公开(公告)号：US20180090347A1

公开(公告)日：2018-03-29

申请号：US15715847

申请日：2017-09-26

Applicant: EBARA CORPORATION

Inventor： Yoshitaka KITAGAWA ,  Hisajiro NAKANO ,  Junji KUNISAWA

IPC: H01L21/67 ,  H01L21/02 ,  B08B1/04

CPC classification number: H01L21/67092 ,  A46B13/02 ,  B08B1/04 ,  H01L21/02096 ,  H01L21/6704 ,  H01L21/67046 ,  H01L21/67219 ,  H01L21/67253

Abstract: A substrate cleaning apparatus for bringing an elongated roll cleaning member into sliding contact with a flat plate type substrate to perform cleaning processing on the substrate includes a roll holder for supporting the roil cleaning member so that the roll cleaning member is rotatable, an elevating mechanism that has a linking member for supporting the roll holder, and moves the roll holder up and down so that the roll cleaning member applies a predetermined roll load to the substrate, a sensor member that is provided to the linking member and measures frictional force between the roll cleaning member and the substrate, and a controller for performing feedback control on the frictional force between the roll cleaning member and the substrate based on a measured value of the sensor member.