公开(公告)号：JPH10310300A

公开(公告)日：1998-11-24

申请号：JP10087998

申请日：1998-04-13

Applicant: EMTEC MAGNETICS GMBH

Inventor： SCHLATTER MANFRED ,  SCHULTHEISS MANFRED

IPC: B65H23/192 ,  B65H23/00 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To process in a number of processing steps a magnetic tape which was cut to the final width, without applying excess mechanical stresses to the magnetic tape regardless of high processing speed. SOLUTION: A device 1 for processing in a number of processing steps a magnetic tape cut to the final width includes at least two substantially slip-free tape conveyors 8, 13, 14, the tape conveyors applying an average tape tension of 2N per 1 inch (25.4 mm) of tape width in order to avoid the permanent deformation of tape material, with the result that the tape tension is kept at a value that is within the elastic limit of the tape material and almost 20% lower than the maximum allowable tensile force of the tape material.

公开(公告)号：JPH10296519A

公开(公告)日：1998-11-10

申请号：JP376198

申请日：1998-01-12

Applicant: EMTEC MAGNETICS GMBH

Inventor： SCHLATTER MANFRED ,  SCHULTHEISS MANFRED

IPC: B23C3/13 ,  B23D71/00 ,  B24B19/22 ,  B24D13/02 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To accomplish reduction in roughness of a coating tape and in generation of chips by providing thread type grooves formed on the circumferential face in a polishing member in the circumferential face structure. SOLUTION: On a circumferential face 7 of a polishing cylinder 5, ring type coaxial grooves 8, or thread-type or thread-shapedly arranged coaxial grooves are arranged. In the cylinder 5 provided with a diameter of 2r, which is a dimension to the outer circumference including the tips of respective projections positioned between the respective grooves 8. The grooves 8 are formed on the cylinder circumference face 7 while the cylinder 5 is rotated. Because of contact friction with the polishing member, the surface of a coating tape is heated in an extremely thin layer range, and peaks on a rough face are melted and fluidized so as to fill in valleys on the rough face, so that the surface is greatly smoothed.

公开(公告)号：RU2189641C2

公开(公告)日：2002-09-20

申请号：RU98107007

申请日：1998-04-13

Applicant: EMTEC MAGNETICS GMBH

Inventor： SCHLATTER MANFRED ,  SCHULTHEISS MANFRED

IPC: B65H23/192 ,  B65H23/00 ,  G11B5/84

Abstract: mechanical or signaling devices for tape treatment. SUBSTANCE: device has at least two tape drives ensuring tape medium tension of 2N per inch (25.4 mm) of its length which is lower by 20% than tensile load of tape material and which prevents residual strain of material. Glossing, grinding, polishing, and cleaning devices as well as signal recording/reproducing and/or signal or tape quality control units may be used as tape treatment devices. EFFECT: reduced tensile load on tape. 7 cl, 3 dwg

公开(公告)号：DE59811814D1

公开(公告)日：2004-09-23

申请号：DE59811814

申请日：1998-03-25

Applicant: EMTEC MAGNETICS GMBH

Inventor： SCHLATTER MANFRED ,  SCHULTHEISS MANFRED

IPC: B65H23/192 ,  B65H23/00 ,  G11B5/84

Abstract: The device provides for magnetic tape to be drawn off a reel Ä2Ü. The tape is passed over a spinning roller Ä4aÜ and into a tape polishing and burnishing station Ä5Ü, with a grinding tape supplied by a reel Ä5AÜ. The tape continues to a cleaning station Ä6AÜ and the into a tape tensioning stage Ä7Ü. The tape feeding motion is provided by a master Ä8Ü and a slave Ä13,14Ü motor driven vacuum rollers. In the feed drive path there are polishing Ä9Ü, cleaning Ä6CÜ and a particle Ä11Ü stripping stages. The processed tape passes through a quality checking section Ä15Ü and into a tape reeling stage Ä17Ü.

公开(公告)号：DE59812255D1

公开(公告)日：2004-12-23

申请号：DE59812255

申请日：1998-01-08

Applicant: EMTEC MAGNETICS GMBH

Inventor： SCHLATTER MANFRED ,  SCHULTHEISS MANFRED

IPC: B23C3/13 ,  B23D71/00 ,  B24B19/22 ,  B24D13/02 ,  G11B5/84

Abstract: A polishing apparatus for reducing the roughness and abrasive shedding of coated tapes comprises a cylinder having coaxial channels or grooves of various forms, which are advantageously thread-like. Axial grooves may be additionally provided.

公开(公告)号：SG55450A1

公开(公告)日：1998-12-21

申请号：SG1998000050

申请日：1998-01-06

Applicant: EMTEC MAGNETICS GMBH

Inventor： SCHLATTER MANFRED ,  SCHULTHEISS MANFRED

IPC: B23C3/13 ,  B23D71/00 ,  B24B19/22 ,  B24D13/02 ,  G11B5/84

Abstract: A polishing apparatus for reducing the roughness and abrasive shedding of coated tapes comprises a cylinder having coaxial channels or grooves of various forms, which are advantageously thread-like. Axial grooves may be additionally provided.