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    Beta-phase nickel aluminide overlay coatings and process therefor
    1.
    发明申请
    Beta-phase nickel aluminide overlay coatings and process therefor 有权
    β相镀镍及其制备方法

    公开(公告)号：US20040067320A1

    公开(公告)日：2004-04-08

    申请号：US10248056

    申请日：2002-12-13

    Applicant: GENERAL ELECTRIC COMPANY

    Inventor： Irene Spitsberg ,  Joseph David Rigney ,  Ramgopal Darolia ,  Elissa Hae-Kyung Lee ,  Jeffrey Allan Pfaendtner

    IPC: B32B015/00 ,  B32B015/10 ,  B05D003/02 ,  B05D001/36

    CPC classification number: C23C28/321 ,  C21D7/06 ,  C23C4/18 ,  C23C8/02 ,  C23C26/00 ,  C23C28/345 ,  C23C28/3455 ,  Y10T428/12611 ,  Y10T428/12736 ,  Y10T428/12937 ,  Y10T428/12944

    Abstract: A beta-phase nickel aluminide (NiAl) overlay coating (24) and method for modifying the grain structure of the coating (24) to improve its oxidation resistance. The coating (24) is deposited by a method that produces a grain structure characterized by grain boundaries (44) exposed at the outer coating surface (36). The grain boundaries (44) may also contain precipitates (40) as a result of the alloyed chemistry of the coating (24). During or after deposition, the overlay coating (24) is caused to form new grain boundaries (34) that, though open to the outer surface (36) of the coating (24), are free of precipitates or contain fewer precipitates (40) than the as-deposited grain boundaries (44). New grain boundaries (34) are preferably produced by causing the overlay coating (24) to recrystallize during coating deposition or after deposition as a result of a surface treatment followed by heat treatment.

    Abstract translation: β相镍铝化合物（NiAl）覆盖层（24）以及用于改变涂层（24）的晶粒结构以提高其抗氧化性的方法。 通过产生以在外涂层表面（36）处暴露的晶界（44）为特征的晶粒结构的方法沉积涂层（24）。 由于涂层（24）的合金化学，晶界（44）也可含有沉淀物（40）。 在沉积期间或之后，使覆盖涂层（24）形成新的晶粒边界（34），其尽管向涂层（24）的外表面（36）开口，但没有沉淀物或含有较少的沉淀物（40） 比沉积的晶界（44）。 优选通过在涂布沉积期间或沉积后的覆盖涂层（24）进行再结晶，然后进行热处理后的表面处理，来制造新的晶界（34）。

    Thermal barrier coating and process therefor
    3.
    发明申请
    Thermal barrier coating and process therefor 失效
    热障涂层及其工艺

    公开(公告)号：US20030129316A1

    公开(公告)日：2003-07-10

    申请号：US10064785

    申请日：2002-08-16

    Applicant: General Electric Company

    Inventor： Ramgopal Darolia ,  Boris A. Movchan ,  Yuriy E. Rudoy ,  Leonella M. Nerodenko ,  Irene Spitsberg ,  David John Wortman

    IPC: B05D001/36

    CPC classification number: C23C28/3215 ,  C23C14/06 ,  C23C28/321 ,  C23C28/345 ,  C23C28/3455 ,  C23C30/00 ,  F01D5/288 ,  F05D2300/15 ,  Y10T428/249954 ,  Y10T428/249956 ,  Y10T428/249957 ,  Y10T428/249976 ,  Y10T428/24999

    Abstract: A thermal barrier coating, or TBC (26), and method for forming the TBC (26). The TBC (26) is formed of a thermal-insulating material that contains yttria-stabilized zirconia (YSZ) alloyed with at least a third oxide. The TBC (26) is formed to also contain elemental carbon, and may potentially contain carbides and/or a carbon-containing gas that forms from the thermal decomposition of carbon. The TBC (26) is characterized by lower density and thermal conductivity, high temperature stability and improved mechanical properties. To exhibit the desired effect, the third oxide is more particularly one that increases the lattice strain energy of the TBC microstructure as a result of having an ion size that is sufficiently different than a zirconium ion.

