公开(公告)号：KR830010403A

公开(公告)日：1983-12-30

申请号：KR820001623

申请日：1982-04-13

Applicant: HOECHST AG

Inventor： HERWIG WALTER ,  SIKORA HELGA ,  DECKER RUDOLF ,  ERBES KURT

IPC: B23K35/22 ,  C08F299/02 ,  C08G59/00 ,  C08G59/40 ,  C08L33/06 ,  G03F7/004 ,  G03F7/032 ,  G03F7/26 ,  H01L21/308 ,  H01L21/467 ,  H05K3/06 ,  H05K3/28

Abstract: 내용없음

公开(公告)号：NO904115A

公开(公告)日：1991-03-22

申请号：NO904115

申请日：1990-09-20

Applicant: HOECHST AG

Inventor： EMMELIUS MICHAEL ,  HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF

IPC: G03F7/033 ,  C08F257/02 ,  C08F283/10 ,  C08G59/00 ,  C08G59/18 ,  C08G59/40 ,  C08K3/36 ,  G03F1/08 ,  G03F7/004 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  H05K3/06 ,  H05K3/28 ,  C08L25/02 ,  C08L33/00

CPC classification number: H05K3/287 ,  C08F257/02 ,  C08F283/10 ,  G03F7/004 ,  G03F7/032 ,  H05K2203/0793 ,  Y10S430/136

公开(公告)号：HK81087A

公开(公告)日：1987-11-06

申请号：HK81087

申请日：1987-10-29

Applicant: HOECHST AG

Inventor： HERWIG WALTER DR ,  ERBES KURT ,  DECKER RUDOLF ,  SIKORA HELGA

IPC: C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F283/00 ,  C08F290/00 ,  C08F299/00 ,  C08F299/06 ,  C08G18/00 ,  C08G18/67 ,  G03F7/032 ,  G03F7/10

Abstract: A polyurethane corresponding to the formula: (I) wherein Q is a divalent, mononuclear or dinuclear aromatic radial which is unsubstituted or is substituted by lower alkyl groups and which can contain, as a linking member, a lower alkylene group, X is one of the groups -O-Ph-Z-Ph-O- and -OOC-(CH2)y-COO-, Ph being an optionally substituted phenylene group, Z being an alkylene group having 1-4 carbon atoms and y being a number from 2 to 12, R is a hydrogen atom or a methyl group, Y is an alkylene radical having 2-6 carbon atoms, m is an integer from 4 to 50 n is an integer from 1 to 6 and o is an integer from 4 to 20 having the properties of thermolasts and being hardenable to give elastic products. It is suitable for use as a hardenable constituent of photopolymerizable materials.

公开(公告)号：DE3266301D1

公开(公告)日：1985-10-24

申请号：DE3266301

申请日：1982-04-05

Applicant: HOECHST AG

Inventor： HERWIG WALTER DR ,  DECKER RUDOLF ,  SIKORA HELGA ,  ERBES KURT

IPC: B23K35/22 ,  C08F299/02 ,  C08G59/00 ,  C08G59/40 ,  C08L33/06 ,  G03F7/004 ,  G03F7/032 ,  G03F7/26 ,  H01L21/308 ,  H01L21/467 ,  H05K3/06 ,  H05K3/28 ,  G03C1/68 ,  G03C1/71

Abstract: A radiation-polymerizable mixture comprising a compound having at least two terminal ethylenically unsaturated groups which can form a crosslinked polymer by means of free-radical initiated addition polymerization, a polymeric binder, a radiation activatable polymerization initiator, and a compound having two epoxy groups in the molecule and a molecular weight of not more than 1,500; and a photopolymerizable copying material having a flexible transparent temporary support and a transferrable thermoplastic photopolymerizable layer comprising the above-described radiation-polymerizable mixture.

公开(公告)号：AU541517B2

公开(公告)日：1985-01-10

申请号：AU7569781

申请日：1981-09-28

Applicant: HOECHST AG

Inventor： HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF ,  SIKORA HELGA

IPC: C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F283/00 ,  C08F290/00 ,  C08F299/00 ,  C08F299/06 ,  C08G18/00 ,  C08G18/67 ,  G03F7/032 ,  B32B15/08 ,  B32B15/18 ,  B32B15/20 ,  B32B27/08 ,  C08G18/10 ,  C08G18/14 ,  C08J7/04 ,  C08L75/08 ,  G03C1/70 ,  G03C1/78 ,  G03C1/86 ,  G03C1/94 ,  H05K1/05

Abstract: A polyurethane corresponding to the formula: (I) wherein Q is a divalent, mononuclear or dinuclear aromatic radial which is unsubstituted or is substituted by lower alkyl groups and which can contain, as a linking member, a lower alkylene group, X is one of the groups -O-Ph-Z-Ph-O- and -OOC-(CH2)y-COO-, Ph being an optionally substituted phenylene group, Z being an alkylene group having 1-4 carbon atoms and y being a number from 2 to 12, R is a hydrogen atom or a methyl group, Y is an alkylene radical having 2-6 carbon atoms, m is an integer from 4 to 50 n is an integer from 1 to 6 and o is an integer from 4 to 20 having the properties of thermolasts and being hardenable to give elastic products. It is suitable for use as a hardenable constituent of photopolymerizable materials.

