Photochemical method for manufacturing nanometrically surface-decorated substrates
    2.
    发明公开
    Photochemical method for manufacturing nanometrically surface-decorated substrates 有权
    Photochemische Methodefürdie Produktion vonoberflächenverziertenSubstraten im Nanometerbereich

    公开(公告)号:EP1760527A1

    公开(公告)日:2007-03-07

    申请号:EP05019237.6

    申请日:2005-09-05

    Abstract: The present invention relates to a photochemical method for manufacturing nanometrically surface-decorated substrates, i.e. the creation of periodic and aperiodic patterns of highly ordered inorganic nanostructures on a substrate. This method is based on the selective photochemical modification of a self-assembled monolayer of metal compound loaded polymer core-shell systems on widely variable substrates. Light exposure through an appropriate mask causes selective chemical modification of the polymer core shell system. By subsequently placing the substrate in an appropriate chemical solution that eradicates the non-modified polymer, the pattern given by the used mask is reproduced on the surface. Finally, the remaining organic matrix is removed and metal salt is transformed to the single metal or metal oxide nanodots by means of gas plasma treatment.

    Abstract translation: 本发明涉及一种用于制造纳米表面装饰基板的光化学方法,即在基板上产生高阶无机纳米结构的周期性和非周期性图案。 该方法基于在广泛可变底物上的金属化合物加载的聚合物核 - 壳体系的自组装单层的选择性光化学修饰。 通过适当的掩模曝光会导致聚合物核壳系统的选择性化学改性。 通过随后将基底放置在消除未改性聚合物的合适的化学溶液中,使用的掩模给出的图案在表面上再现。 最后,除去剩余的有机基质,并通过气体等离子体处理将金属盐转化为单一金属或金属氧化物纳米点。

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