Abstract:
PROBLEM TO BE SOLVED: To record information without affecting a video exposed on film by selectively controlling plural proximate X-ray sources. SOLUTION: The film 10 is coated with conversion material reacting to X-ray radiation and converting the X-ray radiation into a visible light beam so as to leave the video thereon, and desirably it is housed in a protective envelope through which the visible light beam is not transmitted. The film 10 is set under an X-ray tube 20 having plural X-ray sources 22 two- dimensionally arrayed in vacuum. For example, by arranging the extremely small ray sources 22 in a matrix state, the matrix of the X-ray source is constituted. The X-ray tube 20 where many small-sized ray sources are adjacently arrayed can print an image on the surface of photosensitive material by an element or a pixel. The respective X-ray sources can radiate the X-ray so that the corresponding pixel may be displayed. The X-ray source 22 is provided with a discharge cathod 24 having an anode 28 and one or more microchips 26.
Abstract:
PROBLEM TO BE SOLVED: To improve the precision of mass spectrometry by detecting the ion generated by a first ionizing means and the ion generated by a second ionizing means, respectively, and combining the respective signals. SOLUTION: The ion generated by a hybrid ionizing chamber 16 is taken out by an ion extracting means 18, focused by a focusing electrode 20, filtered by a mass filter 22 and detected by an ion detecting means 24. The detected signal is combined by an electronic processing means 26 and displayed on a display means 28. The hybrid ionizing chamber 16 is provided with a first ionizing means 30 consisting of a filament which emits an electron when heated, and a second ionizing means consisting of a microchip electron source 32 which emits an electron when polarized. The ionizing chamber 16 has an electrode 34 for releasing the ion formed when the emitted ion gives an impact to the gas contained in the chamber 16, an electron catching electrode 36 and a grid 38.
Abstract:
The invention concerns a semiconductor device with vertical electronic injection comprising a support substrate (2), a structure including at least a thin monocrystalline film (7) transferred onto the support substrate and integral with the support substrate, at least an electronic component, the support substrate (2) comprising at least a recess for electrical or electronic access to the electronic component through the thin monocrystalline film, the device further comprising means (13, 14) for vertical electronic injection into the electronic component.
Abstract:
The invention concerns a semiconductor device with vertical electronic injection comprising a support substrate (2), a structure including at least a thin monocrystalline film (7) transferred onto the support substrate and integral with the support substrate, at least an electronic component, the support substrate (2) comprising at least a recess for electrical or electronic access to the electronic component through the thin monocrystalline film, the device further comprising means (13, 14) for vertical electronic injection into the electronic component.
Abstract:
System comprises a number of juxtaposed X-ray sources (22) and means (34-38) for the selective control of the sources so that a selected image or motif is made on a support or medium, such as a film. The X-ray sources can be a network of uni-dimensional or bi-dimensional X-ray sources. The X-ray sources (22) comprise a micropoint electron source (24) associated with an anode (28) suitable for emitting X-rays in response to the electrons supplied from the electron source.
Abstract:
The method involves exposing the photosensitive layer (120) to an atmosphere containing a transparent liquid which does not wet it. A monolayer of microdroplets (121) is formed through which the surface is irradiated with parallel rays (123). On development, a hole (122) is made at the site of each microdroplet. The remainder of the photosensitive layer, insufficiently irradiated to form any impression, serves as a mask for etching of cavities in the underlayers (108,110) by known methods.
Abstract:
The method involves exposing the photosensitive layer (120) to an atmosphere containing a transparent liquid which does not wet it. A monolayer of microdroplets (121) is formed through which the surface is irradiated with parallel rays (123). On development, a hole (122) is made at the site of each microdroplet. The remainder of the photosensitive layer, insufficiently irradiated to form any impression, serves as a mask for etching of cavities in the underlayers (108,110) by known methods.