Tantala-silica interference filters and lamps using same
    1.
    发明公开
    Tantala-silica interference filters and lamps using same 失效
    坦塔拉二氧化硅干涉滤光器和使用它的灯

    公开(公告)号:EP0598539A3

    公开(公告)日:1994-08-03

    申请号:EP93308937.7

    申请日:1993-11-09

    Abstract: An optical interference filter produced on a vitreous, light transmissive substrate, such as an electric lamp envelope, includes a plurality of alternating layers of tantala and silica in which each tantala layer includes titania in an amount of less than about 10 mole % whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress (cracking, peeling) in the tantala layers is reduced. Rather than or in addition to including titania in each tantala layer, the present invention additionally contemplates placing at least some of the tantala layers in contact with a titania layer (pre-layer and/or post-layer) whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress in the tantala layers is reduced. The optical interference filters are produced by a process comprising depositing a plurality of alternating layers of tantala and silica on a glas substrate from respective precursors thereof by CVD, preferably LPCVD, to form a coated substrate. The filter may then be heated for a time and to a temperature effective to crystallize the tantala, preferably to a temperature ranging from about 550 to about 800°C and holding same within that temperature range for at least about one hour.

    Abstract translation: 在诸如电灯外壳的玻璃质透光基底上产生的光学干涉滤光片包括多个交替的钽和二氧化硅层,其中每个钽膜层包含量小于约10摩尔%的二氧化钛,由此微结构 在随后的结晶过程中控制钽层的外部应力(开裂,剥离)减少。 除了在各个氧化钽层中包括二氧化钛或除此之外,本发明还预期将至少一些钽层与二氧化钛层(前层和/或后层)接触,由此钽层的微结构 在随后的结晶过程中受到控制,并且钽层中的外部应力减小。 该光学干涉滤光片通过包括在玻璃衬底上由其各自的前体通过CVD(优选LPCVD)沉积多层交替的钽和二氧化硅层以形成涂覆衬底的工艺来制造。 然后可以将过滤器加热一段时间并且加热至有效使钽结晶的温度,优选加热至约550至约800℃的温度并且在该温度范围内保持该温度至少约1小时。

    Tantala-silica interference filters and lamps using same
    2.
    发明公开
    Tantala-silica interference filters and lamps using same 失效
    氧化钽和氧化硅和灯用此过滤器的干涉滤光器。

    公开(公告)号:EP0654814A3

    公开(公告)日:1995-07-12

    申请号:EP95200062.8

    申请日:1993-11-09

    Abstract: An optical interference filter produced on a vitreous, light transmissive substrate, such as an electric lamp envelope, includes a plurality of alternating layers of tantala and silica in which each tantala layer includes titania in an amount of less than about 10 mole % whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress in the tantala layers is reduced. Rather than or in addition to including titania in each tantala layer, the present invention additionally contemplates placing at least some of the tantala layers in contact with a titania layer (pre-layer and/or post-layer) whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress in the tantala layers is reduced. The optical interference filters are produced by a process comprising depositing a plurality of alternating layers of tantala and silica on a vitreous, light transmissive substrate from respective precursors thereof by CVD, preferably LPCVD, to form a coated substrate. The filter may then be heated for a time and to a temperature effective to crystallize the tantala, preferably to a temperature ranging from about 550 to about 800°C and holding same within that temperature range for at least about one hour.

