公开(公告)号：DE69512051T2

公开(公告)日：2000-03-09

申请号：DE69512051

申请日：1995-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：DE69512051D1

公开(公告)日：1999-10-14

申请号：DE69512051

申请日：1995-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：ES2135737T3

公开(公告)日：1999-11-01

申请号：ES95920138

申请日：1995-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：FR2719900B1

公开(公告)日：1996-09-20

申请号：FR9405793

申请日：1994-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00 ,  G01L1/00 ,  G01B5/30 ,  G01B7/16 ,  G01B11/16

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：FR2719900A1

公开(公告)日：1995-11-17

申请号：FR9405793

申请日：1994-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00 ,  G01L1/00 ,  G01B5/30 ,  G01B7/16 ,  G01B11/16

Abstract: A device for use in a processing chamber (11) containing a collective holder (12) with a plurality of sites (14) for receiving substrates to be processed. The device comprises a test sample (16), a light source (35) transmitting a light beam towards the test sample (16), and a sensor (18) for sensing the beam reflected therefrom. Said test sample (16) is arranged on an individual holder (20) which can be fitted in one of the sites (14) on the collective holder (12) and further jointly supports at least the insertable portion (21) of the sensor (18). The device is particularly suitable for providing anti-reflection coatings on lenses for spectacles.