公开(公告)号：KR20200124780A

公开(公告)日：2020-11-03

申请号：KR20207030995

申请日：2013-05-31

Applicant: ENTEGRIS INC

Inventor： HENDRIX BRYAN C ,  GREGG JOHN N ,  BATTLE SCOTT L ,  NAITO DONN K ,  BARTOSH KYLE ,  CLEARY JOHN M ,  CHEON SEBUM ,  HODGES JORDAN

IPC: C23C16/44 ,  C23C16/458

Abstract: 시스템, 시약지지체트레이, 입자억제장치, 및방법이개시되어있다. 하나의양태에서, 시스템은내부용적부를둘러싸는하나이상의내부벽을갖는기화기용기, 및상기내부용적부내부에수직으로적층가능하도록구성된복수의시약지지체트레이를포함한다. 복수의시약지지체트레이각각은내부용적부내에수직으로적층가능하여시약지지체트레이의스택을형성하도록구성된다. 복수의시약지지체트레이중 하나이상은, 시약지지체트레이의스택내 인접한시약지지체트레이들사이를통과하는가스유동의방향을바꿔서, 가스의유동이특정시약지지체트레이내의소스시약물질과, 시약지지체트레이의스택내 복수의시약지지체트레이중 다음트레이로통과하기이전에상호작용하도록구성된다.

公开(公告)号：SG11202103273WA

公开(公告)日：2021-04-29

申请号：SG11202103273W

申请日：2019-10-16

Applicant: ENTEGRIS INC

Inventor： BAUM THOMAS H ,  HENDRIX BRYAN C ,  CHEN PHILIP S H ,  WRIGHT JR ,  WOECKENER JAMES

IPC: H01L21/02 ,  H01L21/285 ,  H01L21/28 ,  H01L21/324

Abstract: A process for forming a molybdenum-containing material on a substrate is described, in which the substrate is contacted with molybdenum dioxydichloride (MoO2Cl2) vapor under vapor deposition conditions, to deposit the molybdenum-containing material on the substrate. Advantageously, the robust process does not require pre-treatment of the substrate with a nucleating agent. In certain embodiments, the process results in the bulk deposition of molybdenum, e.g., by chemical vapor deposition (CVD) techniques such as pulsed CVD or ALD.

公开(公告)号：SG11202102915TA

公开(公告)日：2021-04-29

申请号：SG11202102915T

申请日：2019-09-24

Applicant: ENTEGRIS INC

Inventor： WRIGHT ROBERT JR ,  BAUM THOMAS H ,  HENDRIX BRYAN C ,  NGUYEN SHAWN DUC ,  WANG HAN ,  CHEN PHILIP S H

IPC: C23C16/18 ,  C23C16/455 ,  C23C16/56 ,  H01L21/285

Abstract: Described are vapor deposition methods for depositing metal films or layers onto a substrate, wherein the metal is molybdenum or tungsten; the methods involve organometallic precursor compounds that contain the metal and one or more carbon-containing ligands, and include depositing a metal layer formed from the metal of the precursor, onto a substrate, followed by introducing oxidizer to the formed metal layer.

公开(公告)号：SG11201706564UA

公开(公告)日：2017-09-28

申请号：SG11201706564U

申请日：2016-02-13

Applicant: ENTEGRIS INC

Inventor： HENDRIX BRYAN C ,  PETERS DAVID W ,  LI WEIMIN ,  WALDFRIED CARLO ,  COOKE RICHARD A ,  GUNDA NILESH ,  LIN I-KUAN

IPC: H01L21/56 ,  H01L21/205

Abstract: A porous matrix filter comprising a metal membrane, wherein the metal membrane is encapsulated with a metal oxide coating having a penetration depth in a range of from 20 to 2000 µm.

