公开(公告)号：US20130309445A1

公开(公告)日：2013-11-21

申请号：US13952141

申请日：2013-07-26

Applicant: The University Of Tokyo ,  Fujikura Ltd.

Inventor： Osamu NUKAGA ,  Satoshi YAMAMOTO ,  Kazuhito TABATA ,  Masakazu SUGIYAMA

IPC: B32B3/26 ,  B81C1/00

CPC classification number: B81C1/00547 ,  B23K26/50 ,  B32B3/266 ,  B81B2201/0214 ,  B81B2201/058 ,  B81B2203/0353 ,  B81C1/00507 ,  B81C2201/013 ,  B81C2201/0143 ,  C03C15/00 ,  C03C23/0025 ,  Y10T428/24273

Abstract: A method of manufacturing a base body having a microscopic hole, includes: forming at least one of a first modified region and a second modified region by scanning inside of a base body with a focal point of a first laser light having a pulse duration on order of picoseconds or less; forming a periodic modified group formed of a plurality of third modified regions and fourth modified regions by scanning an inside of the base body with a focal point of a second laser light having a pulse duration on order of picoseconds or less; obtaining the base body which is formed so that the first modified region and the second modified region overlap or come into contact with the modified group; and forming a microscopic hole by removing the first modified region and the third modified regions by etching.

Abstract translation: 一种制造具有微小孔的基体的方法，包括：通过用具有脉冲持续时间的第一激光的焦点在基体上扫描来形成第一改质区域和第二改质区域中的至少一个 皮秒或更少; 通过用脉冲持续时间为皮秒或更小的第二激光的焦点扫描基体的内部，形成由多个第三改质区域和第四改质区域形成的周期性修饰基团; 获得形成为使得第一改质区域和第二改质区域与改性基团重叠或接触的基体; 并通过蚀刻去除第一改质区和第三改质区而形成微孔。

公开(公告)号：US20130196426A1

公开(公告)日：2013-08-01

申请号：US13741825

申请日：2013-01-15

Applicant: FUJIKURA LTD. ,  BIO ELECTRO-MECHANICAL AUTONOMOUS NANO SYSTEMS LABORATORY TECHNOLOGY RESEARCH ASS ,  THE UNIVERSITY OF TOKYO

Inventor： Osamu NUKAGA ,  Satoshi YAMAMOTO ,  Kazuhito TABATA ,  Masakazu SUGIYAMA ,  Shoji TAKEUCHI

IPC: C12Q1/24

CPC classification number: C12Q1/24 ,  B23K26/55 ,  G01N33/48728

Abstract: Disclosed is a substrate (10A) for trapping a microorganism or cell (T), characterized by comprising a base (4) and having a space (2) into which a fluid (R) containing the microorganism or cell (T) is introduced and a microtine suction hole (1) through which the space (2) communicates with the outside of the base (4). The substrate is further characterized in that the space (2) has been formed in the base (4), and at least the portion of the base (4) which forms the microfine suction hole (1) is constituted of a single member.

Abstract translation: 公开了一种用于捕获微生物或细胞（T）的底物（10A），其特征在于包含碱（4）并具有空间（2），其中引入含有微生物或细胞（T）的流体（R） 微孔吸入孔（1），空间（2）通过该微孔吸入孔与基部（4）的外部连通。 基板的特征还在于，在基座（4）上形成有空间（2），至少形成微细吸引孔（1）的基部（4）的一部分由单一构件构成。

公开(公告)号：US20140233348A1

公开(公告)日：2014-08-21

申请号：US14261095

申请日：2014-04-24

Applicant: FUJIKURA LTD.

Inventor： Satoshi YAMAMOTO ,  Hiroyuki WAKIOKA ,  Osamu NUKAGA ,  Tatsuya SHIOIRI

IPC: B01F13/00

CPC classification number: B01F13/0064 ,  B01F13/0066 ,  B01F15/00928 ,  B01J19/00

Abstract: A fluid control device for mixing liquids, includes at least: a monolithic base body; and a plurality of micro holes disposed in the base body. Also, the micro holes in a flow channel group α that configures a specific group have opening portions in a region A and a region B on surfaces being outer surfaces of the base body, the micro holes in a flow channel group β (n) that configures the other specific group have opening portions in the region A and a region C (n) on the surfaces being outer surfaces of the base body, and in the base body, the micro holes are disposed apart from the micro holes belonging to the different flow channel group throughout entire lengths. Here, the n refers to a natural number.