    Tantala-silica interference filters and lamps using same
    3.
    发明公开
    Tantala-silica interference filters and lamps using same 失效
    Interferenzfilter aus Tantal- und Siliziumoxyd und Lampen mit diesem Filter。

    公开(公告)号:EP0598539A2

    公开(公告)日:1994-05-25

    申请号:EP93308937.7

    申请日:1993-11-09

    Abstract: An optical interference filter produced on a vitreous, light transmissive substrate, such as an electric lamp envelope, includes a plurality of alternating layers of tantala and silica in which each tantala layer includes titania in an amount of less than about 10 mole % whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress (cracking, peeling) in the tantala layers is reduced. Rather than or in addition to including titania in each tantala layer, the present invention additionally contemplates placing at least some of the tantala layers in contact with a titania layer (pre-layer and/or post-layer) whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress in the tantala layers is reduced. The optical interference filters are produced by a process comprising depositing a plurality of alternating layers of tantala and silica on a glas substrate from respective precursors thereof by CVD, preferably LPCVD, to form a coated substrate. The filter may then be heated for a time and to a temperature effective to crystallize the tantala, preferably to a temperature ranging from about 550 to about 800°C and holding same within that temperature range for at least about one hour.

    Abstract translation: 在诸如电灯泡的玻璃状透光基底上产生的光学干涉滤光器包括多个钽和二氧化硅的交替层,其中每个钽酸钡层包含的量小于约10摩尔%的二氧化钛,由此微结构 在随后的结晶中控制钽铁矿层,并减少钽铁矿层中的外在应力(开裂,剥离)。 本发明除了在每个钽酸盐层中包含二氧化钛以外,还另外设想使至少一些钽酸钡层与二氧化钛层(预层和/或后层)接触,由此钽铁层的微结构 在随后的结晶期间被控制,并且在钽酸盐层中的外应力减小。 光学干涉滤光器是通过一种方法制造的,该方法包括通过CVD,优选LPCVD从其各自的前体在玻璃衬底上沉积多个交替层的钽酸盐和二氧化硅,以形成涂覆的衬底。 然后可以将过滤器加热一段时间,并将其加热至有效地使钽铁结晶的温度,优选至约550℃至约800℃,并在该温度范围内保持至少约1小时。

    Tantala-silica interference filters and lamps using same
    5.
    发明公开
    Tantala-silica interference filters and lamps using same 失效
    坦塔拉二氧化硅干涉滤光器和使用它的灯

    公开(公告)号:EP0654814A2

    公开(公告)日:1995-05-24

    申请号:EP95200062.8

    申请日:1993-11-09

    Abstract: An optical interference filter produced on a vitreous, light transmissive substrate, such as an electric lamp envelope, includes a plurality of alternating layers of tantala and silica in which each tantala layer includes titania in an amount of less than about 10 mole % whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress in the tantala layers is reduced. Rather than or in addition to including titania in each tantala layer, the present invention additionally contemplates placing at least some of the tantala layers in contact with a titania layer (pre-layer and/or post-layer) whereby the microstructure of the tantala layers is controlled during subsequent crystallization and extrinsic stress in the tantala layers is reduced. The optical interference filters are produced by a process comprising depositing a plurality of alternating layers of tantala and silica on a vitreous, light transmissive substrate from respective precursors thereof by CVD, preferably LPCVD, to form a coated substrate. The filter may then be heated for a time and to a temperature effective to crystallize the tantala, preferably to a temperature ranging from about 550 to about 800°C and holding same within that temperature range for at least about one hour.

    Abstract translation: 在诸如电灯外壳的玻璃质透光基底上产生的光学干涉滤光片包括多个交替的钽和二氧化硅层,其中每个钽膜层包含量小于约10摩尔%的二氧化钛,由此微结构 在随后的结晶过程中控制钽层的外部应力,并减少钽层中的外部应力。 除了在各个氧化钽层中包括二氧化钛或除此之外,本发明还预期将至少一些钽层与二氧化钛层(前层和/或后层)接触,由此钽层的微结构 在随后的结晶过程中受到控制,并且钽层中的外部应力减小。 所述光学干涉滤光片通过包括以下步骤的方法制造:将tantala和二氧化硅的多个交替层从其各自的前体通过CVD(优选LPCVD)沉积在玻璃质透光衬底上以形成涂覆衬底。 然后可以将过滤器加热一段时间并且加热至有效使钽结晶的温度,优选加热至约550至约800℃的温度并且在该温度范围内保持该温度至少约1小时。

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