中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

41 records (took 0.027 seconds)

    WIDE-ANGLE HIGH REFLECTION MIRROR AT 193 nm
    1.
    发明专利
    WIDE-ANGLE HIGH REFLECTION MIRROR AT 193 nm 有权
    宽角反射镜在193 nm

    公开(公告)号：JP2010196168A

    公开(公告)日：2010-09-09

    申请号：JP2010041821

    申请日：2010-02-26

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： SCHREIBER HORST ,  SMITH CHARLENE M ,  WANG JUE

    IPC: C23C14/06 ,  C23C14/24 ,  C23C14/48 ,  G02B5/08

    CPC classification number: G02B5/0833 ,  G02B5/0891 ,  Y10T428/24942 ,  Y10T428/24975 ,  Y10T428/265

    Abstract: PROBLEM TO BE SOLVED: To provide a high/low-refractive index coating system suitable for improving the performance of a highly reflective optical element. SOLUTION: An optical element has a selected substrate and an amorphous coating expressed by the formula: (H o L o ) i H o on the substrate. The (H o L o ) i is a laminate having a plurality i of coating periods composed of the H o layer and the L o layer on the substrate, wherein i is in the range of 14-20; H o is amorphous MgAl 2 O 4 ; and L o is amorphous SiO 2 , thereby forming an amorphous MgAl 2 O 4 -SiO 2 coating on the substrate. The H o layer of the first period is in contact with the substrate, and the thickness of the period of i is in the range of 600 to 1,200 nm. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供适合于提高高反射性光学元件性能的高/低折射率涂层系统。 解决方案：光学元件具有选定的衬底和由下式表示的无定形涂层：（H） H o 。 具有多个涂覆周期的层叠体是由H SB SBO组成的层叠体 >层和L O 层，其中i在14-20的范围内; 无定形MgAl 2 O 3 / SB> 4 ; 并且L ○是无定形SiO 2 SB，从而形成无定形MgAl 2 S 2 O 3 涂层在基材上。 第一周期的H SB SBO层与衬底接触，i的周期厚度在600〜1200nm的范围内。 版权所有（C）2010，JPO＆INPIT

    Synthetic silica material having low fluence-dependent transmission and manufacturing method of the same
    2.
    发明专利
    Synthetic silica material having low fluence-dependent transmission and manufacturing method of the same 审中-公开
    合成二氧化硅材料具有低磁性相关传输及其制造方法

    公开(公告)号：JP2014028752A

    公开(公告)日：2014-02-13

    申请号：JP2013146404

    申请日：2013-07-12

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： BOOKBINDER DANA C ,  HRDINA KENNETH E ,  GLENN E KOHNKE ,  MOORE LISA A ,  ULRICH NEUKIRCH ,  SUSAN L SCHIEFELBEIN ,  SMITH CHARLENE M

    IPC: C03B20/00 ,  G02B1/02 ,  H01L21/027

    CPC classification number: C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/54

    Abstract: PROBLEM TO BE SOLVED: To provide a synthetic silica material having an optical property improved against dependence of transmission on strength of ultra violet radiation, and a manufacturing method of the silica material.SOLUTION: In synthetic silica material having an OH concentration of less than 900 mass ppm, and having Hof from 1×10to 6×10molecular/cm, an annealing treatment which includes 1) heating to 1100°C, 2)then, cooling to 800°C at a rate of 1°C per hour, and 3) furthermore, cooling to 25°C at a rate of 30°C per hour is performed to the synthetic silica material. With this treatment, the synthetic silica has a measured FDT(dK/dF) of less than 5.10×10cm pulse/mJ when exposed to excimer laser at 193 nm.

    Abstract translation: 要解决的问题：提供具有改进的抗紫外线辐射强度下的透射依赖性的光学性质的合成二氧化硅材料和二氧化硅材料的制造方法。溶液：在OH浓度小于900的合成二氧化硅材料中 质量ppm，Hof为1×10〜6×10分子/ cm，退火处理包括1）加热至1100℃，2）然后以1℃/小时的速度冷却至800℃，3 ），然后对合成二氧化硅材料进行以30℃/小时的速度冷却至25℃。 通过这种处理，当在193nm的准分子激光暴露时，合成二氧化硅具有小于5.10×10cm脉冲/ mJ的测量FDT（dK / dF）。

    F-doped quartz glass and process of making same
    4.
    发明专利
    F-doped quartz glass and process of making same 有权
    F-DOPED QUARTZ玻璃及其制造方法

    公开(公告)号：JP2008156206A

    公开(公告)日：2008-07-10

    申请号：JP2007225718

    申请日：2007-08-31

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： MOORE LISA A ,  SMITH CHARLENE M

