Abstract:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN_A-X+ (I)
Abstract:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN-A−X+ (I)
Abstract:
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition with reduced blob defects, which is suitable for not only a normal dry process but for an immersion process, and to provide a resist film and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a fluorine-containing compound (A) that generates an acid by irradiation with actinic rays or radiation. The resin composition is characterized in that the acid has a polarity converting group and that the fluorine content of the fluorine-containing compound (A) is 20% or more with respect to the molecular weight of the fluorine-containing compound (A).