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公开(公告)号：DE3729035A1
公开(公告)日：1989-03-09
申请号：DE3729035
申请日：1987-08-31
Applicant: HOECHST AG
Inventor： STEPHANI TRUTZ-ULRICH DIPL CHE , MOHR DIETER DIPL CHEM DR , MAISEL BRITTA , FRASS HANS WERNER DIPL CHEM DR , ELSAESSER ANDREAS DIPL CHEM DR
Abstract: A positive-working photosensitive mixture containing an o-quinone diazide and a binder is disclosed wherein the mixture contains a compound which is able to form an azo coupling with the o-quinone diazide. A copying material produced with the photosensitive mixture has a high photosensitivity and an exceptional developer resistance. The photosensitive mixture is used in reproduction technique, and also in the field of resists.
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公开(公告)号：DE4006856A1
公开(公告)日：1991-09-12
申请号：DE4006856
申请日：1990-03-05
Applicant: HOECHST AG
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公开(公告)号：DE3940911A1
公开(公告)日：1991-06-13
申请号：DE3940911
申请日：1989-12-12
Applicant: HOECHST AG
Inventor： GASCHLER OTFRIED DIPL ING DR , ELSAESSER ANDREAS DIPL CHEM DR , MOHR DIETER DIPL CHEM DR , FRASS HANS WERNER DIPL CHEM DR
Abstract: The invention relates to a process for the formation of negative copies in which a photosensitive or radiation-sensitive copying material comprising a layer base and a normally positive-working photosensitive or radiation-sensitive layer deposited thereon is irradiated through an image, treated thermally, irradiated over the entire surface after cooling and then developed with an alkaline developer. The thermal treatment is carried out with water or with an aqueous solution at temperatures in the range from about 50 to 100, preferably 60-90 DEG C, in the course of between about 1 second and 5 minutes, preferably 5 seconds and 1 minute, the whole-surface irradiation is carried out on the still hot copying material and the subsequent development is carried out in the course of between about 10 seconds and 2 minutes, preferably 15 seconds and 1 minute. The process can be carried out in standard frames known from positive processing and used in practice and yields perfect printing templates.
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公开(公告)号：DE3731439A1
公开(公告)日：1989-03-30
申请号：DE3731439
申请日：1987-09-18
Applicant: HOECHST AG
Abstract: The radiation-sensitive composition contains, as essential constituent, a 1,2-quinone diazide which is a polymer with repeating units of the general formula I in which R is a hydrogen or halogen atom, or a cyanide or an alkyl group, R1, R2, and R3 are identical or different and are hydrogen or halogen atoms, or optionally substituted alkyl or alkoxy groups, A are the atoms required to complete a mono- or binuclear carbocyclic or heterocyclic aromatic ring system, D is a radical containing a 1,2-quinone diazide grouping, and n + m is 2 or 3. A copying material can also be prepared from this composition. The material provides lithographic plates with a large print run.
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公开(公告)号：DE3715790A1
公开(公告)日：1988-11-24
申请号：DE3715790
申请日：1987-05-12
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS DIPL CHEM DR
Abstract: In a radiation-sensitive registration material comprising a film base and a radiation-sensitive film, the film contains a) a compound which forms strong acid on exposure to actinic radiation, b) a compound containing at least one acid-cleavable C-O-C bond, and c) a polymeric binder. On the radiation-sensitive film there is a top film which contains a polymer which can be removed together with the non-image areas during the development of the radiation-sensitive film. The top film substantially improves the shelf life of the registration material.