    IPC: C03C3/06 ,  C03B8/04 ,  C03B20/00 ,  G02B1/02

    CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

    Abstract: PROBLEM TO BE SOLVED: To provide an F-doped quartz glass material used in the lithographic application operating at a shorter wavelength than about 300 nm, which shows a lower polarization-induced birefringence or preferably, does not show the polarization-induced birefringence substantially even after being subjected to 10 million pulses of linearly polarized pulsed laser beam at 157 nm having a fluence of 250 μJ×cm -2 ×pulse -1 and a pulse length of 30 ns. SOLUTION: The F-doped synthetic quartz glass material contains, by weight, less than 50 ppm of Cl, less than 50 ppb of Na, less than 50 ppb in total of transition metals, and 0.1-5,000 ppm of fluorine. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供在光刻应用中使用的F掺杂的石英玻璃材料，其操作在比约300nm更短的波长，其表现出较低的偏振引起的双折射，或者优选地，不显示极化诱导的 即使在经受了1000万脉冲的线性偏振脉冲激光束（157nm）的照射条件下，双折射基本上具有250μJ×cm -2 SPF脉冲 -1 的脉冲，脉冲 长度为30 ns。 解决方案：掺杂F的合成石英玻璃材料含有小于50ppm的Cl，小于50ppb的Na，小于50ppb的过渡金属和0.1-5,000ppm的氟。 版权所有（C）2008，JPO＆INPIT

    Synthetic silica glass optical material having high resistance to optically induced change in refractive index
    5.
    发明专利
    Synthetic silica glass optical material having high resistance to optically induced change in refractive index 审中-公开
    合成二氧化硅玻璃光学材料，具有高耐光性，可以在折射率指数

    公开(公告)号：JP2005200293A

    公开(公告)日：2005-07-28

    申请号：JP2004341551

    申请日：2004-11-26

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： BOEK HEATHER D ,  HECKLE CHRISTINE E ,  MOLL JOHANNES ,  SMITH CHARLENE M

    IPC: G02B1/00 ,  B32B9/04 ,  B32B15/00 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  C03C15/00 ,  C03C17/30 ,  C03C17/32 ,  C03C19/00

    CPC classification number: C03C15/00 ,  C03C17/30 ,  C03C17/32 ,  C03C19/00

    Abstract: PROBLEM TO BE SOLVED: To provide a synthetic silica glass optical material having high resistance to optical damages by ultraviolet radiation in an ultraviolet wavelength range, particularly in an ultraviolet wavelength region of less than about 250 nm, and particularly exhibiting a low laser-induced density change. SOLUTION: The synthetic silica glass optical material contains aluminum of at least about 0.1 ppm and has H 2 concentration levels greater than about 0.5×10 17 molecules/cm 3 . Additionally, the synthetic silica glass optical material exhibits an H 2 to Al ratio of greater than about 1.2, as measured in 10 17 molecules/cm 3 H 2 per ppm Al. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种在紫外线波长范围内，特别是在小于约250nm的紫外线波长范围内，通过紫外线辐射具有高抗光损伤性的合成石英玻璃光学材料，特别是表现出低激光 引起的密度变化。 解决方案：合成石英玻璃光学材料含有至少约0.1ppm的铝，并且具有大于约0.5×10 17分子/ cm 2的H 2 浓度水平， SP> 3 。 另外，合成二氧化硅玻璃光学材料表现出H 2 Al比大于约1.2，如在10分钟/厘米3 /秒SP > H 2 每ppm Al。 版权所有（C）2005，JPO＆NCIPI

    DIRECT WRITING OF OPTICAL DEVICES IN SILICA-BASED GLASS USING FEMTOSECOND PULSE LASERS
    10.
    发明专利
    DIRECT WRITING OF OPTICAL DEVICES IN SILICA-BASED GLASS USING FEMTOSECOND PULSE LASERS 未知

    公开(公告)号：CA2380541A1

    公开(公告)日：2001-02-08

    申请号：CA2380541

    申请日：2000-07-28

    Applicant: CORNING INC

    Inventor： BORRELLI NICHOLAS F ,  SMITH CHARLENE M

    IPC: G02B6/13 ,  B23K26/00 ,  B23K26/06 ,  G11C13/04 ,  H01S3/00

    Abstract: The invention relates to methods of writing a light guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a sof t silica-based material having an annealing point less than about 1380 ~K. Pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material alon g the scan path. Substantially no laser induced physical damage of the materia l is incurred along the scan path. Various optical devices can be made using this method.

Patent Agency Ranking