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公开(公告)号：DE3718416A1
公开(公告)日：1988-12-15
申请号：DE3718416
申请日：1987-06-02
Applicant: HOECHST AG
IPC: G03C1/00 , G03C1/72 , G03F7/00 , G03F7/004 , G03F7/022 , G03F7/023 , G03F7/08 , C08L61/00 , C08K5/08 , C08K5/13 , C08K5/22
Abstract: The photosensitive composition essentially contains an ester or an amide of 1,2-naphthoquinonediazidesulphonic or -carboxylic acid as light-sensitive compound, a phenol resin which is soluble in aqueous alkaline solutions but insoluble in water, as a binder, and in addition a compound which increases the light sensitivity and is of the general formula wherein X is a single bond, CH2, SO2, S, CO, C(CH3)2, CHCCl3 or . The compounds described are, for example, 4,4'-biphenyldiol, bis-(4-hydroxyphenyl) ketone, 2,2-bis-(4-hydroxyphenyl)-propane or bis-(4-hydroxyphenyl) sulphone. The mixture is used as a layer in a light-sensitive recording material which is suitable for the production of a printing plate. Higher light sensitivity does not result in any disadvantages in the copying and printing properties.
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公开(公告)号：DE59009857D1
公开(公告)日：1995-12-14
申请号：DE59009857
申请日：1990-12-03
Applicant: HOECHST AG
Inventor： GASCHLER OTFRIED DIPL ING , ELSAESSER ANDREAS DR DIPL CHEM , MOHR DIETER DR DIPL CHEM , FRASS WERNER DR DIPL CHEM
Abstract: The invention relates to a process for the formation of negative copies in which a photosensitive or radiation-sensitive copying material comprising a layer base and a normally positive-working photosensitive or radiation-sensitive layer deposited thereon is irradiated through an image, treated thermally, irradiated over the entire surface after cooling and then developed with an alkaline developer. The thermal treatment is carried out with water or with an aqueous solution at temperatures in the range from about 50 to 100, preferably 60-90 DEG C, in the course of between about 1 second and 5 minutes, preferably 5 seconds and 1 minute, the whole-surface irradiation is carried out on the still hot copying material and the subsequent development is carried out in the course of between about 10 seconds and 2 minutes, preferably 15 seconds and 1 minute. The process can be carried out in standard frames known from positive processing and used in practice and yields perfect printing templates.
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公开(公告)号：DE19533021A1
公开(公告)日：1997-03-13
申请号：DE19533021
申请日：1995-09-07
Applicant: HOECHST AG
Inventor： BRENN GUENTER DR , DURST FRANZ PROF DR DR , ELSAESER ANDREAS DR , GASCHLER OTFRIED DIPL ING , HULTZSCH GUENTER DR , JOERG KLAUS DR
Abstract: The discontinuous matt-finish layer on a flat, radiation-sensitive recording material imaged in a contact copying process is of monodisperse particles. Application of this layer is by spraying monodisperse droplets, pref. using an appts. having a vibrator and a perforated screen with perforations of 5-250 (pref. 10-100) mu m dia..
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公开(公告)号：DE19610015A1
公开(公告)日：1997-09-18
申请号：DE19610015
申请日：1996-03-14
Applicant: HOECHST AG
Inventor： KUEHN HEINRICH , ESCHER CLAUS DR , LANDES KLAUS PROF DR , HASLBECK PETER DR , GASCHLER OTFRIED DIPL ING , MUELLER MARKUS , MUNTWYLER PETER
IPC: B05B7/22 , B41N1/00 , B41N7/04 , C23C4/134 , F24J2/48 , H05H1/42 , C23C4/14 , B01J21/04 , B01J23/70 , B21D17/04 , B24C1/06 , B41N3/00 , C23C4/02 , C23C4/06 , C23C4/10 , C23C4/18 , F24J3/00
Abstract: In a process for plasma spray coating of a substrate using a spray powder which is melted in the plasma, the powder is supplied into the region of the anode(s) or the neutrode(s) or, between these, into a channel of a plasma spray unit, one or more arcs have a length of 20 mm. or more at least intermittently and the substrate is an endless strip or a large surface of at least 0.005 (pref. at least 0.01, esp. at least 0.05) m size. Pref. the substrate consists of a metal or alloy, a plastics opt. contg. filler, a paper-contg. material, a composite material or a composite body, esp. aluminium (alloy), backed aluminium foil or a plastic (esp. polyester) foil. Pref. the coating comprises a material rich in oxide, silicate, titanate, boride, carbide, nitride, metal, metal alloy and/or inorganic pigment, esp. in aluminium oxide, spinel, titanium boride, Al, Ni (alloy) or Cu (alloy). Also claimed are: (i) a plasma spray coating appts.; and (ii) a plate for a printing machine, comprising a substrate and a plasma sprayed layer.
