BIREFRINGENCE MEASUREMENT SYSTEM
    1.
    发明专利

    公开(公告)号:CA2319729A1

    公开(公告)日:1999-08-26

    申请号:CA2319729

    申请日:1999-02-17

    Abstract: A practical system and method for precisely measuring low-level birefrigence properties (retardance and fast axis orientation) of optical materials (26). The system permits multiple measurements to be taken across the area of a sample to detect and graphically display (100) variations in the birefrigence properties across the sample area. In a preferred embodiment, the system incorporates a photoelastic modulator (24) for modulating polarized light that is then directed through a sample (26). The beam ("Bi") propagating from the sample is separated into two parts, with one part ("B1") having a polarization direction different than the polarization direction of the other beam part ("B2"). These separate beam parts are then processed as distinct channels. Detection mechanisms (32, 50) associated with each channel detect the time varying light intensity corresponding to each of the two parts of the beam. This information is combined for calculating a precise measure of the retardance induced by the sample, as well as the sample's fast axis orientation.

    POLARIZATION PROPERTIES IMAGING SYSTEMS
    2.
    发明申请
    POLARIZATION PROPERTIES IMAGING SYSTEMS 审中-公开
    偏振特性成像系统

    公开(公告)号:WO2014189967A8

    公开(公告)日:2016-02-04

    申请号:PCT/US2014038837

    申请日:2014-05-20

    Abstract: This disclosure is generally directed to systems for imaging polarization properties of optical-material samples. As one aspect, there is provided a system for precise, simultaneous imaging of both the in-plane and out-of-plane birefringence properties of sample material over a wide range of incidence angles. The spatially resolved imaging approach described here is amenable to determination of a wide range of polarimetric properties, in addition to the inplane and out-of-plane birefringence measure discussed as a preferred embodiment.

    Abstract translation: 本公开一般涉及用于对光学材料样品的偏振特性进行成像的系统。 作为一个方面,提供了一种用于在宽的入射角范围内精确地同时成像样品材料的平面内和平面外双折射性质的系统。 除了作为优选实施例讨论的面内和平面外的双折射度量之外,这里描述的空间分辨成像方法适于确定宽范围的偏振特性。

    ACCURACY CALIBRATION OF BIREFRINGENCE MEASUREMENT SYSTEMS

    公开(公告)号:CA2463768A1

    公开(公告)日:2003-05-15

    申请号:CA2463768

    申请日:2002-10-16

    Inventor: WANG BAOLIANG

    Abstract: Provided are systems and methods using a Soleil-Babinet compensator (101) as a standard for calibrating birefringence measurement systems. Highly precise a nd repeatable calibration is accomplished by the method described here because, among other things, the inventive method accounts for variations of retardan ce across the surface of the Soleil-Babinet compensator (101). The calibration technique described here may be employed in birefringence measurement system s that have a variety of optical setups for measuring a range of retardation levels and at various frequencies of light sources.

    Out-of-plane birefringence measurement

    公开(公告)号:AU2003299695A8

    公开(公告)日:2004-07-22

    申请号:AU2003299695

    申请日:2003-12-19

    Inventor: WANG BAOLIANG

    Abstract: The disclosure is directed to precise measurement of out-of-plane birefringence properties of samples of transparent optical material. Two angled-apart light beams (B1, B2) are passed through a selected location of a sample (26) optical element. One of the beams (B1, B2) is incident to the sample (26) surface. The characteristics of the beams (B1, B2) are detected after passing through the sample (26), and the information detected is processed to determine the out-of-plane birefringence.

    OUT-OF-PLANE BIREFRINGENCE MEASUREMENT
    6.
    发明申请
    OUT-OF-PLANE BIREFRINGENCE MEASUREMENT 审中-公开
    超出平面测量

    公开(公告)号:WO2004059266A3

    公开(公告)日:2004-10-21

    申请号:PCT/US0340366

    申请日:2003-12-19

    Inventor: WANG BAOLIANG

    CPC classification number: G01N21/23

    Abstract: The disclosure is directed to precise measurement of out-of-plane birefringence properties of samples of transparent optical material. Two angled-apart light beams (B1, B2) are passed through a selected location of a sample (26) optical element. One of the beams (B1, B2) is incident to the sample (26) surface. The characteristics of the beams (B1, B2) are detected after passing through the sample (26), and the information detected is processed to determine the out-of-plane birefringence.

