公开(公告)号：EP1388730A3

公开(公告)日：2006-06-07

申请号：EP03077375.8

申请日：2003-07-29

Applicant: Delphi Technologies, Inc.

Inventor： Schroeder, Thaddeus ,  Chang, Shih-Chia ,  Guerra, Jose A.

IPC: G01D5/14

CPC classification number: G01D5/14 ,  Y10T29/49069 ,  Y10T29/49075 ,  Y10T29/49156

Abstract: A process for forming ferromagnetic targets 8 for position and speed sensors 15. The targets 8 are formed on a conductor-clad substrate 23 by first applying a layer of photoresist material 26 and then patterning and etching the photoresist 26 to form trenches 42 defined by the shape and dimensions of the required targets 8. Ferromagnetic material is formed in the trenches 42 to complete the formation of the targets 8.

公开(公告)号：EP1388730A2

公开(公告)日：2004-02-11

申请号：EP03077375.8

申请日：2003-07-29

Applicant: Delphi Technologies, Inc.

Inventor： Schroeder, Thaddeus ,  Chang, Shih-Chia ,  Guerra, Jose A.

IPC: G01D5/14

CPC classification number: G01D5/14 ,  Y10T29/49069 ,  Y10T29/49075 ,  Y10T29/49156

Abstract: A process for forming ferromagnetic targets 8 for position and speed sensors 15. The targets 8 are formed on a conductor-clad substrate 23 by first applying a layer of photoresist material 26 and then patterning and etching the photoresist 26 to form trenches 42 defined by the shape and dimensions of the required targets 8. Ferromagnetic material is formed in the trenches 42 to complete the formation of the targets 8.

Abstract translation: 用于形成用于位置和速度传感器15的铁磁体目标8的工艺。靶8通过首先施加一层光致抗蚀剂材料26形成在导体覆盖的基板23上，然后对光致抗蚀剂26进行图案化和蚀刻以形成由 所需目标的形状和尺寸8.在沟槽42中形成铁磁材料以完成靶8的形成。