公开(公告)号：DE4226138C2

公开(公告)日：2001-02-08

申请号：DE4226138

申请日：1992-08-07

Applicant: EMTEC MAGNETICS GMBH

Inventor： RIEGER SIEGFRIED ,  KRAETSCHMER REINHARD ,  PERTZSCH ALBERT

IPC: B29C48/305 ,  G11B5/848 ,  B29C47/02

公开(公告)号：DE4420103C2

公开(公告)日：2003-06-18

申请号：DE4420103

申请日：1994-06-09

Applicant: EMTEC MAGNETICS GMBH

Inventor： RIEGER SIEGFRIED ,  KRAETSCHMER REINHARD ,  WAGNER FRANZ-XAVER

IPC: B29C48/345 ,  B05C9/06 ,  G11B5/845 ,  G11B5/848 ,  B29C47/30 ,  B05C5/02 ,  B29C47/02 ,  B29C47/14

Abstract: In an extrusion coater having at least two coating slots (8, 8'), the central line between the coating slots is arranged perpendicular to the plane of the substrate (1) and the terminating edge (15) of the separator (16) between the two coating slots is a downward-sloping surface. Opposite the extruder orifice and behind the substrate is the edge (5) of a magnet (2) which draws the magnetizable layers out of the coater outlet orifice (3), the edge (5) being arranged at the height of the common outlet orifice of the coating slots (8, 8'). By means of this arrangement, a uniform coating is achieved even in the case of very thin double layers and even at high coating speeds.

公开(公告)号：DE4319895C2

公开(公告)日：2002-06-20

申请号：DE4319895

申请日：1993-06-16

Applicant: EMTEC MAGNETICS GMBH

Inventor： HELLINGS GABRIELE ,  KRAETSCHMER REINHARD ,  HUBER BERNHARD

IPC: B01D53/04 ,  B01D53/84 ,  B01J20/26 ,  B01D53/02 ,  B01D53/00 ,  B01J20/34

公开(公告)号：DE3914565C2

公开(公告)日：1999-10-21

申请号：DE3914565

申请日：1989-05-03

Applicant: EMTEC MAGNETICS GMBH

Inventor： WIMBERSKY WERNER ,  GERUM JOHANNES ,  CREDNER HANS-HEINRICH ,  KRAETSCHMER REINHARD

IPC: G11B5/706 ,  G11B5/716 ,  H01F1/113