7.
    发明专利
    未知

    公开(公告)号:FI893071A

    公开(公告)日:1989-12-26

    申请号:FI893071

    申请日:1989-06-22

    Applicant: HOECHST AG

    Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

    8.
    发明专利
    未知

    公开(公告)号:FI893071A0

    公开(公告)日:1989-06-22

    申请号:FI893071

    申请日:1989-06-22

    Applicant: HOECHST AG

    Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

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