公开(公告)号：US20210124272A1

公开(公告)日：2021-04-29

申请号：US16661220

申请日：2019-10-23

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Ezra D.B. Hall ,  Jed H. Rankin ,  Alok Vaid

IPC: G03F7/20

Abstract: Embodiments of the present disclosure provide an apparatus including mask pattern formed on a mask substrate. A plurality of spatial radiation modulators may be vertically displaced from the mask pattern, and distributed across a two-dimensional area. Each of the plurality of spatial radiation modulators may be adjustable between a first transparent state and a second transparent state to control whether radiation transmitted through the mask pattern passes through each of the plurality of spatial radiation modulators.

公开(公告)号：US10976666B1

公开(公告)日：2021-04-13

申请号：US16661220

申请日：2019-10-23

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Ezra D. B. Hall ,  Jed H. Rankin ,  Alok Vaid

IPC: G03F7/20

Abstract: Embodiments of the present disclosure provide an apparatus including mask pattern formed on a mask substrate. A plurality of spatial radiation modulators may be vertically displaced from the mask pattern, and distributed across a two-dimensional area. Each of the plurality of spatial radiation modulators may be adjustable between a first transparent state and a second transparent state to control whether radiation transmitted through the mask pattern passes through each of the plurality of spatial radiation modulators.