POINT SOURCE X-RAY FOCUSSING DEVICE

    公开(公告)号:AU3288084A

    公开(公告)日:1985-04-26

    申请号:AU3288084

    申请日:1984-09-10

    Abstract: Point source X-ray focusing device structures (48, 68), materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices (48, 68) include one or more focusing elements (50, 76, 78, 90, 108), which each have a focusing surface (52, 80, 82, 92, 96), with a plurality of layer pairs (54, 100) formed thereon. The focusing surface (52, 80, 82, 92, 96) and the layer pairs (54, 100) are designed to collect, reflect and concentrate the maximum X-ray flux from a point source (28, 58, 70) to a focus point (32, 62, 88) for a particular wavelength of interest.

    POINT SOURCE X-RAY FOCUSING DEVICE

    公开(公告)号:ZA847129B

    公开(公告)日:1985-06-26

    申请号:ZA847129

    申请日:1984-09-11

    Abstract: Point source X-ray focusing device structures (48, 68), materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices (48, 68) include one or more focusing elements (50, 76, 78, 90, 108), which each have a focusing surface (52, 80, 82, 92, 96), with a plurality of layer pairs (54, 100) formed thereon. The focusing surface (52, 80, 82, 92, 96) and the layer pairs (54, 100) are designed to collect, reflect and concentrate the maximum X-ray flux from a point source (28, 58, 70) to a focus point (32, 62, 88) for a particular wavelength of interest.

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