公开(公告)号：WO2008000841A2

公开(公告)日：2008-01-03

申请号：PCT/EP2007057798

申请日：2007-06-27

Applicant: ESSILOR INT ,  ARROUY FREDERIC ,  BEINAT OLIVIER ,  NOUVELOT LUC ,  THOMAS MICHELE

Inventor： ARROUY FREDERIC ,  BEINAT OLIVIER ,  NOUVELOT LUC ,  THOMAS MICHELE

CPC classification number: G02B1/115 ,  G02B1/116

Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio:R T sum of the physical thicknesses of the low refractive index layers of the anti-reflection coating/sum of the physical thicknesses of the high refractive index layers of the anti-reflection coating is higher than 2.1. If the anti-reflection stack comprises at least one low refractive index layer having a physical thickness =100nm which is not the outermost layer of the anti-reflection coating, said relatively thick layer and the underlying layers are not taken into account in R T calculation.

Abstract translation: 本发明涉及一种具有抗反射性能和高耐热性的光学制品，该光学制品包括基材，该基材具有涂布有多层抗反射涂层的至少一个主面，该多层抗反射涂层包含至少一个高折射率层的堆叠， 至少一个低折射率层，其中，所述抗反射涂层的低折射率层的物理厚度之和与所述抗反射涂层的低折射率层的高折射率层的物理厚度之和的比值R SUB> T 防反射涂层高于2.1。 如果防反射叠层包括至少一个具有不是抗反射涂层的最外层的物理厚度= 100nm的低折射率层，则在R T 计算。

公开(公告)号：CA2655480A1

公开(公告)日：2008-01-03

申请号：CA2655480

申请日：2007-06-27

Applicant: ESSILOR INT

Inventor： ARROUY FREDERIC ,  BEINAT OLIVIER ,  NOUVELOT LUC ,  THOMAS MICHELE

IPC: G02B1/11

Abstract: The present invention relates to an optical article having anti-reflectio n properties and high thermal resistance, comprising a substrate having at l east one main face coated with a multi-layer anti-reflection coating compris ing a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio:RT sum of the physical thicknesse s of the low refractive index layers of the anti-reflection coating/sum of t he physical thicknesses of the high refractive index layers of the anti-refl ection coating is higher than 2.1. If the anti-reflection stack comprises at least one low refractive index layer having a physical thickness >=100nm which is not the outermost layer of the anti-reflection coating, said relat ively thick layer and the underlying layers are not taken into account in RT calculation.

公开(公告)号：DE69512051T2

公开(公告)日：2000-03-09

申请号：DE69512051

申请日：1995-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：BRPI0714043A2

公开(公告)日：2012-12-18

申请号：BRPI0714043

申请日：2007-06-27

Applicant: ESSILOR INT

Inventor： ARROUY FREDERIC ,  BEINAT OLIVIER ,  NOUVELOT LUC ,  THOMAS MICHELE

IPC: G02B1/11

Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio: R T = sum ⁢⁢ of ⁢⁢ the ⁢⁢ physical ⁢⁢ thicknesses ⁢⁢ of ⁢⁢ the low ⁢⁢ refractive ⁢⁢ index ⁢⁢ layers ⁢⁢ of ⁢⁢ the ⁢ anti ⁢ - ⁢ reflection ⁢⁢ coating sum ⁢⁢ of ⁢⁢ the ⁢⁢ physical ⁢⁢ thicknesses ⁢⁢ of ⁢⁢ the high ⁢⁢ refractive ⁢⁢ index ⁢⁢ layers ⁢⁢ of ⁢⁢ the ⁢ anti ⁢ - ⁢ reflection ⁢⁢ coating is higher than 2.1. If the anti-reflection stack comprises at least one low refractive index layer having a physical thickness ≧100 nm which is not the outermost layer of the anti-reflection coating, said relatively thick layer and the underlying layers are not taken into account in RT calculation.

公开(公告)号：DE602008006525D1

公开(公告)日：2011-06-09

申请号：DE602008006525

申请日：2008-01-18

Applicant: ESSILOR INT

Inventor： RYCHEL DOMINIQUE ,  WILLEMIN GERARD ,  NOUVELOT LUC ,  DE AYGUAVIVES FRANCISCO

IPC: C23C14/50 ,  G02B7/02

公开(公告)号：FR2882443B1

公开(公告)日：2007-04-13

申请号：FR0550479

申请日：2005-02-21

Applicant: ESSILOR INT

Inventor： CAMELIO SOPHIE ,  GIRARDEAU THIERRY ,  MAITRE NICOLAS ,  NOUVELOT LUC

IPC: G02B1/10

Abstract: The present invention relates to a substrate comprising two main sides, at least one of which comprises a non-reflecting coating, characterized in that an air-contacting outer layer is deposited onto said non-reflecting coating, said outer layer having a thickness of 10 nm or less, a surface energy of less than 60 mJ/m 2 and a surface presenting a contact angle with oleic acid of less than 70°.

公开(公告)号：DE69512051D1

公开(公告)日：1999-10-14

申请号：DE69512051

申请日：1995-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：AU2007264948B2

公开(公告)日：2013-01-31

申请号：AU2007264948

申请日：2007-06-27

Applicant: ESSILOR INT

Inventor： ARROUY FREDERIC ,  BEINAT OLIVIER ,  THOMAS MICHELE ,  NOUVELOT LUC

IPC: G02B1/11

Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio:R

公开(公告)号：FR2917510B1

公开(公告)日：2012-01-27

申请号：FR0755749

申请日：2007-06-13

Applicant: ESSILOR INT

Inventor： NOUVELOT LUC ,  ROTTE JOHANN ,  SCHERER KARIN ,  VALLET DANIEL

IPC: G02B1/11

公开(公告)号：AU2007264948A1

公开(公告)日：2008-01-03

申请号：AU2007264948

申请日：2007-06-27

Applicant: ESSILOR INT

Inventor： THOMAS MICHELE ,  BEINAT OLIVIER ,  ARROUY FREDERIC ,  NOUVELOT LUC

IPC: G02B1/11

Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio: R T = sum ⁢⁢ of ⁢⁢ the ⁢⁢ physical ⁢⁢ thicknesses ⁢⁢ of ⁢⁢ the low ⁢⁢ refractive ⁢⁢ index ⁢⁢ layers ⁢⁢ of ⁢⁢ the ⁢ anti ⁢ - ⁢ reflection ⁢⁢ coating sum ⁢⁢ of ⁢⁢ the ⁢⁢ physical ⁢⁢ thicknesses ⁢⁢ of ⁢⁢ the high ⁢⁢ refractive ⁢⁢ index ⁢⁢ layers ⁢⁢ of ⁢⁢ the ⁢ anti ⁢ - ⁢ reflection ⁢⁢ coating is higher than 2.1. If the anti-reflection stack comprises at least one low refractive index layer having a physical thickness ≧100 nm which is not the outermost layer of the anti-reflection coating, said relatively thick layer and the underlying layers are not taken into account in RT calculation.