公开(公告)号：JPH1074448A

公开(公告)日：1998-03-17

申请号：JP21694897

申请日：1997-07-29

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  RABAROT MARC

IPC: G03F7/20 ,  H01J9/02 ,  H01J31/12 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To form a pattern within a photoresist by emission of continuous laser by accumulating the photoresist on the surface of a structural body, and translationally shifting a strip piece in two mutually right-angled directions on the photoresist. SOLUTION: A photoresist 22 is accumulated on the surface of a structural body 20, and a hole 14 is formed in a grid 8 and an intermediate insulator 10. This device has a bundle 26 of YAG laser optical fibers 28 for providing optical beams and a focusing device 30 of optical beams. The focusing device 30 contains a linear array having an optical fiber 28 and a microlens 34, or a strip piece 32. The optical beam emitted from a laser is subdivided into basic beams of the same number as the optical fibers. The optical axis 36 in the end 36 of each fiber 28 is conformed to the optical axis of the lens 34, and the optical axis is focused to the basic beams on the resist 22 by the fibers 28. The strip piece 32 is translationally shifted in two mutually right- angled directions on the resist 22, whereby the focused basic beams can be moved on the resist 22.

公开(公告)号：JPH11231763A

公开(公告)日：1999-08-27

申请号：JP33167698

申请日：1998-11-20

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  GEFFRAYE FRANCOISE

IPC: G03H1/04 ,  G03F7/00 ,  G03F7/20 ,  G03H1/22 ,  H01J9/02

Abstract: PROBLEM TO BE SOLVED: To provide a simplified method for forming a pattern onto photoresist. SOLUTION: This concerns a method for forming holes in photoresist 22, wherein a hologram image 138 of a single micro-spherical layer is formed by irradiating the single micro-spherical layer with vertical light beams while having parallel beams. Thus, a three-dimensional(3D) hologram recording image of the single layer and of a beam flux converged near the micro-spherical image is acquired and a 3D hologram image 144 of the beam flux is located within the thickness of the photoresist 22. Thus, an area of the photoresist 22 is exposed and developed, thus a pattern is formed in the above exposed area.

公开(公告)号：DE69929075T2

公开(公告)日：2006-08-17

申请号：DE69929075

申请日：1999-10-04

Applicant: COMMISSARIAT ENERGIE ATOMIQUE ,  BIOMERIEUX SA

Inventor： IDA MICHEL ,  FARGEIX ALAIN ,  PERRAUT FRANCOIS ,  LAGRANGE ALEXANDRE

IPC: G01N33/543 ,  G01N21/25 ,  G01N21/64 ,  G01N33/53 ,  G01N33/566 ,  G01N37/00

Abstract: A device for reading a biochip including plural molecular recognition areas and plural optical positioning marks, associated with recognition areas. The device includes an optical head capable of projecting excitation light onto the biochip. A device is provided to effectuate relative displacement between the head and the biochip. A first optical analysis system is associated with the optical head to receive any light arriving from recognition areas. A second optical positioning system is associated with the optical head to receive any light from at least one guide track and/or optical positioning mark. A device is further provided for servocontrolling scanning by the optical head. Such a device may find particular application to biological and chemical analysis.

公开(公告)号：FR2758015A1

公开(公告)日：1998-07-03

申请号：FR9616197

申请日：1996-12-30

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  CLERC JEAN FREDERIC

IPC: H01L21/48 ,  H01L21/60 ,  H05K3/32 ,  H05K3/40 ,  H01R43/00 ,  H01R4/26

Abstract: The conducting micro-mushroom sections are formed to connect two substrate (2,3) upper surfaces together. The second layer is a photosensitive layer. Hole perforations are formed in the second layer by chemical etching. The mushroom shaped sections (21) are formed in the hole by deposition, and the second layer etched away. Mushroom shaped protrusions are formed allowing connections to other substrates.

公开(公告)号：FR2737928B1

公开(公告)日：1997-09-12

申请号：FR9509878

申请日：1995-08-17

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  BAPTIST ROBERT

IPC: G03B7/20 ,  G03F7/20 ,  H01J9/02 ,  H01L21/027 ,  G03F1/16 ,  H01J1/30 ,  H01J31/12 ,  B05D3/06

Abstract: The method involves exposing the photosensitive layer (120) to an atmosphere containing a transparent liquid which does not wet it. A monolayer of microdroplets (121) is formed through which the surface is irradiated with parallel rays (123). On development, a hole (122) is made at the site of each microdroplet. The remainder of the photosensitive layer, insufficiently irradiated to form any impression, serves as a mask for etching of cavities in the underlayers (108,110) by known methods.

