2.
    发明专利
    未知

    公开(公告)号:DK421781A

    公开(公告)日:1982-03-26

    申请号:DK421781

    申请日:1981-09-24

    Applicant: HOECHST AG

    Inventor: BOSSE D FRASS W

    Abstract: Disclosed is a light-curable mixture, comprising a light-sensitive compound comprising a diazonium salt polycondensation product or an organic azido compound; and a binder comprising a polymer at least swellable in an aqueous-alkaline solution and which comprises alkenylsulfonylurethane or cycloalkenylsulfonylurethane side groups. Also disclosed are light-sensitive copying materials prepared with the mixtures.

    5.
    发明专利
    未知

    公开(公告)号:DK136476A

    公开(公告)日:1976-09-28

    申请号:DK136476

    申请日:1976-03-26

    Applicant: HOECHST AG

    Abstract: This invention relates to a radiation-sensitive copying composition comprising a compound (1) which splits-off an acid upon irradiation and a compound (2) having at least one group selected from the group consisting of a carboxylic ortho acid ester group and a carboxylic acid amide acetal group, which composition, upon irradiation, forms an exposure product having a higher solubility in a liquid developer than the non-irradiated composition.

    HYDROPHILIC SUPPORT MATERIALS FOR OFFSET PRINTING PLATES AND PROCESS FOR MANUFACTURE AND USE THEREOF

    公开(公告)号:ZA824358B

    公开(公告)日:1983-04-27

    申请号:ZA824358

    申请日:1982-06-21

    Applicant: HOECHST AG

    Inventor: MOHR D FRASS W

    Abstract: The plate-, foil- or strip-shape support materials for offset printing plates are based on chemically, mechanically and/or electromechanically roughened aluminum, or on one of its alloys. Optionally, the aluminum may also have an aluminum oxide layer produced by anodic oxidation. One of the two surfaces the support material has a hydrophilic coating of at least one salt-type hydrophilic organic polymer which is a complex-type product obtained by reacting (a) a water-soluble organic polymer having acid functional groups containing phosphorus or sulfur (for example, polyvinylphosphonic or polyvinylsulfonic acid) with (b) a salt of an at least divalent metal cation. In a process for manufacturing this support material, the complex-type reaction product, dissolved in an aqueous acid, is applied to at least one surface of the support material and the support material thus modified is dried. It is also possible, however, to produce the complex-type reaction product of the components (a) and (b) on the support material. The support material is used in the preparation of offset printing plates having a light-sensitive layer.

Patent Agency Ranking