Optical member comprising od-doped silica glass
    1.
    发明专利
    Optical member comprising od-doped silica glass 有权
    包含OD-DOPED SILIC GLASS的光学构件

    公开(公告)号:JP2008162880A

    公开(公告)日:2008-07-17

    申请号:JP2007310052

    申请日:2007-11-30

    Abstract: PROBLEM TO BE SOLVED: To provide an optical member which exhibits high transmittance at a short wavelength, especially, at 193 nm or shorter and has other desired characteristics. SOLUTION: The optical member has an optical incident axis and is comprised of OD-doped silica glass having an absorption limit λ (limit) at 165 nm or shorter. In a certain embodiment, the OD-doped silica glass further contains fluorine. In another embodiment, the OD-doped silica glass contains fluorine of less than about 5,000 mass ppm. Furthermore, in another embodiment, the OD-doped silica glass contains Na of less than about 50 mass ppb. In an embodiment, the optical member is a photomask substrate to be used at a wavelength of shorter than 190 nm. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种在短波长,特别是在193nm或更短波长下表现出高透射率并且具有其它所需特性的光学部件。 光学构件具有光入射轴,并且由在165nm以下的吸收极限λ(极限)的OD掺杂石英玻璃构成。 在一个实施方案中,掺杂OD的石英玻璃还含有氟。 在另一个实施方案中,掺杂OD的石英玻璃含有小于约5,000质量ppm的氟。 此外,在另一个实施方案中,掺杂OD的石英玻璃含有小于约50质量ppm的Na。 在一个实施例中,光学构件是在短于190nm的波长下使用的光掩模衬底。 版权所有(C)2008,JPO&INPIT

    Synthetic silica material having low fluence-dependent transmission and manufacturing method of the same
    2.
    发明专利
    Synthetic silica material having low fluence-dependent transmission and manufacturing method of the same 审中-公开
    合成二氧化硅材料具有低磁性相关传输及其制造方法

    公开(公告)号:JP2014028752A

    公开(公告)日:2014-02-13

    申请号:JP2013146404

    申请日:2013-07-12

    Abstract: PROBLEM TO BE SOLVED: To provide a synthetic silica material having an optical property improved against dependence of transmission on strength of ultra violet radiation, and a manufacturing method of the silica material.SOLUTION: In synthetic silica material having an OH concentration of less than 900 mass ppm, and having Hof from 1×10to 6×10molecular/cm, an annealing treatment which includes 1) heating to 1100°C, 2)then, cooling to 800°C at a rate of 1°C per hour, and 3) furthermore, cooling to 25°C at a rate of 30°C per hour is performed to the synthetic silica material. With this treatment, the synthetic silica has a measured FDT(dK/dF) of less than 5.10×10cm pulse/mJ when exposed to excimer laser at 193 nm.

    Abstract translation: 要解决的问题:提供具有改进的抗紫外线辐射强度下的透射依赖性的光学性质的合成二氧化硅材料和二氧化硅材料的制造方法。溶液:在OH浓度小于900的合成二氧化硅材料中 质量ppm,Hof为1×10〜6×10分子/ cm,退火处理包括1)加热至1100℃,2)然后以1℃/小时的速度冷却至800℃,3 ),然后对合成二氧化硅材料进行以30℃/小时的速度冷却至25℃。 通过这种处理,当在193nm的准分子激光暴露时,合成二氧化硅具有小于5.10×10cm脉冲/ mJ的测量FDT(dK / dF)。

    Deuteroxyl-doped silica glass, optical member and lithographic system comprising the glass and method for making the glass
    3.
    发明专利
    Deuteroxyl-doped silica glass, optical member and lithographic system comprising the glass and method for making the glass 审中-公开
    脱氧二氧化硅玻璃,光学构件和包含玻璃的光刻系统和制造玻璃的方法

    公开(公告)号:JP2013075827A

    公开(公告)日:2013-04-25

    申请号:JP2012287644

    申请日:2012-12-28

    Abstract: PROBLEM TO BE SOLVED: To provide a synthetic silica material having a low level of polarization-induced birefringence, a low level of light-induced wavefront distortion, a high level of initial internal transmission, and method for making the same.SOLUTION: The disclosure includes OD-doped synthetic silica glass usable in optical elements for use in lithography at short wavelengths below about 300 nm. The OD-doped synthetic silica glass is found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also an optical member comprising such glass and lithographic systems including such optical member are disclosed. The glass is particularly suitable for immersion lithographic systems by virtue of the exceptionally low polarization-induced birefringence values at about 193 nm.

