公开(公告)号：DE602004011038T2

公开(公告)日：2008-12-24

申请号：DE602004011038

申请日：2004-03-23

Applicant: CORNING INC

Inventor： MAIER ROBERT L ,  THEN PAUL M ,  SPARROW ROBERT W

IPC: H01S3/034 ,  B32B9/00 ,  B32B9/04 ,  B32B19/00 ,  C23C14/10 ,  G02B1/02 ,  G02B1/10 ,  H01S3/08 ,  H01S3/225 ,  H01S5/028

Abstract: The invention is directed to a coated metal fluoride crystals that are resistant to laser-induced damage by a below 250 nm UV laser beam; methods of making such coated crystals, and the use of such coated crystals. The method includes the steps of providing an uncoated metal fluoride crystal of general formula MF2, where M is beryllium, magnesium, calcium, strontium and barium, and mixtures thereof, and coating the uncoated metal fluoride crystal with a coating of a selected material to thereby form a coated metal material resistant to laser induced damage. Preferred coating materials include MgF2, MgF2 doped fused silica and fluorine doped fused silica.

公开(公告)号：AU2002258427A1

公开(公告)日：2002-09-24

申请号：AU2002258427

申请日：2002-03-01

Applicant: CORNING INC

Inventor： THEN PAUL M ,  SMITH CHARLENE M ,  GRAY SANDRA ,  PELL MICHAEL A ,  SPARROW ROBERT W

IPC: C30B29/12 ,  C30B11/00 ,  H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225 ,  G02B1/00 ,  C01F11/22 ,  C01F5/28 ,  C01D3/02 ,  B29D11/00 ,  C01F11/18 ,  C01F5/24

Abstract: The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.

公开(公告)号：AU2002258594A1

公开(公告)日：2002-09-19

申请号：AU2002258594

申请日：2002-02-25

Applicant: CORNING INC

Inventor： SPARROW ROBERT W

IPC: H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225

Abstract: The invention relates to an excimer laser which includes a source of a laser beam and one or more windows which include barium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include barium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.

公开(公告)号：AU2002340462A1

公开(公告)日：2003-06-10

申请号：AU2002340462

申请日：2002-11-12

Applicant: CORNING INC

Inventor： SPARROW ROBERT W

IPC: C30B29/12 ,  C30B11/00 ,  G02B1/02 ,  G03F7/20 ,  H01L21/027 ,  C03C10/16 ,  C03B11/04 ,  C03B29/12 ,  C03C3/32

公开(公告)号：AU2002258435A1

公开(公告)日：2002-09-19

申请号：AU2002258435

申请日：2002-03-01

Applicant: CORNING INC

Inventor： THEN PAUL M ,  PELL MICHAEL A ,  SPARROW ROBERT W ,  SMITH CHARLENE M

IPC: C30B29/12 ,  C30B11/00 ,  H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225

Abstract: The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.

公开(公告)号：AU5450600A

公开(公告)日：2000-12-28

申请号：AU5450600

申请日：2000-05-30

Applicant: CORNING INC

Inventor： SPARROW ROBERT W

IPC: C30B11/00 ,  C30B29/12 ,  G02B1/02 ,  G03F7/20

Abstract: The present invention provides fluoride lens crystals for VUV optical lithography systems and processes. The invention provides a barium fluoride optical lithography crystal for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The invention includes a barium fluoride crystalline material for use in dispersion management of below 160 nm optical lithography processes.

公开(公告)号：WO02073244A9

公开(公告)日：2003-02-13

申请号：PCT/US0206124

申请日：2002-03-01

Applicant: CORNING INC

Inventor： PELL MICHAEL A ,  SMITH CHARLENE M ,  SPARROW ROBERT W ,  THEN PAUL M ,  GRAY SANDRA

IPC: C30B29/12 ,  C30B11/00 ,  H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225 ,  G02B

CPC classification number: H01S3/225 ,  C30B11/00 ,  C30B29/12 ,  H01S3/034 ,  H01S3/0346 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/106

Abstract: The invention provides a method of making >/= 4 kHz repetition rate argon fluoride excimer laser crystal optics. The method includes providing a magnesium fluoride crystal solid precursor, nonmetallically crushing the magnesium fluoride solid precursor to provide a crushed low metal contaminant magnesium fluoride feedstock, providing a magnesium fluoride crystal growth crucible, loading the crushed magnesium fluoride feedstock into the crystal growth crucible, melting the loaded crushed magnesium fluoride feedstock to provide a precrystalline magnesium fluoride melt, growing an oriented magnesium fluoride crystal from the precrystalline magnesium fluoride melt, cooling the grown magnesium fluoride crystal to provide a magnesium fluoride laser optical crystal and forming the magnesium fluoride laser crystal into an excimer laser crystal optic for transmitting a high repetition rate (>/= 4 kHz repetition rate) excimer laser output.

