公开(公告)号：EP1792871A2

公开(公告)日：2007-06-06

申请号：EP06077085.6

申请日：2006-11-23

Applicant: Delphi Technologies, Inc.

Inventor： Dewes, Brian E. ,  Dewes, Denise R. ,  Harlan, Richard D.

IPC: B81C5/00

CPC classification number: G01M3/40 ,  B81C99/0045 ,  G01R31/2896 ,  H01L22/12

Abstract: A method and structure use characteristics of a plasma discharge for verifying a hermetic seal. The plasma discharge is created in a hermetically sealed cavity by a pair of spaced electrodes that extend from tips inside the hermetically sealed cavity to contacts outside the sealed cavity. An electrical bias is applied to the contacts that is sufficient to create a plasma discharge in a properly hermetically sealed cavity but not in an unsealed cavity.

Abstract translation: 用于验证气密密封的等离子体放电的方法和结构使用特性。 等离子体放电通过一对间隔开的电极在气密密封的腔中产生，该电极从气密密封腔内的尖端延伸以接触密封空腔外部。 电气偏压被施加到触点上，足以在适当的气密密封腔中产生等离子体放电，但不在未密封腔中。

公开(公告)号：EP1792871A3

公开(公告)日：2012-05-02

申请号：EP06077085.6

申请日：2006-11-23

Applicant: Delphi Technologies, Inc.

Inventor： Dewes, Brian E. ,  Dewes, Denise R. ,  Harlan, Richard D.

IPC: B81C99/00 ,  G01M3/40

CPC classification number: G01M3/40 ,  B81C99/0045 ,  G01R31/2896 ,  H01L22/12

Abstract: A method and structure use characteristics of a plasma discharge for verifying a hermetic seal. The plasma discharge is created in a hermetically sealed cavity by a pair of spaced electrodes that extend from tips inside the hermetically sealed cavity to contacts outside the sealed cavity. An electrical bias is applied to the contacts that is sufficient to create a plasma discharge in a properly hermetically sealed cavity but not in an unsealed cavity.