公开(公告)号：KR20180067588A

公开(公告)日：2018-06-20

申请号：KR20187013001

申请日：2016-11-15

Applicant: FUJIFILM CORP

Inventor： YAMADA SATORU ,  KANEKO WAKAHIKO ,  TANABE HIDETO

IPC: G02F1/1333 ,  C08J3/24 ,  G02F1/1337 ,  G09F9/30 ,  G09F9/35

CPC classification number: G02F1/1333 ,  G02F1/1337 ,  G09F9/00 ,  G09F9/30

Abstract: 본발명은, 시인측에컬러필터를마련한경우이더라도우수한평탄성을유지하고, 또한고온고습하에노출된경우에도표시성능이양호한액정표시장치및 그제조방법을제공하는것을과제로한다. 본발명의액정표시장치는, 시인측으로부터, 제1 기판과, 액정층과, 제2 기판을이 순서로갖는액정표시장치로서, 제1 기판이, 기재와, 배향보호층을구비하고, 제2 기판이, 기재와, 박막트랜지스터와, 표시전극과, 배향막을구비하며, 배향보호층이액정층과접하는면을갖고, 배향보호층이공유결합을통하여서로연결된배향성기및 가교구조를가지며, 비행시간형 2차이온질량분석법으로검출되는배향성기에서유래하는프래그먼트에대하여, 배향보호층의액정층에접하는면에있어서의프래그먼트의강도 ELq와, 배향보호층의기재측의면에있어서의프래그먼트의강도 ESub가소정의관계를충족시키고, 가교구조가소정의구조식으로나타나는, 액정표시장치이다.

公开(公告)号：AT547790T

公开(公告)日：2012-03-15

申请号：AT09161660

申请日：2009-06-02

Applicant: FUJIFILM CORP

Inventor： YAMADA SATORU ,  WATANABE TORU

IPC: G11B7/245

公开(公告)号：AT535909T

公开(公告)日：2011-12-15

申请号：AT08007651

申请日：2008-04-18

Applicant: FUJIFILM CORP

Inventor： YAMADA SATORU

IPC: G11B7/244 ,  G03H1/02 ,  G11B7/24 ,  G11B7/245 ,  G11B7/249 ,  G11B7/253 ,  G11B7/258

Abstract: The present invention provides an optical recording composition and a holographic recording medium comprising a recording layer formed with the optical recording composition. The optical recording composition comprises a bicyclic cyclopropane derivative denoted by General Formula (1). In General Formula (I), R 1 denotes an alkylene group or arylene group, R 2 denotes an alkyl group, aryl group, or hetetocyclic group, X denotes a divalent linking group selected from the group consisting of -COO-, -CONH-, -OCO-, -NH-, -O-, -S-, -CO-, -SO 2 -, -SO 8 -, and -SO 2 NH-, n and m each independently denote an integer ranging from 0 to 8, with n+m being an integer ranging from 0 to 8, Y denotes a divalent linking group selected from the group consisting of -CR 3 R 4 -, -O-, and -S-, R 3 and R 4 each independently denote a hydrogen atom, alkyl group, aryl group, alkoxycarbonyl group, or aryloxycarbonyl group, r denotes an integer ranging from 1 to 4.

公开(公告)号：EP3142160A4

公开(公告)日：2017-05-24

申请号：EP15788651

申请日：2015-04-21

Applicant: FUJIFILM CORP

Inventor： NAGATA YUZO ,  TAKIZAWA HIROO ,  YAMADA SATORU

IPC: H01L51/30 ,  C08F212/14 ,  C08F220/02 ,  H01L29/786 ,  H01L51/05

CPC classification number: H01L51/004 ,  C08F220/06 ,  C08F220/18 ,  C08F220/28 ,  C08F220/32 ,  C08F2220/285 ,  H01L51/0043 ,  H01L51/052 ,  H01L51/0545

Abstract: A semiconductor element which comprises a semiconductor layer and an insulating layer that is adjacent to the semiconductor layer, and wherein the insulating layer is formed of a crosslinked product of a polymer compound that has a repeating unit (IA) represented by general formula (IA) and a repeating unit (IB) represented by general formula (IB); and an insulating layer-forming composition for forming an insulating layer of a semiconductor element, which contains a polymer compound that has the repeating structures (IA) and (IB). (In general formulae, each of R1a and R1b independently represents a hydrogen atom, a halogen atom or an alkyl group; each of L1a, L2a and L1b independently represents a single bond or a linking group; X represents a crosslinkable group; Y B represents a decomposable group or a hydrogen atom; each of m1a and m2a independently represents an integer of 1-5; and each * represents a bonding position of the repeating units.)

