公开(公告)号：KR20180039671A

公开(公告)日：2018-04-18

申请号：KR20187006615

申请日：2016-08-31

Applicant: FUJIFILM CORP

Inventor： NIHASHI WATARU ,  TSUBAKI HIDEAKI ,  TSUCHIHASHI TORU ,  YAMAMOTO KEI

IPC: G03F7/26 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/42

CPC classification number: G03F7/11 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: 특히극미세의잔류패턴의형성에있어서, 막감소가적어, 높은해상력을얻을수 있는패턴형성방법, 상기패턴형성방법을포함하는전자디바이스의제조방법, 및상기패턴을형성하기위한적층체를제공한다. 패턴형성방법으로서, (a) 감활성광선성또는감방사선성조성물에의하여감활성광선성또는감방사선성막을형성하는공정, (b) 감활성광선성또는감방사선성막상에상층막형성용조성물에의하여상층막을형성하는공정, (c) 상층막이형성된감활성광선성또는감방사선성막을노광하는공정, 및 (d) 노광된감활성광선성또는감방사선성막을, 현상액으로현상하는공정을포함하고, 상층막형성용조성물이, 가교제를포함한다. 전자디바이스의제조방법은, 상기패턴형성방법을포함한다. 적층체는, 감활성광선성또는감방사선성막과, 가교제를포함하는상층막을갖는다.

公开(公告)号：DE602007002733D1

公开(公告)日：2009-11-26

申请号：DE602007002733

申请日：2007-03-14

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KODAMA KUNIHIKO ,  YOSHIDA YUKO ,  YAMAMOTO KEI

IPC: G03F7/039

Abstract: A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.

公开(公告)号：SG11201500151WA

公开(公告)日：2015-02-27

申请号：SG11201500151W

申请日：2013-08-19

Applicant: FUJIFILM CORP

Inventor： YAMANAKA TSUKASA ,  IGUCHI NAOYA ,  UEBA RYOSUKE ,  YAMAMOTO KEI

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/40

公开(公告)号：AT445862T

公开(公告)日：2009-10-15

申请号：AT07005242

申请日：2007-03-14

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KODAMA KUNIHIKO ,  YOSHIDA YUKO ,  YAMAMOTO KEI

IPC: G03F7/039

Abstract: A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.

公开(公告)号：EP2864839A4

公开(公告)日：2016-12-28

申请号：EP13793930

申请日：2013-05-23

Applicant: FUJIFILM CORP

Inventor： ITO JUNICHI ,  YAMAGUCHI SHUHEI ,  TAKAHASHI HIDENORI ,  YAMAMOTO KEI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/22 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/325 ,  G03F7/40 ,  H01L21/027 ,  H01L21/0273

公开(公告)号：EP2255250A4

公开(公告)日：2012-10-31

申请号：EP09724389

申请日：2009-03-26

Applicant: FUJIFILM CORP

Inventor： YAMAMOTO KEI ,  SHIBUYA AKINORI

IPC: G03F7/004 ,  C08F20/10 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0007 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/111

Abstract: A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.

公开(公告)号：EP2891014A4

公开(公告)日：2017-03-08

申请号：EP13832915

申请日：2013-08-19

Applicant: FUJIFILM CORP

Inventor： YAMANAKA TSUKASA ,  IGUCHI NAOYA ,  UEBA RYOSUKE ,  YAMAMOTO KEI

IPC: G03F7/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/40

CPC classification number: G03F7/2022 ,  G03F7/0035 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/70466

Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.

公开(公告)号：EP2329320A4

公开(公告)日：2012-10-31

申请号：EP09816304

申请日：2009-09-25

Applicant: FUJIFILM CORP

Inventor： YAMAMOTO KEI ,  SAEGUSA HIROSHI

IPC: G03F7/039 ,  C08F20/12 ,  G03F7/004 ,  G03F7/075 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/039 ,  C09D133/16 ,  C09D133/26 ,  C09D143/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/122 ,  Y10S430/126

Abstract: A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass % based on all solvents of the mixed solvent (D).