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Patent Agency Ranking
公开(公告)号：DE59107744D1
公开(公告)日：1996-06-05
申请号：DE59107744
申请日：1991-02-08
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS DR DIPL CHEM , FRASS HANS WERNER DR DIPL CHEM , GASCHLER OTFRIED DIPL ING , MOHR DIETER DR DIPL CHEM , BUHR GERHARD DR DIPL CHEM
Abstract: The invention relates to a normally positive-working radiation-sensitive composition which contains, as essential constituents, a water-insoluble binder which is soluble in aqueous alkaline solutions, a 1,2-quinone diazide and a compound which reduces the developer solubility of the exposed regions by thermal treatment. In this composition at least one urethane of the general formula I is present as the compound which reduces the developer solubility: where R1 is hydrogen or methyl, R2 is hydrogen, alkyl, optionally substituted aryl or an optionally substituted arylaminocarbonyl, R3 is an optionally substituted arylene or arylene-alkylene, Q is hydrogen, -CH4-p, CR5R6, where R5 and R6 may be identical or different and are hydrogen, alkyl or aryl, carbonyl, an oxygen or sulphur atom or sulphonyl, m is 1, 2 or 3, and n is a number >/= 1 and
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公开(公告)号：DE4335425A1
公开(公告)日：1995-04-20
申请号：DE4335425
申请日：1993-10-18
Applicant: HOECHST AG
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公开(公告)号：DE3879284D1
公开(公告)日：1993-04-22
申请号：DE3879284
申请日：1988-05-25
Applicant: HOECHST AG
Inventor： STAHLHOFEN DIPL-CHEM DR , GASCHLER OTFRIED DIPL ING
Abstract: Light-sensitive mixt. is based on an ester or amide of a 1,2-naphthoquinone-diazide-sulphonic or carboxylic acid as light-sensitive cpd. (I), a phenolic resin binder (II), which is soluble in aq. alkaline solns. and insol. in water, and also a cpd. (III) regulating the photosensitivity. The novelty is that (III) is a bis-(4-hydroxyphenyl) cpd. of formula (IIIa). X = a single bond or a CH2, SO2, S, CO, CMe2, CHCCl3 or cyclohexa-1,1-diyl gp.
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公开(公告)号：DE4004719A1
公开(公告)日：1991-08-22
申请号：DE4004719
申请日：1990-02-15
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS DIPL CHEM DR , FRASS HANS WERNER DIPL CHEM DR , GASCHLER OTFRIED DIPL ING , MOHR DIETER DIPL CHEM DR , BUHR GERHARD DIPL CHEM DR
Abstract: The invention relates to a normally positive-working radiation-sensitive composition which contains, as essential constituents, a water-insoluble binder which is soluble in aqueous alkaline solutions, a 1,2-quinone diazide and a compound which reduces the developer solubility of the exposed regions by thermal treatment. In this composition at least one urethane of the general formula I is present as the compound which reduces the developer solubility: where R1 is hydrogen or methyl, R2 is hydrogen, alkyl, optionally substituted aryl or an optionally substituted arylaminocarbonyl, R3 is an optionally substituted arylene or arylene-alkylene, Q is hydrogen, -CH4-p, CR5R6, where R5 and R6 may be identical or different and are hydrogen, alkyl or aryl, carbonyl, an oxygen or sulphur atom or sulphonyl, m is 1, 2 or 3, and n is a number >/= 1 and
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公开(公告)号：DE3834300A1
公开(公告)日：1990-04-12
申请号：DE3834300
申请日：1988-10-08
Applicant: HOECHST AG
IPC: G03F7/004 , G03F7/022 , G03F7/105 , H01L21/027
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