Abstract translation: 一种半导体元件，包括半导体层和与所述半导体层相邻的绝缘层，所述绝缘层由具有由通式（IA）表示的重复单元（IA）的聚合物化合物的交联产物形成， 和由通式（IB）表示的重复单元（IB）; 以及用于形成半导体元件的绝缘层的绝缘层形成用组合物，其含有具有重复结构（IA）和（IB）的高分子化合物。 （在通式中，R1a和R1b各自独立地表示氢原子，卤原子或烷基; L1a，L2a和L1b各自独立地表示单键或连接基团; X表示可交联基团; YB表示 可分解基团或氢原子; m1a和m2a中的每一个独立地表示1-5的整数;每个*表示重复单元的键合位置。）

公开(公告)号：EP2176714A4

公开(公告)日：2010-10-27

申请号：EP08764042

申请日：2008-06-06

Applicant: FUJIFILM CORP

Inventor： USAMI YOSHIHISA ,  YAMADA SATORU ,  SASAKI TOSHIO ,  SUZUKI HIROYUKI ,  KAMO MAKOTO

IPC: G03H1/04 ,  B23Q15/22

CPC classification number: G03H1/0486 ,  G02F1/01 ,  G03H1/02 ,  G03H1/0402 ,  G03H1/14 ,  G03H2001/0232 ,  G03H2001/0264 ,  G03H2001/0491 ,  G03H2001/186 ,  G03H2227/03 ,  G03H2260/12

公开(公告)号：JP2013218263A

公开(公告)日：2013-10-24

申请号：JP2012199129

申请日：2012-09-11

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： HIKITA MASANORI ,  SUGIHARA KOICHI ,  KASHIWAGI DAISUKE ,  YAMADA SATORU

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with excellent sensitivity, coating properties and liquid-crystal contamination property (electrical characteristic).SOLUTION: The positive photosensitive resin composition for electronic components of the invention is characterized by including: (A) a polymer formed by at least copolymerizing (a1) a structural unit having a residue obtained from an acid group protected by an acid degradable group and (a2) a structural unit having a cross-linking group; (B) a photoacid generator; and (C) a chain aliphatic epoxy compound.

Abstract translation: 本发明的电子部件用正型感光性树脂组合物的特征在于，包括：（A）和 通过至少共聚合（a1）由具有由酸可降解基团保护的酸基获得的残基的结构单元和（a2）具有交联基团的结构单元至少共聚而形成的聚合物; （B）光致酸发生器; 和（C）链脂族环氧化合物。

公开(公告)号：JP2013190507A

公开(公告)日：2013-09-26

申请号：JP2012055359

申请日：2012-03-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMADA SATORU ,  ANDO TAKESHI

IPC: G03F7/039 ,  C08F12/22 ,  G03F7/004 ,  H01L21/027 ,  H01L51/50 ,  H05B33/22

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition with a high sensitivity, a low unexposed residual film ratio, a low relative dielectric constant, and an excellent dry etching resistance.SOLUTION: The positive photosensitive resin composition contains (A) a component containing a polymer satisfying at least one of (1) and (2) described below, (B) a photoacid generator, and (D) a solvent, with: (1) a polymer comprising a constitutional unit (a1) having a residue of protecting an acid group with an acid decomposable group, and a constitutional unit (a2) represented by the specified general formula; (2) a polymer comprising the constitutional unit (a1) and a polymer comprising the constitutional unit (a2).

Abstract translation: 要解决的问题：提供具有高灵敏度，低曝光残留膜比例，低相对介电常数和优异的耐干蚀刻性的正型感光性树脂组合物。解决方案：正型感光性树脂组合物含有（A）成分 含有满足下述（1）和（2）中的至少一个的聚合物，（B）光致酸产生剂和（D）溶剂，其具有：（1）包含结构单元（a1）的聚合物，其具有 用酸可分解基团保护酸基，和由指定的通式表示的结构单元（a2）; （2）包含结构单元（a1）的聚合物和包含结构单元（a2）的聚合物。

公开(公告)号：JP2013083937A

公开(公告)日：2013-05-09

申请号：JP2012180770

申请日：2012-08-17

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： HIKITA MASANORI ,  YAMAZAKI KENTA ,  YAMADA SATORU

IPC: G03F7/039 ,  C08F220/26 ,  C08G59/42 ,  G02F1/1333 ,  G03F7/004 ,  G03F7/40 ,  H01L51/50 ,  H05B33/10 ,  H05B33/22

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent storage stability, giving a cured film excellent in reliability (particularly in chemical resistance) and having a wide exposure margin and development margin in producing a cured film.SOLUTION: The photosensitive resin composition comprises: (A) a polymer component having (a1) a repeating unit derived from a monomer having a carboxyl group protected by an acid decomposable group and/or a repeating unit derived from a monomer having a phenolic hydroxyl group protected by an acid decomposable group, and (a2) a repeating unit having a crosslinking group, in the same polymer and/or in different polymers; (B) a compound containing an oxime sulfonate residue expressed by general formula (b1); and (C) a solvent. The composition contains, as the solvent, at least one kind of solvent having a boiling point of lower than 180°C and at least one kind of solvent having a boiling point of 180°C or higher, in a ratio of (total amount of solvents having a boiling point of lower than 180°C):(total amount of solvents having a boiling point of 180°C or higher) ranging from 99:1 to 50:50 in terms of mass.

