ELECTRON BEAM GENERATOR, ELECTRON BEAM EMISSION DEVICE AND X-RAY EMISSION DEVICE

    公开(公告)号:US20230147125A1

    公开(公告)日:2023-05-11

    申请号:US17917982

    申请日:2021-01-28

    CPC classification number: G21K5/04 H01J1/13

    Abstract: Disclosed is an electron beam generation source including: an electron discharge part extending on a desired axis and configured to discharge electrons; a support part electrically connected to a power supply device that supplies electric power to the electron discharge part; a tension holding part connected between one end of the electron discharge part and the support part and configured to hold tension of the electron discharge part with a pressing force or a tensile force; and a power supply path part having one end electrically connected to the support part and the other end electrically connected to the one end of the electron discharge part. An electric resistance value of the tension holding part is larger than an electric resistance value of the power supply path part.

    X-RAY GENERATION DEVICE
    3.
    发明申请

    公开(公告)号:US20230123985A1

    公开(公告)日:2023-04-20

    申请号:US17915198

    申请日:2021-01-12

    Abstract: An X-ray generation device includes: an electron gun that emits an electron beam; a target portion in which a plurality of elongated targets that generate an X-ray because of incidence of the electron beam are disposed parallel to each other; a housing that accommodates the electron gun and the target portion; and an X-ray emission window provided in the housing to emit the X-ray generated in the target portion, to an outside of the housing. The targets are disposed on the target portion to face the electron gun at a predetermined inclination angle with respect to an emission axis of the electron beam. The X-ray emission window is disposed at a position where the X-ray generated in a direction perpendicular to the target portion is transmittable through the X-ray emission window, to face the target portion at a predetermined inclination angle.

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