公开(公告)号：DE3624384A1

公开(公告)日：1987-01-29

申请号：DE3624384

申请日：1986-07-18

Applicant: FUSION SYSTEMS CORP

Inventor： URY MICHAEL G ,  MATTHEWS JOHN C ,  ROUNDS STUART N

IPC: H01L21/30 ,  G03F7/00 ,  G03F7/30 ,  G03F7/42 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  B08B7/00

Abstract: A device for quickly removing a layer of photoresist material is described in which an oxidising agent such as ozone is used. A narrow gap of 2 mm or less is produced adjoining the photoresist layer and ozone is fed in in a flow quantity which results in a high flow rate in the gap, whilst the substrate on which the photoresist layer is located is heated to a temperature above 300 DEG C. Additionally, the photoresist can be exposed to ultraviolet light with an exposure strength of approximately 800 mW/cm . The narrow gap can be produced using a quartz plate.

公开(公告)号：EP0710161A4

公开(公告)日：1997-04-16

申请号：EP94922123

申请日：1994-07-12

Applicant: FUSION SYSTEMS CORP

Inventor： SPARKS EILEEN R ,  MITCHENER JAMES C ,  ROUNDS STUART N ,  MATTHEWS JOHN C

IPC: G03F7/36 ,  B08B3/02 ,  B08B5/00 ,  B08B6/00 ,  C03C17/32 ,  C03C23/00 ,  C23F1/00 ,  C23F1/12 ,  C23F4/00 ,  C23G5/00 ,  G03F7/42 ,  H01L21/302 ,  H01L21/306 ,  H01L21/311 ,  H05K3/26 ,  B08B3/12 ,  B08B7/00 ,  B08B7/02 ,  B08B7/04 ,  C23G1/00 ,  G03C5/00

CPC classification number: H01L21/02046 ,  C03C17/32 ,  C03C23/00 ,  C03C2218/328 ,  G03F7/42 ,  H01L21/31138

Abstract: Material that has previously been subjected to a removal treatment is removed from a substrate by being contacted with a gas containing an excited halogen at a pressure of greater than 50 torr.