公开(公告)号：AT468550T

公开(公告)日：2010-06-15

申请号：AT01106429

申请日：2001-03-22

Applicant: FUJIFILM CORP

Inventor： FUJITA KAZUO ,  TAN SHIRO ,  NAGASHIMA AKIRA

IPC: G03F7/022 ,  G03F7/033 ,  B41N1/14 ,  G03F7/00 ,  G03F7/023

Abstract: The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.

公开(公告)号：DE69941227D1

公开(公告)日：2009-09-17

申请号：DE69941227

申请日：1999-04-06

Applicant: FUJIFILM CORP

Inventor： KAWAUCHI IKUO ,  AKIYAMA KEIJI ,  WATANABE NORIAKI ,  KAWAMURA KOICHI ,  FUJITA KAZUO ,  SERIKAWA TAKESHI ,  NAGASHIMA AKIRA

IPC: G03F7/004 ,  B41C1/10 ,  B41M5/36 ,  G03F7/023 ,  G03F7/032 ,  G03F7/033

Abstract: The present invention relates to(A) a photosensitive resin composition containing a high molecular compound having at least three specific constituting components as copolymer components, whereof the first one comprises a perfluoroalkyl group, and an o-quiononediazide compound; and(B) a photosensitive lithographic printing plate comprising a support having coated thereon a photosensitive layer containing the following components (a), (b) and (c),(a) an o-naphtoquinonediazide compound,(b) a resin soluble in an alkaline aqueous solution, and(c) a polymer having a (meth)acrylate monomer having two or three perfluoroalkyl groups having from 3 to 20 carbon atoms in the molecule as a polymer component.

公开(公告)号：DE60142142D1

公开(公告)日：2010-07-01

申请号：DE60142142

申请日：2001-03-22

Applicant: FUJIFILM CORP

Inventor： FUJITA KAZUO ,  TAN SHIRO ,  NAGASHIMA AKIRA

IPC: G03F7/022 ,  G03F7/033 ,  B41N1/14 ,  G03F7/00 ,  G03F7/023

公开(公告)号：JP2007286515A

公开(公告)日：2007-11-01

申请号：JP2006116049

申请日：2006-04-19

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUJITA KAZUO

IPC: G03F7/038 ,  B05D7/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide a method for preparing a coating liquid for a plate making layer, with which a coating liquid for producing a negative lithographic printing plate material having superior stability at storage and high sensitivity is obtained, and to provide a method for producing a negative lithographic printing plate that uses the coating liquid for a plate making layer.
SOLUTION: The method for preparing a coating liquid for a plate making layer comprises a first step of adjusting the pH of an acid-crosslinkable compound to be in a range of 2.5-6, and a second step of preparing a coating liquid for a plate making layer, by mixing the acid-crosslinkable compound of which the pH has been adjusted to above range, an alkali-soluble resin, an acid generator and an infrared absorber. The method for producing a lithographic printing material includes applying the coating liquid for a plate making layer onto a support to form a plate making layer.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制备用于制版层的涂布液的方法，通过该方法获得用于生产具有优异的储存稳定性和高灵敏度的负版印刷版材料的涂布液，并提供 制造使用涂布液作为制版层的负版印刷版的方法。 解决方案：制备用于制版层的涂布液的方法包括将酸交联化合物的pH调节至2.5-6的第一步骤，以及制备涂布液的第二步骤 对于制版层，通过将调节了pH的酸交联性化合物与上述范围进行混合，得到碱溶性树脂，酸发生剂和红外线吸收剂。 平版印刷材料的制造方法包括将用于制版层的涂布液涂布在载体上以形成制版层。 版权所有（C）2008，JPO＆INPIT