Abstract translation: 要解决的问题：提供具有高灵敏度和优异的储存稳定性的感光性树脂组合物，得到固化膜的可靠性（特别是耐化学性）优异且在生产固化膜时具有广泛的曝光余量和显影余量。 光敏树脂组合物包含：（A）具有（a1）衍生自具有被酸分解性基团保护的羧基的单体的重复单元和/或衍生自单体的重复单元的聚合物组分，其具有 通过酸分解基团保护的酚羟基，和（a2）具有交联基团的重复单元，在相同的聚合物和/或不同的聚合物中; （B）含有通式（b1）表示的肟磺酸酯残基的化合物; 和（C）溶剂。 该组合物作为溶剂含有沸点低于180℃的至少一种溶剂和沸点为180℃以上的至少一种溶剂，其比例（ 沸点低于180℃的溶剂）（沸点为180℃以上的溶剂的总量）以质量计为99:1至50:50。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012022048A

公开(公告)日：2012-02-02

申请号：JP2010158053

申请日：2010-07-12

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAZAKI KENTA ,  YAMADA SATORU

IPC: G03F7/033 ,  C08F212/14 ,  C08F220/26 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a colored photosensitive resin composition having large development margin, excellent heat resistance, excellent light resistance and excellent solvent resistance, to provide a cured film obtained by curing the colored photosensitive resin composition, to provide a color filter having the cured film, and to provide a liquid crystal display device with the color filter.SOLUTION: A colored photosensitive resin composition includes (component A) a copolymer including at least a constituent unit (a1) with residual groups in which carboxyl groups and/or phenolic hydroxyl groups are protected by thermally decomposable groups, a constituent unit (a2) with epoxy groups and/or oxetanyl groups, and a constituent unit (a3) with carboxyl groups and/or phenolic hydroxyl groups; (component B) radiation-sensitive radical polymerization initiator; (component C) a polymerizable compound with ethylenic unsaturated bonds; and (component D) a colorant.

Abstract translation: 要解决的问题：为了提供具有大显影边缘，优异的耐热性，优异的耐光性和优异的耐溶剂性的着色感光树脂组合物，以提供通过固化着色的感光性树脂组合物获得的固化膜，以提供颜色 具有固化膜的过滤器，并提供具有滤色器的液晶显示装置。 解决方案：着色光敏树脂组合物包括（组分A）至少包含其中羧基和/或酚羟基被可热分解的基团保留的残基的构成单元（a1）的共聚物，组分单元（ a2）和环氧基和/或氧杂环丁烷基，和具有羧基和/或酚羟基的构成单元（a3）; （B组分）辐射敏感自由基聚合引发剂; （C成分）具有烯键式不饱和键的聚合性化合物; 和（组分D）着色剂。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011209692A

公开(公告)日：2011-10-20

申请号：JP2011010697

申请日：2011-01-21

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KIKUCHI WATARU ,  YAMADA SATORU ,  SUGIHARA KOICHI ,  SAKIDA KYOHEI ,  ISHICHI YOHEI

IPC: G03F7/039 ,  C08F220/28 ,  G03F7/004 ,  H01L21/027 ,  H01L51/50 ,  H05B33/10 ,  H05B33/22

CPC classification number: C08F212/14 ,  C08F220/28 ,  G02F1/136227 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/40 ,  H01L27/3246 ,  H01L27/3258

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition having high sensitivity, suppressed in generation of residue during development, and capable of forming a cured film having excellent smoothness.SOLUTION: The positive photosensitive resin composition contains: (component A) a resin that has a constituent unit represented by formula (1), a constituent unit having an acidic group, and a constituent unit having a crosslinkable group; and (component B) an acid generator that has an oxime sulfonate group. In formula (1), Rrepresents a hydrogen atom or an alkyl group; Lrepresents a carbonyl group or a phenylene group; and Rto Reach independently represent a hydrogen atom or an alkyl group.

Abstract translation: 要解决的问题：提供具有高灵敏度的正性感光性树脂组合物，抑制显影时产生残留物，并且能够形成具有优异平滑度的固化膜。解决方案：正型感光性树脂组合物含有：（成分A）树脂 具有由式（1）表示的结构单元，具有酸性基团的构成单元和具有交联性基团的构成单元; 和（组分B）具有肟磺酸盐基团的酸发生剂。 在式（1）中，R表示氢原子或烷基; 代表羰基或亚苯基; 和Rto Reach独立地表示氢原子或烷基。