIMURA AKIKO

IPC: C08F2/48 ,  C08F20/10 ,  H01L21/027

公开(公告)号：EP3010943A4

公开(公告)日：2017-04-26

申请号：EP14840642

申请日：2014-08-27

Applicant: CANON KK

Inventor： KITAGAWA KENJI ,  ITO TOSHIKI ,  YONEZAWA SHIORI ,  KAWASAKI YOUJI

IPC: C08F2/44 ,  H05K3/28

CPC classification number: C08K5/0008 ,  B29C43/02 ,  B29K2105/0002 ,  B29L2011/00 ,  B29L2031/34 ,  C08F2/44 ,  C08F2/48 ,  C08J5/18 ,  C08J2347/00 ,  C08K5/06 ,  G03F7/0002 ,  G03F7/027 ,  C08F2222/1013 ,  C08F2220/185 ,  C08F2220/1875

公开(公告)号：EP3172247A4

公开(公告)日：2018-03-21

申请号：EP15824327

申请日：2015-07-22

Applicant: CANON KK

Inventor： ITO TOSHIKI ,  HONMA TAKESHI ,  YONEZAWA SHIORI ,  OTANI TOMONORI ,  IWASHITA KAZUMI

IPC: G03F7/00 ,  C08F2/46 ,  C08F20/20 ,  G03F7/027 ,  G03F7/029 ,  H01L21/027 ,  H01L21/3065

CPC classification number: C08F220/18 ,  B05D3/06 ,  B05D3/12 ,  C08F2/48 ,  C08F222/10 ,  C08F222/1006 ,  C08F2222/102 ,  G02B1/04 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/029 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/4846 ,  H05K3/06 ,  H05K3/064

Abstract: A photocurable composition contains a polymerizable compound; and a photopolymerization initiator, in which the photocurable composition contains a compound represented by General Formula (1) shown below as the polymerizable compound, and in which, in General Formula (1), Ar represents a monovalent aromatic group which may have a substituent, R1 represents an alkyl group which may have a substituent or a hydrogen atom, R2 represents an alkyl group having (m + n) valences which may have a substituent, m is an integer of 2 or more, and n is an integer of 1 or more.

公开(公告)号：EP3000122A4

公开(公告)日：2016-12-28

申请号：EP14818779

申请日：2014-06-19

Applicant: CANON KK

Inventor： HONMA TAKESHI ,  ITO TOSHIKI ,  YONEZAWA SHIORI ,  CHIBA KEIKO ,  YAMASHITA KEIJI

IPC: H01L21/027 ,  B29C33/60 ,  B29C59/02 ,  C08F2/44 ,  C08F2/50 ,  C08F220/18 ,  C08K5/05

CPC classification number: B29C59/026 ,  B29C33/62 ,  B29C59/002 ,  B29C59/005 ,  B29K2033/08 ,  B29K2105/0005 ,  C08F2/44 ,  C08F2/50 ,  C08F220/18 ,  C08F222/1006 ,  C08K2201/00 ,  C08L33/08 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/266 ,  C08F2220/1875 ,  C08F2222/1013

Abstract: In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.

公开(公告)号：EP3000121A4

公开(公告)日：2016-12-28

申请号：EP14818475

申请日：2014-06-19

Applicant: CANON KK

Inventor： YONEZAWA SHIORI ,  ITO TOSHIKI ,  YAMASHITA KEIJI ,  CHIBA KEIKO ,  KAWASAKI YOUJI

IPC: H01L21/027 ,  B29C59/02 ,  C08F2/44 ,  C08F2/50 ,  C08F20/50 ,  C08K5/05

CPC classification number: B29C59/005 ,  B29C59/002 ,  B29C59/022 ,  B29C59/026 ,  B29C2059/023 ,  B29K2033/08 ,  B29K2105/0005 ,  C08F2/44 ,  C08F2/50 ,  C08L33/08 ,  G03F7/0002 ,  C08F2220/1875 ,  C08F2222/1013

Abstract: An imprint method that uses a condensable gas process has a problem in that the surface of a resist cured film is rough. This is resolved by a photocurable composition used for performing imprint in an atmosphere containing a condensable gas. The photocurable composition contains a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator, and a component (C) which is a mold releasing agent. A saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.

Abstract translation: 使用可冷凝气体工艺的压印方法存在抗蚀剂固化膜的表面粗糙的问题。 这通过用于在含有可冷凝气体的气氛中进行印迹的光固化性组合物来解决。 光固化性组合物含有作为（甲基）丙烯酸酯单体的组分（A），作为光聚合引发剂的组分（B）和作为脱模剂的组分（C）。 5℃（1摄氏度）和1个大气压下的可冷凝气体中的成分（C）的饱和溶解度为5重量％以下，可冷凝气体在5℃（1摄氏度）和1个大气压下为液态。

公开(公告)号：EP3167477A4

公开(公告)日：2018-01-03

申请号：EP15836759

申请日：2015-08-18

Applicant: CANON KK

Inventor： ITO TOSHIKI ,  HONMA TAKESHI ,  YONEZAWA SHIORI

IPC: H01L21/027 ,  C08F2/44 ,  C08F2/50 ,  C08F222/10 ,  C09D4/00 ,  G03F7/027

CPC classification number: H01L21/027 ,  C08F2/44 ,  C08F2/48 ,  C08F2/50 ,  C08F222/1006 ,  C09D4/00 ,  G03F7/0002 ,  G03F7/027 ,  C08F2222/1013 ,  C08F2220/185 ,  C08F2220/1875

Abstract: A photocurable composition contains a polymerizable compound (A) satisfying OA=NA/(NC,A−NO,A), wherein NA, NC,A and NO,A represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in (A); and a non-polymerizable component (E) containing at least one compound (X) including a photopolymerization initiator (B), in a proportion of 10% to 50% relative to the total weight of (A) and (E). The component (E) has a weight average molecular weight of 250 or less. The compound (X) satisfies OX=NX/(NC,X−NO,X). NX, NC,X and NO,X represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in the corresponding compound (X). The composition satisfies: OA−OE>1.00; and OAE