公开(公告)号：SG11202005042WA

公开(公告)日：2020-06-29

申请号：SG11202005042W

申请日：2018-12-07

Applicant: ENTEGRIS INC

Inventor： ELDRIDGE DAVID JAMES ,  PETERS DAVID ,  WRIGHT ROBERT JR ,  HENDRIX BRYAN C ,  BATTLE SCOTT L ,  GREGG JOHN

IPC: C23C16/448 ,  H01L21/02 ,  H01L21/67

Abstract: A chemical delivery system includes a bulk container, a run/refill chamber, a first conduit and a second conduit. The bulk container stores a precursor. The run/refill chamber includes a plurality of spaced tubes having a plurality of surfaces for receiving the precursor in vapor form and storing the precursor in solid form. The first conduit connects the bulk container to the run/refill chamber for transporting the precursor from the bulk container to the run/refill chamber in vapor form. The second conduit connects the run/refill chamber to a deposition chamber for transporting the precursor from the run/refill chamber to the deposition chamber in vapor form.

公开(公告)号：EP2855730A4

公开(公告)日：2016-01-27

申请号：EP13796903

申请日：2013-05-31

Applicant: ENTEGRIS INC

Inventor： HENDRIX BRYAN C ,  GREGG JOHN N ,  BATTLE SCOTT L ,  NAITO DONN K ,  BARTOSH KYLE ,  CLEARY JOHN M ,  CHEON SEBUM ,  HODGES JORDAN

IPC: C23C16/44 ,  B01B1/00 ,  C23C16/458

CPC classification number: C23C16/458 ,  B01B1/005 ,  C23C16/4402 ,  C23C16/4481 ,  C23C16/455

Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.

公开(公告)号：WO2016131024A9

公开(公告)日：2017-07-13

申请号：PCT/US2016017910

申请日：2016-02-13

Applicant: ENTEGRIS INC

Inventor： HENDRIX BRYAN C ,  PETERS DAVID W ,  LI WEIMIN ,  WALDFRIED CARLO ,  COOKE RICHARD A ,  GUNDA NILESH ,  LIN I-KUAN

IPC: H01L21/56 ,  H01L21/205

CPC classification number: C23C16/45555 ,  C23C16/4404 ,  C23C16/4412

Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that is deleterious to the substrate article, structure, material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.

Abstract translation: 描述适用于各种基底制品，结构，材料和设备的涂层。 在各种应用中，衬底包括易于在其上形成氧化物，氮化物，氟化物或这种金属的氯化物的金属表面，其中金属表面被配置成在使用中与气体，固体或与其反应形成的液体接触以形成 对基底制品，结构，材料或设备有害的反应产物。 金属表面涂覆有防止涂层表面与反应性气体反应的保护涂层，和/或以其他方式改善衬底制品或设备的电，化学，热或结构性质。 描述了涂覆金属表面的各种方法，并用于选择使用的涂层材料。

公开(公告)号：WO2017079550A3

公开(公告)日：2017-06-22

申请号：PCT/US2016060520

申请日：2016-11-04

Applicant: ENTEGRIS INC

Inventor： DUBOIS LAWRENCE H ,  CARRUTHERS J DONALD ,  PETRUSKA MELISSA A ,  STURM EDWARD A ,  WILSON SHAUN M ,  LURCOTT STEVEN M ,  HENDRIX BRYAN C ,  SWEENEY JOSEPH D ,  WODJENSKI MICHAEL J ,  BYL OLEG ,  TANG YING ,  DESPRES JOSEPH R ,  MARLOW MATTHEW THOMAS ,  SCANNELL CHRISTOPHER ,  ELZER DANIEL ,  MURTHI KAVITA

IPC: B01J20/20 ,  B01J20/10 ,  B01J20/16 ,  B01J20/22 ,  F17C1/00

CPC classification number: B01J20/20 ,  B01J20/103 ,  B01J20/16 ,  B01J20/226 ,  F17C1/00

Abstract: Adsorbents of varying types and forms are described, as usefully employed in gas supply packages that include a gas storage and dispensing vessel holding such adsorbent for storage of sorbate gas thereon, and a gas dispensing assembly secured to the vessel for discharging the sorbate gas from the gas supply package under dispensing conditions thereof. Corresponding gas supply packages are likewise described, and various methods of processing the adsorbent, and manufacturing the gas supply packages.

Abstract translation: 描述了不同类型和形式的吸附剂，如在气体供应包装中有用的那样，所述气体供应包装包括容纳这种吸附剂以在其上存储山梨酸盐气体的气体储存和分配容器，以及固定到容器以将山梨酸盐气体从 气体供应包装在其分配条件下。 同样描述相应的气体供应包装，以及处理吸附剂和制造气体供应包装的各种方法。