2.
    发明专利
    未知

    公开(公告)号:DE69204271T2

    公开(公告)日:1996-03-21

    申请号:DE69204271

    申请日:1992-12-28

    Abstract: System to control the form of a charged particle beam. The particle beam emanates from a source (58) of these particles. This source is associated with a collecting electrode which collects the particles. The system comprises at least one resistive zone (56) and at least two control electrodes (52, 54), this resistive zone and these control electrodes being arranged substantially at the same level as the source, these control electrodes being furthermore placed on either side of the resistive zone and intended for polarising the latter, the electrical resistance profile of the resistive zone being chosen so as to have the distribution of potential making it possible to obtain the desired form of the beam emanating from the source when the control electrodes are suitably polarised. Application to the focusing of a charged particle beam.

    4.
    发明专利
    未知

    公开(公告)号:DE69204271D1

    公开(公告)日:1995-09-28

    申请号:DE69204271

    申请日:1992-12-28

    Abstract: System to control the form of a charged particle beam. The particle beam emanates from a source (58) of these particles. This source is associated with a collecting electrode which collects the particles. The system comprises at least one resistive zone (56) and at least two control electrodes (52, 54), this resistive zone and these control electrodes being arranged substantially at the same level as the source, these control electrodes being furthermore placed on either side of the resistive zone and intended for polarising the latter, the electrical resistance profile of the resistive zone being chosen so as to have the distribution of potential making it possible to obtain the desired form of the beam emanating from the source when the control electrodes are suitably polarised. Application to the focusing of a charged particle beam.

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