公开(公告)号：ZA8106636B

公开(公告)日：1982-09-29

申请号：ZA8106636

申请日：1981-09-24

Applicant: HOECHST AG

Inventor： HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF ,  SIKORA HELGA

IPC: C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F290/00 ,  C08F299/00 ,  C08F299/06 ,  C08G18/00 ,  C08G18/67 ,  G03F7/032 ,  C08G

CPC classification number: G03F7/032 ,  C08F299/065 ,  C08G18/6705 ,  C08G18/675 ,  Y10T428/31605 ,  Y10T428/31786

公开(公告)号：CA2025831A1

公开(公告)日：1991-03-22

申请号：CA2025831

申请日：1990-09-20

Applicant: HOECHST AG

Inventor： EMMELIUS MICHAEL ,  HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF

IPC: G03F7/033 ,  C08F257/02 ,  C08F283/10 ,  C08G59/00 ,  C08G59/18 ,  C08G59/40 ,  C08K3/36 ,  G03F1/08 ,  G03F7/004 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  H05K3/06 ,  H05K3/28 ,  G03F7/40

Abstract: The present invention relates to a radiation- polymerizable mixture which includes a polymerizable compound, a polymeric binder which has units of methacrylic acid, a methacrylic acid ester and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment on a silicic acid or silicate basis, a photopolymerization initiator, a compound having at least two epoxy groups in its molecule and a thermal hardener for epoxy groups. The mixture is advantageous, in particular, for producing solder masks and can be cured after exposure to an image and development by heating to about 80 to 150.degree.C to form a stencil which is resistant under soldering conditions.

公开(公告)号：NO904115D0

公开(公告)日：1990-09-20

申请号：NO904115

申请日：1990-09-20

Applicant: HOECHST AG

Inventor： EMMELIUS MICHAEL ,  HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF

IPC: G03F7/033 ,  C08F257/02 ,  C08F283/10 ,  C08G59/00 ,  C08G59/18 ,  C08G59/40 ,  C08K3/36 ,  G03F1/08 ,  G03F7/004 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  H05K3/06 ,  H05K3/28 ,  C08L

Abstract: A description is given of a radiation-polymerisable composition which contains a polymerisable compound, a polymeric binder containing units of methacrylic acid, a methacrylate and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment with a silicic acid or silicate base, a photopolymerisation initiator, a compound containing at least two epoxy groups in the molecule and a thermal hardener for epoxy groups. The composition is suitable in particular for producing solder resist masks and, after exposure to an image and development, can be cured by heating to 80 to 150 DEG C to form a template which is resistant under soldering conditions.

公开(公告)号：FI904605A0

公开(公告)日：1990-09-19

申请号：FI904605

申请日：1990-09-19

Applicant: HOECHST AG

Inventor： EMMELIUS MICHAEL ,  HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF

IPC: G03F7/033 ,  C08F257/02 ,  C08F283/10 ,  C08G59/00 ,  C08G59/18 ,  C08G59/40 ,  C08K3/36 ,  G03F1/08 ,  G03F7/004 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  H05K3/06 ,  H05K3/28 ,  C08L

Abstract: A description is given of a radiation-polymerisable composition which contains a polymerisable compound, a polymeric binder containing units of methacrylic acid, a methacrylate and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment with a silicic acid or silicate base, a photopolymerisation initiator, a compound containing at least two epoxy groups in the molecule and a thermal hardener for epoxy groups. The composition is suitable in particular for producing solder resist masks and, after exposure to an image and development, can be cured by heating to 80 to 150 DEG C to form a template which is resistant under soldering conditions.

公开(公告)号：AU548860B2

公开(公告)日：1986-01-02

申请号：AU8250582

申请日：1982-04-08

Applicant: HOECHST AG

Inventor： HERWIG WALTER ,  DECKER RUDOLF ,  SIKORA HELGER ,  ERBES KURT

IPC: B23K35/22 ,  C08F299/02 ,  C08G59/00 ,  C08G59/40 ,  C08L33/06 ,  G03F7/004 ,  G03F7/032 ,  G03F7/26 ,  H01L21/308 ,  H01L21/467 ,  H05K3/06 ,  H05K3/28 ,  C08F265/06 ,  C08F2/50 ,  C08F283/00

Abstract: A radiation-polymerizable mixture comprising a compound having at least two terminal ethylenically unsaturated groups which can form a crosslinked polymer by means of free-radical initiated addition polymerization, a polymeric binder, a radiation activatable polymerization initiator, and a compound having two epoxy groups in the molecule and a molecular weight of not more than 1,500; and a photopolymerizable copying material having a flexible transparent temporary support and a transferrable thermoplastic photopolymerizable layer comprising the above-described radiation-polymerizable mixture.