公开(公告)号：US20230191460A1

公开(公告)日：2023-06-22

申请号：US17924939

申请日：2021-05-14

Applicant: EBARA CORPORATION

Inventor： Yuki TANAKA ,  Takeshi IIZUMI ,  Takayuki KAJIKAWA

IPC: B08B3/02

CPC classification number: B08B3/02 ,  B08B2240/00 ,  H01L21/67005

Abstract: A cleaning device includes: a substrate rotation mechanism that holds and rotates a substrate around center axis thereof; a first single-tube nozzle that discharges first cleaning liquid toward a top surface of the substrate; and a second single-tube nozzle that discharges second cleaning liquid toward the top surface of the substrate. The first single-tube nozzle and the second single-tube nozzle are disposed such that the second single-tube nozzle discharges the second cleaning liquid in a forward direction of a rotation direction of the substrate at a position farther away from the center of the substrate than a landing position of the first cleaning liquid, and a part is generated in which liquid flow on the top surface of the substrate after landing of the first cleaning liquid and liquid flow on the top surface of the substrate after landing of the second cleaning liquid are combined.