Abstract translation: 用于混合液体的流体控制装置至少包括：整体式基体; 以及设置在基体中的多个微孔。 此外，构成特定组的流路组α中的微孔在区域A中具有开口部，表面上的区域B在基体的外表面，流路组中的微孔＆bgr; （n），其构成另一特定组在区域A中具有开口部分，在表面上的区域C（n）是基体的外表面，并且在基体中，微孔与微孔隔开 属于不同流道组，整个长度。 在这里，n指自然数。

公开(公告)号：US20130230912A1

公开(公告)日：2013-09-05

申请号：US13853872

申请日：2013-03-29

Applicant: FUJIKURA LTD. ,  THE UNIVERSITY OF TOKYO

Inventor： Osamu NUKAGA ,  Satoshi YAMAMOTO ,  Kazuhito TABATA ,  Masakazu SUGIYAMA

IPC: G01N1/34

CPC classification number: B01J19/0093 ,  B01J2219/00891 ,  B23K26/0006 ,  B23K26/0624 ,  B23K26/08 ,  B23K26/1224 ,  B23K26/50 ,  B23K26/55 ,  B23K2103/50 ,  G01N15/1031 ,  G01N33/48728 ,  G01N2015/1006

Abstract: A base body includes: a base member; a channel provided in the base member, the channel having an inner wall surface and flowing a fluid; a fine vacuum hole provided in the inner wall, the fine vacuum hole causing the channel to communicate the outside of the base member other and having an opening; and a slow flow portion disposed at a position close to the opening of the fine vacuum hole in the inner wall surface, the slow flow portion slows a flow of the fluid, wherein at least a portion that configures the fine vacuum hole in the base member is formed of a single member.

Abstract translation: 基体包括：基部构件; 设置在基部构件中的通道，所述通道具有内壁表面并流动流体; 设置在所述内壁上的精细真空孔，所述精细真空孔使得所述通道将所述基部构件的外部连通，并具有开口; 以及缓慢流动部分，其设置在靠近所述内壁表面中的所述精细真空孔的开口的位置处，所述缓慢流动部分减缓所述流体的流动，其中至少一部分构成所述基部构件中的所述精细真空孔 由单个成员组成。

公开(公告)号：US20140231390A1

公开(公告)日：2014-08-21

申请号：US14266268

申请日：2014-04-30

Applicant: FUJIKURA LTD.

Inventor： Osamu NUKAGA ,  Satoshi YAMAMOTO ,  Hiroyuki WAKIOKA

IPC: B44C1/22

CPC classification number: B44C1/228 ,  B23K26/53 ,  C03C15/00 ,  C03C23/0025

Abstract: A method of manufacturing a substrate including a micro hole, includes: setting a scanning rate (μm/sec) of pulsed laser light to 1×103 to 4000×103 μm/sec; adjusting a repetition rate (Hz) of the laser light so that a pulse pitch (μm) represented by the following Formula (1) is 0.08 to 0.8 μm; scanning the inside of the substrate with the focal point into which the laser light is collected, thereby forming a modified region having a lowered resistance to etching, at a region through which the focal point passed or at an adjacent region thereof; and forming a micro hole in the substrate by removing the modified region by an etching treatment. pulse pitch (μm)={the scanning rate (μm/sec) of the laser light}/{the repetition rate (Hz) of the laser light}  Formula (1)

Abstract translation: 制造包括微孔的基板的方法包括：将脉冲激光的扫描速度（μm/ sec）设定为1×103〜4000×103μm/ sec; 调整激光的重复率（Hz），使得由下式（1）表示的脉冲间距（μm）为0.08〜0.8μm; 用收集激光的焦点扫描基板的内部，从而在焦点通过的区域或其相邻区域形成具有降低的耐蚀刻性的改性区域; 以及通过蚀刻处理去除改质区域而在基板中形成微孔。 脉冲间距（μm）= {激光的扫描速度（μm/ sec）} / {激光的重复频率（Hz）}式（1）