    Abstract translation: 本发明涉及透明光学材料样品的平面外双折射性质的精确测量。 两个角度分开的光束(B1,B2)通过样品(26)光学元件的选定位置。 梁(B1,B2)中的一个入射到样品(26)表面。 在通过样品(26)之后检测光束(B1,B2)的特性,并且处理检测到的信息以确定面外双折射。

    7.
    发明专利
    未知

    公开(公告)号:DE60220521D1

    公开(公告)日:2007-07-19

    申请号:DE60220521

    申请日:2002-06-17

    Abstract: Provided are systems and methods for precisely measuring birefringence properties of optical elements, especially those elements that are used in deep ultraviolet (DUV) wavelengths. The system includes two photoelastic modulators (PEM) ( 126, 128 ) located on opposite sides of the sample ( 136 ). Each PEM is operable for modulating the polarity of a light beam that passes though the sample. The system also includes a polarizer ( 124 ) associated with one PEM, an analyzer ( 130 ) associated with the other PEM, and a detector ( 132 ) for measuring the intensity of the light after it passes through the PEMs, polarizer, and analyzer. Described are techniques for determining birefringence properties across a wide range. For example, a dual-wavelength source light embodiment is provided for measuring relatively high levels of birefringence. Also provided is a technique for selecting the most accurate and efficient one of a number of approaches to determining birefringence properties depending upon the estimated value of the birefringence to be detected for a given sample optical element.

    Calibration process for birefringence measurement system

    公开(公告)号:AU2631801A

    公开(公告)日:2001-07-24

    申请号:AU2631801

    申请日:2001-01-05

    Inventor: WANG BAOLIANG

    Abstract: A dynamic self calibration process periodically calibrates a system for precisely measuring low-level birefringence properties (retardance and fast axis orientation) of optical materials. Variations in birefringence measurements can be caused by, for example, changes in the environmental conditions ( e.g., ambient pressure or temperature) under which birefringence properties of a sample are measured. In one implementation, the dynamic self calibration process repeatedly calibrates the system at different selected frequencies to compensate for different selected baseline variations.

    9.
    发明专利
    未知

    公开(公告)号:DE60220521T2

    公开(公告)日:2007-09-27

    申请号:DE60220521

    申请日:2002-06-17

    Abstract: Provided are systems and methods for precisely measuring birefringence properties of optical elements, especially those elements that are used in deep ultraviolet (DUV) wavelengths. The system includes two photoelastic modulators (PEM) ( 126, 128 ) located on opposite sides of the sample ( 136 ). Each PEM is operable for modulating the polarity of a light beam that passes though the sample. The system also includes a polarizer ( 124 ) associated with one PEM, an analyzer ( 130 ) associated with the other PEM, and a detector ( 132 ) for measuring the intensity of the light after it passes through the PEMs, polarizer, and analyzer. Described are techniques for determining birefringence properties across a wide range. For example, a dual-wavelength source light embodiment is provided for measuring relatively high levels of birefringence. Also provided is a technique for selecting the most accurate and efficient one of a number of approaches to determining birefringence properties depending upon the estimated value of the birefringence to be detected for a given sample optical element.

    OUT-OF-PLANE BIREFRINGENCE MEASUREMENT

    公开(公告)号:AU2003299695A1

    公开(公告)日:2004-07-22

    申请号:AU2003299695

    申请日:2003-12-19

    Inventor: WANG BAOLIANG

    Abstract: The disclosure is directed to precise measurement of out-of-plane birefringence properties of samples of transparent optical material. Two angled-apart light beams (B1, B2) are passed through a selected location of a sample (26) optical element. One of the beams (B1, B2) is incident to the sample (26) surface. The characteristics of the beams (B1, B2) are detected after passing through the sample (26), and the information detected is processed to determine the out-of-plane birefringence.

Patent Agency Ranking