Abstract translation: 本发明提供了制造> / = 4kHz重复率的氟化氢准分子激光晶体光学器件的方法。 该方法包括提供氟化镁晶体固体前体，非金属地粉碎氟化镁固体前体以提供粉碎的低金属污染物氟化镁原料，提供氟化镁晶体生长坩埚，将粉碎的氟化镁原料装入晶体生长坩埚中，熔化 负载粉碎的氟化镁原料提供一种预晶化的氟化镁熔体，从预晶化的氟化镁熔体中生长取向的氟化镁晶体，冷却生长的氟化镁晶体，提供氟化镁激光光学晶体，并将氟化镁激光晶体形成为 准分子激光晶体光学器件用于传输高重复率（> / = 4kHz重复率）准分子激光输出。

公开(公告)号：WO02071555A9

公开(公告)日：2003-12-18

申请号：PCT/US0206235

申请日：2002-03-01

Applicant: CORNING INC

Inventor： PELL MICHAEL A ,  SMITH CHARLENE M ,  THEN PAUL M ,  SPARROW ROBERT W

IPC: C30B29/12 ,  C30B11/00 ,  H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225

CPC classification number: H01S3/225 ,  C30B11/00 ,  C30B29/12 ,  H01S3/034 ,  H01S3/0346 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/106

Abstract: The invention provides a greater than or equal to 4 khz repetition rate argon fluoride excimer laser system for providing a uv 193 nm wavelength output. The greater than or equal to 4 khz repetition rate argon fluoride excimer laser system includes an argon fluoride excimer laser chamber (22) for producing a 193 nm discharge at a pulse repetition rate greater than or equal to 4 khz. The greater than or equal to 4 khz repetition rate argon fluoride excimer laser chamber (22) includes magnesium fluoride crystal optic windows (20) for outputting the 193 nm output (24) with the magnesium fluoride crystal optic windows (20) having a 255 nm induced absorption less than .08 Abs/42mm when exposed to 5 million pulses pfd 193 nm light at a fluence greater than or equal to 40 mj/cm/pulse and a 42 mm crystal 120nm transmission of at least 30%.

Abstract translation: 本发明提供大于或等于4khz的重复率氩氟化物准分子激光系统，用于提供193nm波长的紫外输出。 大于或等于4khz的重复率氩氟化物准分子激光系统包括用于以大于或等于4khz的脉冲重复率产生193nm放电的氟化氢准分子激光室（22）。 大于或等于4khz的重复率氩氟化物准分子激光室（22）包括氟化镁晶体光学窗口（20），用于输出具有255nm的氟化镁晶体光学窗口（20）的193nm输出（24） 诱导吸收小于.08 Abs / 42mm，当暴露于500万脉冲pfd 193nm光时，注量大于或等于40mj / cm /脉冲，42mm晶体120nm透射率至少为30％。

公开(公告)号：WO02071556A2

公开(公告)日：2002-09-12

申请号：PCT/US0209047

申请日：2002-02-25

Applicant: CORNING INC

Inventor： SPARROW ROBERT W

IPC: H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225 ,  H01S

CPC classification number: H01S3/034 ,  H01S3/0346 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225

Abstract: The invention relates to an excimer laser (10) which includes a source of a laser beam and one or more windows (16,18) which include barium fluoride. Another aspect of the invention relates to an excimer laser (10) which includes a source of a laser beam (11),one or more windows (16,18) which include barium fluoride and a source for annealing the one or more windows (16,18). Another aspect of the invention relates to a method of producing a predetermined narrow width laserbeam (11).

Abstract translation: 本发明涉及一种准分子激光器（10），其包括激光束源和包括氟化钡的一个或多个窗口（16,18）。 本发明的另一方面涉及一种准分子激光器（10），其包括激光束（11）的源，包括氟化钡的一个或多个窗口（16,18）和用于退火所述一个或多个窗口（16 ，18）。 本发明的另一方面涉及一种制造预定的窄宽度激光束（11）的方法。

公开(公告)号：DE602004011038D1

公开(公告)日：2008-02-14

申请号：DE602004011038

申请日：2004-03-23

Applicant: CORNING INC

Inventor： MAIER ROBERT L ,  THEN PAUL M ,  SPARROW ROBERT W

IPC: H01S3/034 ,  B32B9/00 ,  B32B9/04 ,  B32B19/00 ,  C23C14/10 ,  G02B1/02 ,  G02B1/10 ,  H01S3/08 ,  H01S3/225 ,  H01S5/028

Abstract: The invention is directed to a coated metal fluoride crystals that are resistant to laser-induced damage by a below 250 nm UV laser beam; methods of making such coated crystals, and the use of such coated crystals. The method includes the steps of providing an uncoated metal fluoride crystal of general formula MF2, where M is beryllium, magnesium, calcium, strontium and barium, and mixtures thereof, and coating the uncoated metal fluoride crystal with a coating of a selected material to thereby form a coated metal material resistant to laser induced damage. Preferred coating materials include MgF2, MgF2 doped fused silica and fluorine doped fused silica.