公开(公告)号：WO1997001653A2

公开(公告)日：1997-01-16

申请号：PCT/US1996011038

申请日：1996-06-26

Applicant: HMT TECHNOLOGY CORPORATION

Inventor： HMT TECHNOLOGY CORPORATION ,  MAHVAN, Nader ,  WILKINSON, David ,  ICHIKAWA, Koji

IPC: C23C00/00

CPC classification number: H01J37/32871 ,  C23C14/3407 ,  C23C14/564 ,  H01J37/34 ,  H01J37/3441 ,  H01J37/3447 ,  H01J2237/022

Abstract: A shield for use in a sputtering system. The shield includes a support having an inner expanse defining a two-dimensional array of cavities. The cavities are formed of two-dimensionally concave wall surfaces, where the intersections of the wall surfaces of adjacent cavities form a two-dimensional array of edges on the expanse. The shield minimizes the tendency of material deposited on the shield surface, such as sputtered carbon material, from flaking off during a sputtering operation. Also disclosed is a sputtering assembly that employs the shield.

Abstract translation: 本发明涉及一种可用于离子喷雾系统的筛网。 该屏幕包括支撑件，该支撑件包括限定腔体的二维网络的区域。 这些腔由凹壁面维的，形成在所述凸缘区的二维阵列的相邻的腔体壁的表面之间的交叉处形成。 该屏幕允许在溅射工艺期间剥落屏蔽件的表面上的沉积材料，如基于碳的粉末材料的倾向慢下来。 本发明还涉及使用该屏幕的离子喷雾装置。

公开(公告)号：WO1996034384A1

公开(公告)日：1996-10-31

申请号：PCT/US1996005677

申请日：1996-04-23

Applicant: HMT TECHNOLOGY CORPORATION

Inventor： HMT TECHNOLOGY CORPORATION ,  YANG, Ming, M. ,  CHAO, James, L. ,  LAL, Brij, B. ,  BOUREZ, Allen, J. ,  RUSSAK, Michael, A.

IPC: G11B05/84

CPC classification number: G11B5/8408 ,  G11B5/54 ,  G11B5/72 ,  G11B5/725 ,  G11B5/82 ,  G11B21/22

Abstract: A protective overcoat in a magnetic recording medium is described, where the overcoat extends between an inner-diameter landing zone and an outer-diameter data zone and has a thickness in the landing zone of at least 135 ANGSTROM and a thickness in the data zone of less than 90 ANGSTROM . Also described is a target assembly for use in forming the protective overcoat. The assembly includes a centrally positioned target with inner and outer magnetic means adjacent the target and a sputtering shield positioned between the target and the medium to control the amount and angle of material deposition on the medium.

Abstract translation: 描述了磁记录介质中的保护外涂层，其中外涂层在内径着陆区域和外径数据区域之间延伸，并且着陆区域中的厚度至少为135安培，数据区域中的厚度为 小于90 ANGSTROM。 还描述了用于形成保护性外涂层的目标组件。 该组件包括中心定位的靶，其具有邻近靶的内部和外部磁性装置以及位于靶和介质之间的溅射屏蔽，以控制介质上材料沉积的量和角度。

公开(公告)号：WO1996028584A1

公开(公告)日：1996-09-19

申请号：PCT/US1996003194

申请日：1996-03-08

Applicant: HMT TECHNOLOGY CORPORATION

Inventor： HMT TECHNOLOGY CORPORATION ,  BOUREZ, Allen, J. ,  LAL, Brij, Bihari ,  RUSSAK, Michael, A.

IPC: C23C14/34

CPC classification number: H01J37/3429 ,  C23C14/3407 ,  C23C14/35 ,  G11B5/851 ,  H01J37/3408 ,  H01J37/3426 ,  H01J37/3458

Abstract: A target assembly for use in fabricating layered, magnetic recording structures is described. The target assembly has inner and outer concentric targets for sputter depositing on a substrate first and second layers having different compositions. Disposed adjacent each target is a magnetic means, and at least one which is reversible in magnetic-pole polarity. One polarity produces a magnetic flux sufficient to ignite a sputtering plasma in the inner target only, when power is supplied to the inner target at a preselected level. The opposite polarity produces a magnetic flux sufficient to ignite a sputtering plasma in the outer target only, when power is supplied to the outer target at a preselected level. A method of using the target assembly is also described.

Abstract translation: 描述了用于制造层状磁记录结构的目标组件。 目标组件具有用于溅射沉积在衬底上的内部和外部同心靶，第一和第二层具有不同的组成。 设置在每个目标附近是磁性装置，并且至少一个磁极极性是可逆的。 一个极性产生足够的磁通量，用于仅在内部靶中点燃溅射等离子体时，当以预定的电平向内部目标供电时。 相反的极性产生足够的磁通量，用于仅在外部目标中以预选的水平向外部目标供电时点燃溅射等离子体。 还描述了使用目标组件的方法。

公开(公告)号：WO1996001303A1

公开(公告)日：1996-01-18

申请号：PCT/US1995008035

申请日：1995-06-30

Applicant: HMT TECHNOLOGY CORPORATION

Inventor： HMT TECHNOLOGY CORPORATION ,  CHAO, James, L. ,  LEE, Yu-Cheun ,  GAO, Chao