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Patent Agency Ranking
公开(公告)号：DE4107390A1
公开(公告)日：1992-09-10
申请号：DE4107390
申请日：1991-03-08
Applicant: HOECHST AG
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公开(公告)号：DE4004719A1
公开(公告)日：1991-08-22
申请号：DE4004719
申请日：1990-02-15
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS DIPL CHEM DR , FRASS HANS WERNER DIPL CHEM DR , GASCHLER OTFRIED DIPL ING , MOHR DIETER DIPL CHEM DR , BUHR GERHARD DIPL CHEM DR
Abstract: The invention relates to a normally positive-working radiation-sensitive composition which contains, as essential constituents, a water-insoluble binder which is soluble in aqueous alkaline solutions, a 1,2-quinone diazide and a compound which reduces the developer solubility of the exposed regions by thermal treatment. In this composition at least one urethane of the general formula I is present as the compound which reduces the developer solubility: where R1 is hydrogen or methyl, R2 is hydrogen, alkyl, optionally substituted aryl or an optionally substituted arylaminocarbonyl, R3 is an optionally substituted arylene or arylene-alkylene, Q is hydrogen, -CH4-p, CR5R6, where R5 and R6 may be identical or different and are hydrogen, alkyl or aryl, carbonyl, an oxygen or sulphur atom or sulphonyl, m is 1, 2 or 3, and n is a number >/= 1 and
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公开(公告)号：DE4003025A1
公开(公告)日：1991-08-08
申请号：DE4003025
申请日：1990-02-02
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS DIPL CHEM DR , FRASS HANS WERNER DIPL CHEM DR , MOHR DIETER DIPL CHEM DR
IPC: G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027
Abstract: The invention relates to a radiation-sensitive composition, a radiation-sensitive recording material produced therewith and a process for the production of heat- and chemical-resistant relief records using the recording material. In the normally positive-working radiation-sensitive composition containing, as essential constituents, a) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and b) a 1,2-quinone diazide and/or a combination of 1. A compound which forms strong acid when exposed to actinic radiation and 2. A compound containing at least one acid-cleavable C-O-C bond a polymer is present as polymeric binder which has a molecular weight of between 5000 and 100,000, which has a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10 mmol/g of polymer and a content of -CH3-nXn units of not less than 0.1, preferably about 0.5 to 2 mmol/g of polymer, where X stands for halogen such as chlorine, bromine or iodine and n for 1, 2 or 3. This makes available lithographic printing plates which can be thermally postcured, ensure a high print run and have good chemical resistance. It can also be used to produce photoresists with high thermal stability.
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公开(公告)号：DE3834300A1
公开(公告)日：1990-04-12
申请号：DE3834300
申请日：1988-10-08
Applicant: HOECHST AG
IPC: G03F7/004 , G03F7/022 , G03F7/105 , H01L21/027
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公开(公告)号：DE4002397A1
公开(公告)日：1991-08-01
申请号：DE4002397
申请日：1990-01-27
Applicant: HOECHST AG
Abstract: Positive-working radiation-sensitive mixt. consists of a polymeric binder, which is insol. in water but soluble in aq. alkaline solns., and a 1,2-quinone-diazide and/or a combination of a cpd. forming a strong acid where exposed to actinic radiation and a cpd. with hydrolysable C-O-C linkage(s). The binder is a polyer with (poly)hydroxyaralkyl (substd.) acrylate units of formula (I): Y = a (poly)hydroxyaralkyl gp. of formula (II): R1 = H, halogen, CN or alkyl; R2 and R3 independently = H, alkyl or aryl; R4, R5 and R6 independently = H, halogen, alkyl, alkoxy or aryl; X = the atoms needed to complete a mono- or polynuclear carbocyclic aromatic ring system; n = 1, 2 or 3. Pref. Y = 4-hydroxybenzyl, opt. with 1-4C alkyl or halogen substit(s). in the 3- and/or 5-positions; or 2-hydroxybenzyl methacrylate, opt. with a 1-4C alkyl or halogen substit. in the 3-position and/or a 1-4C alkyl, halogen or opt. alkyl-, alkoxy- or halogen-substd. aryl substit. in the 5-position. The binder also contains unit(s) of formula (III): -(-C(R7)(R8)-C(R9)(R10)-)- (III); R7 = H; R8 = H or COOH and R9 = alkyl, alkoxy, alkoxycarbonyl, acyl, acyloxy, aryl, aryloxycarbonyl, HCO, CN, COOH, OH or aminocarbonyl; esp. 1-4C alkyl, 1-8C alkoxy, 2-13C alkoxycarbonyl, 2-18C acyloxy, 6-10C aryl or 7-11C aryloxycarbonyl, in which the aryl gps. may have OH substits.; or R8 + R9 = a carboxylic anhydride gp. or opt. alkyl-substd. imide; R10 = H, halogen or alkyl.
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