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    POSITIVE PROCESSING IRRADIATION SENSITIVE MIXTURE AND IRRADIATION SENSITIVE COPYING MATERIAL MANUFACTURED FROM THE SAME
    2.
    发明专利
    POSITIVE PROCESSING IRRADIATION SENSITIVE MIXTURE AND IRRADIATION SENSITIVE COPYING MATERIAL MANUFACTURED FROM THE SAME 失效

    公开(公告)号：JPH03103856A

    公开(公告)日：1991-04-30

    申请号：JP23885790

    申请日：1990-09-07

    Applicant: HOECHST AG

    Inventor： GEORUKU PAUROUSUKII ,  HANSUUYOAHIMU MEREMU ,  YURUGEN RINGUNAU ,  RARUFU DAMERU ,  HORUSUTO REESHIERUTO

    IPC: G03F7/039 ,  G03F7/004 ,  G03F7/016 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE: To stabilize a compound capable of forming an acid by photochemical decomposition on a substrate and to eliminate corrosive action as a photochemical product by incorporating the compound to be allowed to form an acid by irradiation, a compound to be cleft by an acid, and a binder insoluble in water but soluble in an aqueous solution of alkali as specified constituents. CONSTITUTION: This radiation sensitive mixture comprises the compound to be allowed to form a strong acid by irradiation with by active rays, the compound having a -C-O-C- or -C-O-Si-bond to be cleft by acid, and the binder insoluble in water but soluble in an aqueous solution of alkali. The compound to be allowed to form a strong acid by the irradiation is an α-carbonyl-α- sulfonyl-diazomethane compound represented by formula I in which each of R and R is an optionally substituted alkyl or cycloalkyl or aryl group, this permitting the obtained mixture to be high in sensitivity in a wide spectral region and in thermal stability and not to produce any corrosive photochemical decomposition product at all.

    POSITIVE RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL MANUFACTURED BY USING MIXTURE THEREOF
    3.
    发明专利
    POSITIVE RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL MANUFACTURED BY USING MIXTURE THEREOF 失效

    公开(公告)号：JPH075689A

    公开(公告)日：1995-01-10

    申请号：JP5456494

    申请日：1994-02-28

    Applicant: HOECHST AG

    Inventor： HORUSUTO REESHIERUTO ,  GEORUKU PAUROUSUKII

    IPC: C07D271/12 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/029 ,  G03F7/033

    Abstract: PURPOSE: To generate acid having high thermal stability, high resolution and high sensitivity and having no corrosive action as a photoreaction product by incorporating a compound forming acid when exposed to radiation, a compound having bonds such as C-O-C that can be cleft by acid, and a polymer binder that can be insoluble to water but soluble to aqu. solution of alkali. CONSTITUTION: The mixture contains a) a compound forming acid when exposed to chemical ray radiation, b) a compound containing a C-O-C or C-O-Si bond that can be cleft by acid, and c) a polymer binder that is insoluble to water but soluble to or swelled in aqu. solution of alkali. The compound a) is indicated by the formula. In the formula, S represents 1 to 20C acyclic, homocyclic and heterocyclic groups, EWG represents an electron withdrawing group, R represents 1 to 20C acyclic, homocyclic and heterocyclic groups, W is 0, 1 or 2, and X is an integer of 1∼5.

    MODIFYING POLY(HYDROXYSTYRENE) AS ORIENTATION FILM FOR LIQUID-CRYSTAL DISPLAY
    8.
    发明专利
    MODIFYING POLY(HYDROXYSTYRENE) AS ORIENTATION FILM FOR LIQUID-CRYSTAL DISPLAY 失效

    公开(公告)号：JPH06194669A

    公开(公告)日：1994-07-15

    申请号：JP20083693

    申请日：1993-08-12

    Applicant: HOECHST AG

    Inventor： HORUSUTO REESHIERUTO ,  NORUBERUTO REESHIYU

    IPC: C08K5/00 ,  C08K5/15 ,  C08K5/35 ,  C08L25/00 ,  C08L25/18 ,  C09D125/18 ,  G02F1/1337

    Abstract: PURPOSE: To prepare an oriented film which is capable of providing a liquid crystal display with excellent liquid crystal orientation, high contrast and high transmissivity in a bright state and further enables the manufacture of a very stable liquid crystal switching/display device by using a modified poly(hydroxystyrene) as a constituent material of the orient film for the liquid crystal display. CONSTITUTION: This oriented film for a liquid crystal display contains: (a) a poly(hydroxystyrene) produced from a monomer represented by the formula (in the formula: R is H, CH3 , F or Cl; and each of R and R is H, R , OR , SR , OH, F, Cl, Br, NO2 , a phenyl group or CH2 X, independently from the other, wherein R is a 1-6C straight chain or branched chain alkyl group whose at least one hydrogen atom is optionally substituted by a fluorine atom and X is p-tosylate, 2-mesitylate, mesylate or triflate group, or OOC-CH3 , OH, Cl or Br); and (b) at least one compound selected from among macrocyclic compounds, cryptands, coronands, podands, mercapto compounds and ionophores.

    POSITIVE PROCESSING IRRADIATION SENSITIVE MIXTURE AND IRRADIATION SENSITIVE COPYING MATERIAL MANUFACTURED FROM THE SAME
    9.
    发明专利
    POSITIVE PROCESSING IRRADIATION SENSITIVE MIXTURE AND IRRADIATION SENSITIVE COPYING MATERIAL MANUFACTURED FROM THE SAME 失效

    公开(公告)号：JPH03103854A

    公开(公告)日：1991-04-30

    申请号：JP23885890

    申请日：1990-09-07

    Applicant: HOECHST AG

    Inventor： GEORUKU PAUROUSUKII ,  HANSUUYOAHIMU MEREMU ,  YURUGEN RINGUNAU ,  RARUFU DAMERU ,  HORUSUTO REESHIERUTO

    IPC: G03F7/039 ,  G03F7/004 ,  G03F7/016 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE: To stabilize a compound capable of forming an acid by photochemical decomposition on a substrate and to eliminate corrosive action as a photochemical product by incorporating the compound to be allowed to form an acid by irradiation, a compound to be cleft by an acid, and a binder insoluble in water but soluble in an aqueous solution of alkali as specified constituents. CONSTITUTION: This radiation sensitive mixture comprises the compound to be allowed to form a strong acid by irradiation with by active rays, the compound having a -C-O-C- or -C-O-Si-bond to be cleft by acid, and the binder insoluble in water but soluble in an aqueous solution of alkali. The compound to be allowed to form a strong acid by the irradiation is an α-, α-bis(sulfonyl)- diazomethane compound represented by formula I in which R is a desirable substituent, such as an alkyl or cycloalkyl or aryl group, thus permitting the obtained mixture to be high in sensitivity in a wide spectral region and heat stability and to produce no corrosive photochemical reaction product.

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