公开(公告)号：KR20180069115A

公开(公告)日：2018-06-22

申请号：KR20187016734

申请日：2009-12-11

Applicant: FUJIFILM CORP

Inventor： SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041

Abstract: (A) 산의작용에의해알칼리현상액에서의용해성이증가할수 있는수지, (B) 활성광선또는방사선조사시산을발생할수 있는화합물, 및 (C) 1개이상의극성변환기를갖고, 불소원자또는규소원자중 1개이상을갖는반복단위(c)를포함하는수지를포함하는것을특징으로하는감활성광선성또는감방사선성수지조성물이제공된다.

公开(公告)号：WO2010067905A3

公开(公告)日：2011-01-27

申请号：PCT/JP2009071189

申请日：2009-12-11

Applicant: FUJIFILM CORP ,  HIRANO SHUJI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  IIZUKA YUSUKE

Inventor： HIRANO SHUJI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  IIZUKA YUSUKE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC classification number: C07D307/93 ,  C07D407/12 ,  C07D493/08 ,  C07D493/18 ,  C07D495/18 ,  C08F24/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（C）至少具有氟原子或硅原子的树脂，并含有（c）具有至少两个以上极性转换基团的重复单元。

公开(公告)号：WO2010067898A3

公开(公告)日：2011-01-27

申请号：PCT/JP2009071068

申请日：2009-12-11

Applicant: FUJIFILM CORP ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

Inventor： SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.

Abstract translation: 本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含：（A）能够通过酸的作用增加在碱性显影剂中的溶解性的树脂，（B）在照射时能够产生酸的化合物 光化射线或辐射，以及（C）含有（c）具有至少一个极性转换基并且至少具有氟原子或硅原子的重复单元的树脂。

公开(公告)号：DE60232763D1

公开(公告)日：2009-08-13

申请号：DE60232763

申请日：2002-07-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  SORORI TADAHIRO

IPC: B41M5/36 ,  G03F7/004 ,  B41C1/10 ,  B41N1/14 ,  C07C211/62 ,  C07D211/42 ,  C07D211/46 ,  C07D217/10 ,  C07D295/02 ,  C07D295/037 ,  C07D295/06 ,  C07D295/073 ,  C07D295/08 ,  C07D295/096 ,  C07D295/10 ,  C07D295/108 ,  C07D295/12 ,  C07D295/14 ,  C07D295/155 ,  C07D295/16 ,  C07D295/192 ,  C07D471/06 ,  C07D471/10 ,  C07D487/10 ,  G03F7/00

Abstract: An image forming material includes an image forming layer containing a water-insoluble and alkali-soluble resin, a light-heat converting agent and a compound represented by the following general formula (1). In general formula (1), R to R independently represent an organic group, where R represents a residue forming a ring containing a N atom, R and R may bond to each other to form a ring or at least one of R and R may bond to R to form a ring and X represents a conjugate base of an organic acid or inorganic acid. The ring containing the N atom is preferably a piperidine ring.

公开(公告)号：AT532102T

公开(公告)日：2011-11-15

申请号：AT09178831

申请日：2009-12-11

Applicant: FUJIFILM CORP

Inventor： HIRANO SHUJI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C07H13/04

公开(公告)号：DE602007002733D1

公开(公告)日：2009-11-26

申请号：DE602007002733

申请日：2007-03-14

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KODAMA KUNIHIKO ,  YOSHIDA YUKO ,  YAMAMOTO KEI

IPC: G03F7/039

Abstract: A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.

公开(公告)号：DE60137398D1

公开(公告)日：2009-03-05

申请号：DE60137398

申请日：2001-11-30

Applicant: FUJIFILM CORP

Inventor： MIYAKE HIDEO ,  ODA AKIO ,  MITSUMOTO TOMOYOSHI ,  IWATO KAORU

IPC: B41C1/10

Abstract: The present invention relates to a positive planographic printing plate precursor, comprising a support having disposed thereon a positive recording layer containing (A) a water-insoluble and alkali-soluble resin, (B) an infrared absorbent and (C) an organic quaternary ammonium salt, wherein solubility of the recording layer in an aqueous alkali solution is increased by exposure to an infrared laser, wherein the organic quaternary ammonium salt (C) has in a molecule thereof at least one of an aryl group and a carbonyl group.

公开(公告)号：AT526322T

公开(公告)日：2011-10-15

申请号：AT09178830

申请日：2009-12-11

Applicant: FUJIFILM CORP

Inventor： IIZUKA YUSUKE ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI

IPC: C07D307/93 ,  C07D407/12 ,  C07D493/08 ,  C07D493/18 ,  C07D495/18 ,  C08F24/00 ,  G03F7/039

Abstract: A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R 2 represents a single bond or an alkylene group; R 3 represents a hydrocarbon group in which hydrogen atoms are substituted with a fluorine atom; R 4 represents a halogen atom, a cyano group, a hydroxyl group, an amide group, an alkyl group, a cycloalkyl group, an alkoxy group, a phenol group, an acyl group, an alkoxycarbonyl group, or a group represented by R-C(=O)- or R-C(=O)O-, wherein R represents an alkyl group or a cycloalkyl group; X represents an alkylene group, an oxygen atom or a sulfur atom; Z represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond or urea bond; n represents an integer of from 0 to 5; and m represents an integer of from 0 to 7.

公开(公告)号：AT497882T

公开(公告)日：2011-02-15

申请号：AT08018150

申请日：2001-11-30

Applicant: FUJIFILM CORP

Inventor： MIYAKE HIDEO ,  ODA AKIO ,  MITSUMOTO TOMOYOSHI ,  IWATO KAORU

IPC: B41C1/10

Abstract: The present invention relates to a positive planographic printing plate precursor, comprising a support having disposed thereon a positive recording layer containing (A) a water-insoluble and alkali-soluble resin, (B) an infrared absorbent and (C) an organic quaternary ammonium salt, wherein solubility of the recording layer in an aqueous alkali solution is increased by exposure to an infrared laser, wherein the organic quaternary ammonium salt (C) has in a molecule thereof at least one of an aryl group and a carbonyl group.

公开(公告)号：AT445862T

公开(公告)日：2009-10-15

申请号：AT07005242

申请日：2007-03-14

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KODAMA KUNIHIKO ,  YOSHIDA YUKO ,  YAMAMOTO KEI

IPC: G03F7/039

Abstract: A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.