公开(公告)号：SG178526A1

公开(公告)日：2012-03-29

申请号：SG2012012027

申请日：2010-08-17

Applicant: FUJIFILM CORP

Inventor： SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  KATO TAKAYUKI ,  TANGO NAOHIRO

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (PA) a compound having a proton acceptor functional group and undergoing decomposition upon irradiation with an actinic ray or radiation to generate a compound reduced in or deprived of proton acceptor property or changed to be acidic from being proton acceptor-functioning, wherein a molar extinction coefficient e of the compound (PA) at a wavelength of 193 nm as measured in acetonitrile solvent is 55,000 or less, and a pattern forming method using the composition are provided.

公开(公告)号：SG192982A1

公开(公告)日：2013-09-30

申请号：SG2013065016

申请日：2012-02-24

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI HIDENORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO ,  SAITOH SHOICHI

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

公开(公告)号：SG186712A1

公开(公告)日：2013-02-28

申请号：SG2012091492

申请日：2011-02-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  ENOMOTO YUICHIRO ,  MIZUTANI KAZUYOSHI ,  TSUCHIHASHI TORU ,  FUJII KANA

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

公开(公告)号：SG184290A1

公开(公告)日：2012-11-29

申请号：SG2012071619

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  KAMIMURA SOU ,  TSUCHIHASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  MIZUTANI KAZUYOSHI ,  TARUTANI SHINJI ,  KATO KEITA

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.

公开(公告)号：SG183808A1

公开(公告)日：2012-10-30

申请号：SG2012061438

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  TARUTANI SHINJI ,  TSUCHIHASHI TORU ,  KAMIMURA SOU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI

Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and &Dgr;SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. &Dgr;SP=SPF-SPI •••(1)

公开(公告)号：SG178171A1

公开(公告)日：2012-03-29

申请号：SG2012006540

申请日：2010-08-27

Applicant: FUJIFILM CORP

Inventor： KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  TOMEBA HISAMITSU

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN_A-X+ (I)

公开(公告)号：EP2550562A4

公开(公告)日：2013-11-20

申请号：EP11759653

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  TARUTANI SHINJI ,  TSUCHIHASHI TORU ,  KAMIMURA SOU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  Y10T428/24

Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and &Dgr;SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. &Dgr;SP=SPF−SPI  (1)

Abstract translation: 提供了一种形成图案的方法，确保优异的曝光宽容度（EL）和聚焦纬度（焦深DOF）。 形成图案的方法包括（A）从抗蚀剂组合物形成膜，抗蚀剂组合物，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜，从而形成 负模式。 抗蚀剂组合物含有（a）在被酸作用时被分解的树脂，下式（1）表示的＆Dgr; SP为2.5（MPa）1/2以上，（b） 被组合以在暴露于光化射线或辐射时产生酸，和（c）溶剂。 ＆DGR; SP = SPF-SPI（1）

公开(公告)号：EP2539769A4

公开(公告)日：2013-11-20

申请号：EP11747578

申请日：2011-02-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  ENOMOTO YUICHIRO ,  MIZUTANI KAZUYOSHI ,  TSUCHIHASHI TORU ,  FUJII KANA

IPC: G03F7/038 ,  C08F220/28 ,  C08F232/00 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24479

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

Abstract translation: 提供一种形成图案的方法，其确保极好的灵敏度，限制分辨率，粗糙度特性，曝光宽容度（EL），曝光后烘焙（PEB）温度和焦点宽容度（焦深DOF）的依赖性，以及抗蚀剂组合物 用于该方法中。 该方法包括：（A）由抗蚀剂组合物形成膜，所述抗蚀剂组合物包含含有重复单元的树脂，所述重复单元含有在被酸作用时分解从而产生醇羟基的基团，因此该树脂因此当被酸作用时降低 其在含有有机溶剂的显影液中的溶解性，（B）将该膜曝光，以及（C）使用含有有机溶剂的显影液使曝光的显影液显影。

公开(公告)号：EP2681623A4

公开(公告)日：2015-05-06

申请号：EP12752967

申请日：2012-02-24

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI HIDENORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO ,  SAITOH SHOICHI

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

公开(公告)号：EP2470958A4

公开(公告)日：2014-03-26

申请号：EP10812107

申请日：2010-08-27

Applicant: FUJIFILM CORP

Inventor： KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  TOMEBA HISAMITSU

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/11 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN-A−X+  (I)