    Abstract translation: 要解决的问题:提供具有低水平的偏振引起的双折射,低水平的光诱导波前失真,高水平的初始内部透射的合成二氧化硅材料及其制造方法。 解决方案:本公开包括可用于在低于约300nm的短波长下进行光刻的光学元件中的OD掺杂合成石英玻璃。 发现OD掺杂的合成石英玻璃具有比具有相当浓度的OH的非掺杂OD的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了包括这种玻璃的光学构件和包括这种光学构件的光刻系统。 由于在约193nm处的异常低的偏振诱发双折射值,该玻璃特别适用于浸没式光刻系统。 版权所有(C)2013,JPO&INPIT

    拡大実効面積ファイバ
    6.
    发明专利
    拡大実効面積ファイバ 有权
    大型有效区域纤维

    公开(公告)号:JP2014222354A

    公开(公告)日:2014-11-27

    申请号:JP2014138568

    申请日:2014-07-04

    CPC classification number: G02B6/0365 G02B6/02019

    Abstract: 【課題】大きな実効面積と低曲げ損失を有する光ファイバを提供する。【解決手段】光ファイバは、ガラスコア20と、ガラスクラッド200を備え、クラッド200は、第1環状領域30と、第2環状領域50と、第3環状領域60とを備える。第3環状領域60に対して、コア20の最大相対屈折率は約0.1%より大きく、約0.3%より小さく、第1環状領域30の相対屈折率は、約0.025%より小く、第2環状領域50の相対屈折率は、負である。第2環状領域50は、その中に少なくとも10個の無秩序に分散した閉塞孔を有する石英系ガラスを含み、孔の間の平均距離が5000nmより小さく、少なくとも孔の80%が1000nmより小さい最大断面寸法を有する。【選択図】図1

    Abstract translation: 要解决的问题:提供具有大的有效面积和小的弯曲损耗的光纤。解决方案:光纤包括玻璃芯20和玻璃包层200,并且包层200包括第一环形区域30,第二环形区域 区域50和第三环形区域60.芯体20具有相对于第三环形区域60的最大相对折射率大于约0.1%且小于约0.3%。 第一环形区域30具有小于约0.025%的相对折射率。 第二环形区域50具有负的相对折射率。 第二环形区域50包括具有位于其中的至少10个闭合的随机分散的孔的二氧化硅基玻璃,并且孔之间的平均距离小于5000nm,并且至少80%的孔具有最小的横截面尺寸小于 1000 nm。

    ISOPIPES HAVING IMPROVED DIMENSIONAL STABILITY
    8.
    发明申请
    ISOPIPES HAVING IMPROVED DIMENSIONAL STABILITY 审中-公开
    具有改进的尺寸稳定性的ISOPIPES

    公开(公告)号:WO2010024937A3

    公开(公告)日:2010-05-27

    申请号:PCT/US2009004923

    申请日:2009-08-28

    CPC classification number: C03B17/064

    Abstract: An isopipe (13) for forming a glass ribbon (19) by a fusion process is provided which comprises a trough (11) and first and second weirs (1,2). Each weir (1,2) has an aperture (35) that extends along at least part of the weir's length. The apertures (35) can be used to cool the interior of the weirs (1,2) and thus reduce their creep rate. Alternatively, the apertures (35) can include structural members (41,42) to stabilize the weirs. In certain embodiments, the structural members (41,42) do not completely fill the apertures (35) thus allowing for weir stabilization through a combination of mechanical support and internal temperature reduction.

    Abstract translation: 提供了一种用于通过熔融工艺形成玻璃带(19)的等压管(13),其包括槽(11)和第一和第二堰(1,2)。 每个堰(1,2)都有一个沿堰长度的至少一部分延伸的孔(35)。 孔(35)可用于冷却堰(1,2)的内部并因此降低其蠕变速率。 或者,孔(35)可以包括结构构件(41,42)以稳定堰。 在某些实施例中,结构构件(41,42)不完全填充孔(35),因此通过机械支撑和内部温度降低的组合来允许堰稳定。

    fibra óptica com baixa perda por curvatura.

    公开(公告)号:BR112012020042A2

    公开(公告)日:2016-05-10

    申请号:BR112012020042

    申请日:2011-02-22

    Applicant: CORNING INC

    Abstract: fibra óptica com baixa perda por curvatura. trata-se de uma fibra óptica com baixa perda por macro e microcurvatura. a fibra possui uma primeira região de revestimento interna, com raio externo r~2~ > 8 1 m e índice de refração ~2~, e uma segunda região de revestimento externa que circunda a região de revestimento interna, com índice de refração. ~3~, onde ~1~ > ~3~ > ~2~. a diferença entre ~3~ e ~2~ é maior que 0,01. a fibra apresenta um corte de cabo 22 m menor ou igual a 1.260 nm e r~1~/r~2 maior ou igual a 0,25.

Patent Agency Ranking