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公开(公告)号：HK65887A
公开(公告)日：1987-09-18
申请号：HK65887
申请日：1987-09-10
Applicant: HOECHST AG
Inventor： GEISSLER ULRICH DR , HERWIG WALTER DR , FETSCH ELISABETH
Abstract: A radiation-polymerizable mixture comprising a binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions; a radiation-activatable polymerization initiator; and a polymerizable polypropylene glycol diester with acrylic or methacrylic acid corresponding to the formula: (I) wherein R represents a hydrogen atom or a methyl group and n represents a number from 2 to 13; and a light-sensitive copying material comprising a support and a light-sensitive layer comprising a mixture of the foregoing type. The radiation-polymerizable mixture of the invention produces non-tacky layers which exhibit a low sensitivity to atmospheric oxygen and are useful as dry or liquid photoresists.
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公开(公告)号：AT17743T
公开(公告)日：1986-02-15
申请号：AT81107452
申请日：1981-09-19
Applicant: HOECHST AG
Inventor： HERWIG WALTER DR , ERBES KURT , DECKER RUDOLF , SIKORA HELGA
IPC: C08F2/00 , C08F2/48 , C08F2/50 , C08F283/00 , C08F290/00 , C08F299/00 , C08F299/06 , C08G18/00 , C08G18/67 , G03F7/032 , G03F7/10
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公开(公告)号：CH540951A
公开(公告)日：1973-08-31
申请号：CH1461870
申请日：1970-10-02
Applicant: HOECHST AG
Inventor： BRINKMANN LUDWIG DR , FREUND GUENTER DR , HERWIG WALTER DR
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公开(公告)号：CH514646A
公开(公告)日：1971-10-31
申请号：CH442669
申请日：1969-03-24
Applicant: HOECHST AG
Inventor： HERWIG WALTER DR , WEISSERMEL KLAUS DR
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公开(公告)号：CH514645A
公开(公告)日：1971-10-31
申请号：CH1498768
申请日：1968-10-08
Applicant: HOECHST AG
Inventor： BRINKMANN LUDWIG DR , FROEHLICH HELMUT DR , HERWIG WALTER DR
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Patent Agency Ranking
公开(公告)号：DE1950252A1
公开(公告)日：1971-04-15
申请号：DE1950252
申请日：1969-10-06
Applicant: HOECHST AG
Inventor： BRINKMANN LUDWIG DR , FREUND GUENTHER DR , HERWIG WALTER DR
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公开(公告)号：DE3377022D1
公开(公告)日：1988-07-14
申请号：DE3377022
申请日：1983-09-22
Applicant: HOECHST AG
Inventor： GEISSLER ULRICH DR , HERWIG WALTER DR , SIKORA HELGA
IPC: G03F7/004 , G03C1/76 , G03C1/805 , G03C11/12 , G03F7/09 , G03F7/115 , G03F7/34 , G03F7/02 , G03C1/92
Abstract: The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.
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8.发明专利
公开(公告)号：HK81087A
公开(公告)日：1987-11-06
申请号：HK81087
申请日：1987-10-29
Applicant: HOECHST AG
Inventor： HERWIG WALTER DR , ERBES KURT , DECKER RUDOLF , SIKORA HELGA
IPC: C08F2/00 , C08F2/48 , C08F2/50 , C08F283/00 , C08F290/00 , C08F299/00 , C08F299/06 , C08G18/00 , C08G18/67 , G03F7/032 , G03F7/10
Abstract: A polyurethane corresponding to the formula: (I) wherein Q is a divalent, mononuclear or dinuclear aromatic radial which is unsubstituted or is substituted by lower alkyl groups and which can contain, as a linking member, a lower alkylene group, X is one of the groups -O-Ph-Z-Ph-O- and -OOC-(CH2)y-COO-, Ph being an optionally substituted phenylene group, Z being an alkylene group having 1-4 carbon atoms and y being a number from 2 to 12, R is a hydrogen atom or a methyl group, Y is an alkylene radical having 2-6 carbon atoms, m is an integer from 4 to 50 n is an integer from 1 to 6 and o is an integer from 4 to 20 having the properties of thermolasts and being hardenable to give elastic products. It is suitable for use as a hardenable constituent of photopolymerizable materials.
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公开(公告)号：DE3268767D1
公开(公告)日：1986-03-13
申请号：DE3268767
申请日：1982-05-13
Applicant: HOECHST AG
Inventor： GEISSLER ULRICH DR , HERWIG WALTER DR , FETSCH ELISABETH
Abstract: A radiation-polymerizable mixture comprising a binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions; a radiation-activatable polymerization initiator; and a polymerizable polypropylene glycol diester with acrylic or methacrylic acid corresponding to the formula: (I) wherein R represents a hydrogen atom or a methyl group and n represents a number from 2 to 13; and a light-sensitive copying material comprising a support and a light-sensitive layer comprising a mixture of the foregoing type. The radiation-polymerizable mixture of the invention produces non-tacky layers which exhibit a low sensitivity to atmospheric oxygen and are useful as dry or liquid photoresists.
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10.发明专利
公开(公告)号：DE3266301D1
公开(公告)日：1985-10-24
申请号：DE3266301
申请日：1982-04-05
Applicant: HOECHST AG
Inventor： HERWIG WALTER DR , DECKER RUDOLF , SIKORA HELGA , ERBES KURT
IPC: B23K35/22 , C08F299/02 , C08G59/00 , C08G59/40 , C08L33/06 , G03F7/004 , G03F7/032 , G03F7/26 , H01L21/308 , H01L21/467 , H05K3/06 , H05K3/28 , G03C1/68 , G03C1/71
Abstract: A radiation-polymerizable mixture comprising a compound having at least two terminal ethylenically unsaturated groups which can form a crosslinked polymer by means of free-radical initiated addition polymerization, a polymeric binder, a radiation activatable polymerization initiator, and a compound having two epoxy groups in the molecule and a molecular weight of not more than 1,500; and a photopolymerizable copying material having a flexible transparent temporary support and a transferrable thermoplastic photopolymerizable layer comprising the above-described radiation-polymerizable mixture.
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