公开(公告)号：ZA9201510B

公开(公告)日：1992-10-28

申请号：ZA9201510

申请日：1992-02-28

Applicant: HOECHST AG

Inventor： PRZYBILLA KLAUS JUERGEN ,  KLAUS JUERGEN PRZYBILLA ,  DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI

IPC: C07C69/96 ,  C08F20/30 ,  G03F7/039 ,  C07C ,  C07D ,  G03F ,  H01L

CPC classification number: C07C69/96 ,  C08F20/30 ,  G03F7/039 ,  Y02P20/55

公开(公告)号：BR9602169A

公开(公告)日：1998-01-13

申请号：BR9602169

申请日：1996-05-06

Applicant: HOECHST AG

Inventor： GRIES WILLI-KURT ,  KONRAD KLAUS-PETER ,  PRZYBILLA KLAUS JUERGEN ,  SCHLOSSER HANS-JOACHIM

IPC: G03F7/004 ,  G03F7/00 ,  G03F7/021 ,  G03F7/032 ,  G03F7/075 ,  B41N1/08

Abstract: Radiation-sensitive recording material (I) comprises (A) a substrate, (B) a radiation-sensitive layer contg. a diazonium salt-polycondensation prod. and (C) an outer silicone layer. (B) also contains 3-50 wt% of a mineral acid. Also claimed is a process for the prodn. of a waterless offset printing plate, by irradiating material (I) to form an image and then developing with water.

公开(公告)号：ZA921510B

公开(公告)日：1992-10-28

申请号：ZA921510

申请日：1992-02-28

Applicant: HOECHST AG

Inventor： PRZYBILLA KLAUS JUERGEN ,  KLAUS JUERGEN PRZYBILLA ,  DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI

IPC: C07C69/96 ,  C08F20/30 ,  G03F7/039 ,  C07C ,  C07D ,  G03F ,  H01L