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1.发明公开Method and apparatus for actively monitoring an inductively-coupled plasma ion source using an optical spectrometer 审中-公开方法和装置用于监测活性感应耦合等离子体离子源与光学光谱仪
公开(公告)号：EP2642507A2
公开(公告)日：2013-09-25
申请号：EP13159842.7
申请日：2013-03-19
Applicant: FEI COMPANY
Inventor： Utlaut, Mark , Kellogg, Sean , Parker, N. William , Graupera, Anthony , Zhang, Shouyin , Brundage, Philip , Kinion, Doug
IPC: H01J37/08 , H01J37/304 , H01J37/305
CPC classification number: H01J37/08 , H01J37/304 , H01J37/3056 , H01J2237/022 , H01J2237/0225 , H01J2237/31749
Abstract: A method and apparatus for actively monitoring conditions of a plasma source for adjustment and control of the source and to detect the presence of unwanted contaminant species in a plasma reaction chamber (220). Preferred embodiments include a spectrometer (252) used to quantify components of the plasma. A system controller is provided that uses feedback loops based on spectral analysis of the plasma to regulate the ion composition of the plasma source. The system also provides end pointing means based on spectral analysis to determine when cleaning of the plasma source is completed.
Abstract translation: 一种用于主动监控用于源的调整和控制等离子体源的条件，并检测在等离子体反应室（220）不想要的污染物种类的存在的方法和装置。 优选实施方案包括用于量化所述等离子体的部件的光谱仪（252）。 本发明提供一种系统控制器那样采用基于等离子体的光谱分析反馈回路以调节等离子体源的离子组合物。 因此，该系统提供基于频谱分析来确定矿在清洁等离子源的完成结束指示装置。
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2.发明公开Method and apparatus for actively monitoring an inductively-coupled plasma ion source using an optical spectrometer 审中-公开方法和装置用于监测活性感应耦合等离子体离子源与光学光谱仪
公开(公告)号：EP2642507A3
公开(公告)日：2015-09-02
申请号：EP13159842.7
申请日：2013-03-19
Applicant: FEI COMPANY
Inventor： Utlaut, Mark , Kellogg, Sean , Parker, N. William , Graupera, Anthony , Zhang, Shouyin , Brundage, Philip , Kinion, Doug
IPC: H01J37/08 , H01J37/304 , H01J37/305
CPC classification number: H01J37/08 , H01J37/304 , H01J37/3056 , H01J2237/022 , H01J2237/0225 , H01J2237/31749
Abstract: A method and apparatus for actively monitoring conditions of a plasma source for adjustment and control of the source and to detect the presence of unwanted contaminant species in a plasma reaction chamber (220). Preferred embodiments include a spectrometer (252) used to quantify components of the plasma. A system controller is provided that uses feedback loops based on spectral analysis of the plasma to regulate the ion composition of the plasma source. The system also provides end pointing means based on spectral analysis to determine when cleaning of the plasma source is completed.
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