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公开(公告)号:JP2001353960A
公开(公告)日:2001-12-25
申请号:JP2001138180
申请日:2001-05-09
Applicant: EMTEC MAGNETICS GMBH , FEW CHEMICALS GMBH
Inventor: SCHOEDE VOLKER , ROTH CHRISTOPH , KUHRT ANGELA , WEIGT WILFRIED
Abstract: PROBLEM TO BE SOLVED: To provide a new recording material, which includes a layer containing powder having silica as a basis, the water resistance of which is improved, which shows a high resolution, the self-adhesion of which to a printing face is low and which can be properly employed to almost all the ordinary kinds of printers. SOLUTION: The powder-containing recording material includes an ink accepting layer. The ink accepting layer includes the following components such as an ink fixer made of the mixture of a water-soluble cationic polymer and a water-insoluble cationic polymer, a soluble plasticizer, polymer particles each having the glass transition temperature of below 25 deg.C and silica particles, the surface of each of which is modified by alkyl silane.
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公开(公告)号:DE10022529A1
公开(公告)日:2001-11-15
申请号:DE10022529
申请日:2000-05-09
Applicant: EMTEC MAGNETICS GMBH , FEW CHEMICALS GMBH
Inventor: ROTH CHRISTOPH , KUHRT ANGELA , WEIGT WILFRIED , SCHOEBE VOLKER
Abstract: Pigmented recording material with a color-receiving layer containing a silicon dioxide dispersion obtained by surface modification with vinyl-, (meth)acryl- or 1-8C alkyl-trimethoxy- or -triethoxy-silane (plus cationic color-fixing agents, plasticizer and optional polymer dispersion). Pigmented recording material with a color-receiving layer containing (a) 5-25 wt.% polymeric color-fixing mixture of water-soluble and -insoluble cationic polymers, (b) 5-20 wt.% water-soluble plasticizer, (c) 0-20 wt.% polymer dispersion with a glass transition point below 25 degrees C and (d) 30-80 wt.% silicon dioxide dispersion obtained by surface modification with alkylsilanes of formula (1), using a (SiO2 dispersion):(alkylsilane) ratio of (1:1)-(9:1). R1Si(OR2)3 (1) R1 = vinyl, (meth)acryl or 1-8C alkyl; and R2 = methyl or ethyl.
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公开(公告)号:NO20025178A
公开(公告)日:2003-04-30
申请号:NO20025178
申请日:2002-10-28
Applicant: EMTEC MAGNETICS GMBH
Inventor: KUHRT ANGELA , WEIGT WILFRIED , SCHOEBE VOLKER , ROTH CHRISTOPH , MEIER FRANK
CPC classification number: B41M5/502 , B41M5/52 , B41M5/5218
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公开(公告)号:DE10153274A1
公开(公告)日:2003-05-08
申请号:DE10153274
申请日:2001-10-29
Applicant: EMTEC MAGNETICS GMBH , FEW CHEMICALS GMBH
Inventor: KUHRT ANGELA , MEIER FRANK , ROTH CHRISTOPH , SCHOEBE VOLKER , WEIGT WILFRIED
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公开(公告)号:NO20025178L
公开(公告)日:2003-04-30
申请号:NO20025178
申请日:2002-10-28
Applicant: EMTEC MAGNETICS GMBH
Inventor: KUHRT ANGELA , WEIGT WILFRIED , SCHOEBE VOLKER , ROTH CHRISTOPH , MEIER FRANK
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公开(公告)号:NO20025178D0
公开(公告)日:2002-10-28
申请号:NO20025178
申请日:2002-10-28
Applicant: EMTEC MAGNETICS GMBH
Inventor: KUHRT ANGELA , WEIGT WILFRIED , SCHUEBE VOLKER , ROTH CHRISTOPH , MEIER FRANK
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