公开(公告)号：EP1777492A3

公开(公告)日：2013-06-05

申请号：EP06255447.2

申请日：2006-10-23

Applicant: GENERAL ELECTRIC COMPANY

Inventor： Harding, Kevin George ,  Qian, Xiaoping ,  Demuth, Russel Stephen

IPC: G01B11/25

CPC classification number: G01B11/2513

Abstract: A method (100) and apparatus for generating a mask (52) for use with a light measurement system (10) that includes a light source (22) for projecting light onto a surface of an object (12), and an imaging system for receiving light reflected from the surface of the object. A profile of the object to be inspected is determined and a mask based on the determined profile is generated, wherein the mask includes an opening (172) extending therethrough that has a profile that substantially matches a profile of the object as viewed from the light source.

公开(公告)号：EP1777492A2

公开(公告)日：2007-04-25

申请号：EP06255447.2

申请日：2006-10-23

Applicant: General Electric Company

Inventor： Harding, Kevin George ,  Qian, Xiaoping ,  Demuth, Russel Stephen

IPC: G01B11/25

CPC classification number: G01B11/2513

Abstract: A method (100) and apparatus for generating a mask (52) for use with a light measurement system (10) that includes a light source (22) for projecting light onto a surface of an object (12), and an imaging system for receiving light reflected from the surface of the object. A profile of the object to be inspected is determined and a mask based on the determined profile is generated, wherein the mask includes an opening (172) extending therethrough that has a profile that substantially matches a profile of the object as viewed from the light source.

Abstract translation: 一种用于生成使用掩模（52）与光测量系统（10）做方法（100）和装置包括：用于光投射到物体（12）的一个表面上的光源（22），并且在成像系统 接收光从所述物体的表面反射。 要被检查的对象的轮廓是确定性的开采，并生成基于该确定性开采轮廓掩模，worin所述掩模包括在开口（172）延伸穿过那里做它的轮廓也大致匹配作为从光源观察的对象的轮廓 ，

公开(公告)号：EP1519143A1

公开(公告)日：2005-03-30

申请号：EP04255937.7

申请日：2004-09-29

Applicant: GENERAL ELECTRIC COMPANY

Inventor： Qian, Xiaoping ,  Harding, Kevin George

IPC: G01B11/25 ,  G01N21/21

CPC classification number: G01B11/25 ,  G01N21/21 ,  G01N2201/0635

Abstract: The present disclosure provides for an optical metrology system for scanning an object (106) having a shiny surface. The optical metrology system includes at least one light source (102) configured and adapted to emit a structured light pattern (L) against the surface of the object, at least one first polarizer (108) disposed between the light source and the object such that the light pattern passes therethrough, the first polarizer being configured and adapted to vary at least one of the plane of polarization and the polarization angle of the light pattern, at least one camera (124a-124c) configured and adapted to take images of the object, and at least one second polarizer disposed between the camera and the object, the second polarizer having a fixed orientation.

Abstract translation: 本公开提供了一种用于扫描具有光泽表面的物体（106）的光学测量系统。 光学测量系统包括至少一个光源（102），其配置并适于发射抵靠物体表面的结构化光图案（L），设置在光源和物体之间的至少一个第一偏振器（108），使得 光图案通过其中，第一偏振器被配置和适于改变光图案的偏振平面和偏振角中的至少一个，至少一个相机（124a-124c）配置并适于拍摄物体的图像 以及设置在相机和物体之间的至少一个第二偏振器，第二偏振器具有固定的取向。