公开(公告)号：JP2011257613A

公开(公告)日：2011-12-22

申请号：JP2010132410

申请日：2010-06-09

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAMOTO KEI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/04 ,  C08F20/10 ,  C08F20/28 ,  C08F20/54 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition which can provide a pattern having improved uniformity of coating film thickness and excellent size uniformity in the wafer surface on which the pattern has been formed by liquid immersion exposure, and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin which has a repeating unit represented by the following general formula (A1) and increases its dissolution rate in an alkali developer by an action of an acid; (B) a compound which generates an acid by irradiation with actinic rays or radiation; and (C) a resin which comprises a repeating unit having a lactone structure substituted by a group having a fluorine atom. (In the formula, Rrepresents a hydrogen atom, an alkyl group, a fluoroalkyl group, a halogen atom or CHOH; Rrepresents an alkylene group, a cycloalkylene group or a bivalent connecting group that is formed by combining them; n represents an integer of 0-5; if n is 2 or more, a plurality of Rmay be the same or different.)

Abstract translation: 要解决的问题：提供一种光化射线敏感或辐射敏感性树脂组合物，其可以提供在通过液浸曝光形成图案的晶片表面中具有改善的涂膜厚度均匀性和优异的尺寸均匀性的图案 ，以及使用该组合物的图案形成方法。 光敏射线敏感性或辐射敏感性树脂组合物含有：（A）具有下列通式（A1）所示的重复单元的树脂，并通过作用于 酸; （B）通过用光化射线或辐射照射产生酸的化合物; 和（C）含有被具有氟原子的基团取代的内酯结构的重复单元的树脂。 （式中，R 1 表示氢原子，烷基，氟代烷基，卤素原子或CH 2。 OH; R 2 表示通过组合形成的亚烷基，亚环烷基或二价连接基团; n表示0-5的整数;如果n为2或 更多，多个R 2 可以相同或不同。）版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010250072A

公开(公告)日：2010-11-04

申请号：JP2009099400

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  YAMAMOTO KEI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition having an effect of improving a spread bottom profile of a resist pattern, with which a pattern having few pattern collapse defects is formed, and to provide a method for forming a pattern by using the composition. SOLUTION: The composition includes (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, and (C) a resin containing at least either a fluorine atom or a silicon atom and containing a polarity conversion group that is decomposed by an action of an alkali developing solution to increases the solubility with the alkali developing solution, wherein the resin component (A) contains a repeating unit obtained from an ester compound expressed by general formula (1). In general formula (1), A 1 represents a polymerizable functional group having a carbon-carbon double bond; A 2 represents a divalent group selected from furan-diyl, tetrahydrofuran-diyl and oxanorbornan-diyl; R 1 and R 2 each independently represent a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group; or R 1 and R 2 may be bonded to form an aliphatic hydrocarbon ring together with carbon atoms bonding thereto; and R 3 represents a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group which may include a hydrogen atom or a hetero atom. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有改善抗蚀剂图案的扩散底部轮廓的效果的活性射线敏感或辐射敏感性树脂组合物，由此形成具有很少图案塌陷缺陷的图案，并提供 通过使用该组合物形成图案的方法。 该组合物包含（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂，（B）通过用活性射线或辐射照射产生酸的化合物和（C ）含有至少一个氟原子或硅原子的树脂，并含有通过碱性显影液的作用分解的极性转换基团以增加与碱性显影液的溶解度，其中树脂组分（A）含有 由通式（1）表示的酯化合物得到的重复单元。 在通式（1）中，A 1 表示具有碳 - 碳双键的聚合性官能团; A 2 表示选自呋喃二基，四氢呋喃 - 二基和氧杂二甘醇二基的二价基团; R 1 和R 2 各自独立地表示1C-10C直链，支链或环状的一价烃基; 或R 1 和R 2 可与键合的碳原子一起形成脂族烃环; R 3表示可以包含氢原子或杂原子的1C-10C直链，支链或环状的一价烃基。 版权所有（C）2011，JPO＆INPIT