公开(公告)号：FR2725558B1

公开(公告)日：1996-10-31

申请号：FR9412065

申请日：1994-10-10

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  MONTMAYEUL BRIGITTE

IPC: G03F7/00 ,  G03F7/20 ,  H01J9/02 ,  H01J31/12 ,  H01J1/30 ,  G09F9/30

Abstract: A process for forming holes in a positive photosensitive resin layer by light exposure involves (a) forming a single layer (24) of balls (28) which are transparent to the exposure light and which are in direct contact with the resin layer (22); (b) exposing the resin layer to the exposure light (26) across the ball layer (24), each ball (28) concentrating the light at the contact point between the ball and the resin layer and thus causing exposure of a zone of the resin layer, the exposure light (26) forming a collimated parallel beam of constant light intensity over the entire ball layer (24); and (c) developing the exposed resin layer to form holes at the exposed zones. Also claimed are (i) a method of mfg. an electron source of micro-tip emissive cathode type having holes formed by the above process; and (ii) a flat screen employing an electron source made by the above method.

公开(公告)号：FR2784188B1

公开(公告)日：2000-12-22

申请号：FR9812438

申请日：1998-10-05

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  FARGEIX ALAIN ,  PERRAUT FRANCOIS ,  LAGRANGE ALEXANDRE

IPC: G01N21/25 ,  G01N21/64 ,  G01N33/543 ,  G01N33/551 ,  C12Q1/68 ,  B01L3/00 ,  B82B1/00

Abstract: A biochip (10) with many molecular identification cells is examined using a laser beam (30) projected onto the chip by an optical head (20). The head and the chip can be moved relative to each other to sweep the surface of the chip and examine all the cells, controlled by a guidance system (60). An independent claim is given for the chip itself which has location marks on its surface, which help the control unit identify cells.

公开(公告)号：FR2784188A1

公开(公告)日：2000-04-07

申请号：FR9812438

申请日：1998-10-05

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  FARGEIX ALAIN ,  PERRAUT FRANCOIS ,  LAGRANGE ALEXANDRE

IPC: G01N21/25 ,  G01N21/64 ,  G01N33/543 ,  G01N33/551 ,  C12Q1/68 ,  B01L3/00 ,  B82B1/00

Abstract: A biochip (10) with many molecular identification cells is examined using a laser beam (30) projected onto the chip by an optical head (20). The head and the chip can be moved relative to each other to sweep the surface of the chip and examine all the cells, controlled by a guidance system (60). An independent claim is given for the chip itself which has location marks on its surface, which help the control unit identify cells.

公开(公告)号：FR2771520B1

公开(公告)日：1999-12-24

申请号：FR9714720

申请日：1997-11-24

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  GEFFRAYE FRANCOISE

IPC: G03H1/04 ,  G03F7/00 ,  G03F7/20 ,  G03H1/22 ,  H01J9/02 ,  H01J1/30 ,  H01J31/12

公开(公告)号：FR2725558A1

公开(公告)日：1996-04-12

申请号：FR9412065

申请日：1994-10-10

Applicant: COMMISSARIAT ENERGIE ATOMIQUE

Inventor： IDA MICHEL ,  MONTMAYEUL BRIGITTE

IPC: G03F7/00 ,  G03F7/20 ,  H01J9/02 ,  H01J31/12 ,  H01J1/30 ,  G09F9/30

Abstract: A process for forming holes in a positive photosensitive resin layer by light exposure involves (a) forming a single layer (24) of balls (28) which are transparent to the exposure light and which are in direct contact with the resin layer (22); (b) exposing the resin layer to the exposure light (26) across the ball layer (24), each ball (28) concentrating the light at the contact point between the ball and the resin layer and thus causing exposure of a zone of the resin layer, the exposure light (26) forming a collimated parallel beam of constant light intensity over the entire ball layer (24); and (c) developing the exposed resin layer to form holes at the exposed zones. Also claimed are (i) a method of mfg. an electron source of micro-tip emissive cathode type having holes formed by the above process; and (ii) a flat screen employing an electron source made by the above method.