IPC: C10M169/04

CPC classification number: C10M169/04 ,  C10M111/04 ,  C10M2213/00 ,  C10M2213/023 ,  C10M2213/04 ,  C10M2213/043 ,  C10M2213/06 ,  C10M2213/0606 ,  C10M2213/0623 ,  C10M2223/003 ,  C10M2223/02 ,  C10M2223/023 ,  C10M2223/0405 ,  C10M2223/049 ,  C10M2223/0495 ,  C10M2223/0603 ,  C10M2223/08 ,  C10M2223/083 ,  C10M2223/103 ,  C10N2240/20 ,  C10N2240/201 ,  C10N2240/202 ,  C10N2240/203 ,  C10N2240/204 ,  C10N2240/205 ,  G11B5/725 ,  Y10S428/90 ,  Y10T428/3154

Abstract: A thin-film magnetic recording disc for use with a read/write head in a disc drive is disclosed. To reduce the static and dynamic frictional coefficients of the disc surface, the disc is coated with a lubricant layer composed of a mixture of a polyphenoxycyclotriphosphazene lubricant and a perfluoropolyether oil. Also disclosed is a lubricant composition containing these two components, as well as a method for improving the lubricating properties of a perfluoropolyether oil.

Abstract translation: 公开了一种用于盘驱动器中的读/写头的薄膜磁记录盘。 为了减小盘表面的静态和动态摩擦系数，该盘被涂覆有由聚苯氧基三磷腈润滑剂和全氟聚醚油的混合物组成的润滑剂层。 还公开了含有这两种组分的润滑剂组合物，以及用于改善全氟聚醚油的润滑性能的方法。

公开(公告)号：WO1998019301A1

公开(公告)日：1998-05-07

申请号：PCT/US1997019710

申请日：1997-10-28

Applicant: HMT TECHNOLOGY CORPORATION

Inventor： HMT TECHNOLOGY CORPORATION ,  HOSÉ, John, S.

IPC: G11B05/84

CPC classification number: B24B37/08 ,  B24B7/17 ,  B24B7/22 ,  B24B41/007 ,  B24B41/04 ,  G11B5/8404

Abstract: An apparatus for polishing one or more planar substrates, such as magnetic disks, between rotating polishing plates is described. The apparatus is designed to optimize uniformity and flatness of the substrates by maintaining a substantially constant parallel and coaxial alignment between the rotating polishing plates.

Abstract translation: 描述了用于在旋转的抛光板之间抛光一个或多个平面基板（例如磁盘）的装置。 该设备被设计成通过保持旋转的抛光板之间基本上恒定的平行和同轴对准来优化基板的均匀性和平坦度。

公开(公告)号：WO1997006529A1

公开(公告)日：1997-02-20

申请号：PCT/US1996012863

申请日：1996-08-06

Applicant: HMT TECHNOLOGY CORPORATION

Inventor： HMT TECHNOLOGY CORPORATION ,  LAL, Brij, Bihari ,  BOUREZ, Allen, J. ,  RUSSAK, Michael, A.

IPC: G11B05/84

CPC classification number: G11B5/8408 ,  G11B5/72

Abstract: A method for forming an overcoat having first and second layers in a magnetic recording medium is described. The first overcoat layer is deposited in a first sputtering chamber where the magnetic means for confining target plasma in the chamber are oriented to retain magnetic field confinement about the target surface and to produce magnetic field lines between directly confronting portions of the confronting sputtering targets. The second overcoat layer is deposited under a nitrogen-containing atmosphere.

Abstract translation: 描述了在磁记录介质中形成具有第一和第二层的外涂层的方法。 第一外涂层沉积在第一溅射室中，其中用于限制室中的目标等离子体的磁性装置被取向为保持围绕目标表面的磁场约束并且在相对的溅射靶的直接面对部分之间产生磁场线。 第二外涂层在含氮气氛下沉积。

公开(公告)号：WO1996022405A1

公开(公告)日：1996-07-25

申请号：PCT/US1996000637

申请日：1996-01-16

Applicant: HMT TECHNOLOGY CORPORATION ,  NGUYEN, Hoang ,  HARPER, Bruce, M.

Inventor： HMT TECHNOLOGY CORPORATION

IPC: C23C14/50

CPC classification number: G11B17/02 ,  C23C14/50 ,  G11B5/84 ,  G11B5/8404 ,  G11B5/851 ,  G11B23/00 ,  Y10S414/141

Abstract: A disc-handling apparatus for supporting a magnetic disc during material deposition and for transporting the disc into and out of a deposition station is described. The apparatus has a holder that supports a disc at three contact points by a support and a pair of arms, such that the disc is positively gripped by at least three contact points.

Abstract translation: 描述了用于在材料沉积期间支撑磁盘并将盘传送到和离开沉积站的盘处理装置。 该装置具有一支架，该支架通过一支撑件和一对支臂在三个接触点处支撑一盘，使得盘被至少三个接触点牢固地夹持。