    Abstract translation: 热障涂层或TBC（26），以及形成TBC（26）的方法。 TBC（26）由包含氧化钇稳定的氧化锆（YSZ）的绝热材料形成，其与至少三种氧化物合金化。 TBC（26）形成为也含有元素碳，并且可能含有从碳的热分解形成的碳化物和/或含碳气体。 TBC（26）的特征在于较低的密度和导热性，高温稳定性和改善的机械性能。 为了表现出期望的效果，由于具有与锆离子充分不同的离子尺寸的结果，第三氧化物更特别地增加了TBC微结构的晶格应变能。

    METHOD OF DEPOSITING A COATING ON SI-BASED CERAMIC COMPOSITES
    5.
    发明申请
    METHOD OF DEPOSITING A COATING ON SI-BASED CERAMIC COMPOSITES 失效
    在基于SI的陶瓷复合材料上沉积涂层的方法

    公开(公告)号：US20040151840A1

    公开(公告)日：2004-08-05

    申请号：US10248635

    申请日：2003-02-03

    Applicant: GENERAL ELECTRIC COMPANY

    Inventor： Hongyu Wang ,  Yuk-Chiu Lau ,  Irene Spitsberg ,  Arnold T. Henry

    IPC: B05D001/08

    CPC classification number: C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C23C4/02 ,  C23C4/11 ,  C04B41/4527 ,  C04B41/5037 ,  C04B41/5024 ,  C04B35/565 ,  C04B35/584

    Abstract: A process of depositing a coating system suitable for use as an environmental barrier coating on various substrate materials, particularly those containing silicon and intended for high temperature applications such as the hostile thermal environment of a gas turbine engine. The process comprises depositing a first coating layer containing mullite, and preferably a second coating layer of an alkaline earth aluminosilicate, such as barium-strontium-aluminosilicate (BSAS), by thermal spraying while maintaining the substrate at a temperature of 800null C. or less, preferably 500null C. or less, by which a substantially crack-free coating system is produced with desirable mechanical integrity.

    Abstract translation: 一种沉积涂覆系统的方法，该涂覆系统适合用作各种基材上的环境屏障涂层，特别是含有硅并用于高温应用的那些涂层系统，例如燃气涡轮发动机的恶劣的热环境。 该方法包括通过热喷涂沉积包含莫来石的第一涂层，优选地是碱土金属硅铝酸盐的第二涂层，例如钡 - 锶 - 硅酸铝（BSAS），同时将基底保持在800℃的温度，或 较少，优选500℃或更低，由此产生具有期望的机械完整性的基本上无裂纹的涂层体系。

    Vapor deposition process and apparatus therefor
    6.
    发明申请
    Vapor deposition process and apparatus therefor 失效
    气相沉积工艺及其设备

    公开(公告)号：US20040043150A1

    公开(公告)日：2004-03-04

    申请号：US10064887

    申请日：2002-08-27

    Applicant: General Electric Company

    Inventor： Boris A. Movchan ,  Irene Spitsberg ,  Ramgopal Darolia

    IPC: C23C014/30

    CPC classification number: C23C14/083 ,  C23C14/30 ,  C23C14/548 ,  C23C28/321 ,  C23C28/3215 ,  C23C28/325 ,  C23C28/345 ,  C23C28/3455

    Abstract: A process and apparatus for depositing a ceramic coating on a component. The process involves a technique for evaporating an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having a vapor pressure that is higher than the remaining oxide compounds, to depositing a coating of the multiple oxide compounds. A high energy beam is projected onto the evaporation source to melt and form a vapor cloud of the oxide compounds of the evaporation source, while preventing the vapor cloud from contacting and condensing on the component during an initial phase in which the relative amount of the one oxide compound in the vapor cloud is greater than its relative amount in the evaporation source. During a subsequent phase in which the relative amount of the one oxide compound in the vapor cloud has decreased to something approximately equal to its relative amount in the evaporation source, the vapor cloud is allowed to contact and condense on the component to form the coating.

    Abstract translation: 一种用于在组件上沉积陶瓷涂层的工艺和设备。 该方法涉及一种用于蒸发含有多种不同氧化物化合物的蒸发源的技术，至少一种具有高于其余氧化物化合物的蒸汽压的氧化物化合物沉积多个氧化物化合物的涂层。 将高能量束投影到蒸发源上以熔化并形成蒸发源的氧化物化合物的蒸汽云，同时防止蒸气云在初始阶段期间在组分上接触和冷凝，其中相对量 蒸汽云中的氧化物化合物大于其在蒸发源中的相对量。 在蒸发云中的一种氧化物化合物的相对量已经降低到与蒸发源中的相对量相似的程度的后续阶段中，允许蒸汽云接触并冷凝在组分上以形成涂层。

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