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    Negative-working radiation-sensitive mixt. - contg. reactive binder with 2,2,2-tri:fluoro-1-hydroxy-1-tri:fluoro-methyl-ethyl gps., photo-acid and crosslinking cpd., useful e.g. as photoresist
    2.
    发明专利
    Negative-working radiation-sensitive mixt. - contg. reactive binder with 2,2,2-tri:fluoro-1-hydroxy-1-tri:fluoro-methyl-ethyl gps., photo-acid and crosslinking cpd., useful e.g. as photoresist 未知

    公开(公告)号：DE4207264A1

    公开(公告)日：1993-09-09

    申请号：DE4207264

    申请日：1992-03-07

    Applicant: HOECHST AG

    Inventor： PRZYBILLA KLAUS-JUERGEN DR ,  PAWLOWSKI GEORG DR ,  ROESCHERT HORST DR

    IPC: C08K5/00 ,  C08L25/18 ,  G03F7/004 ,  H01L21/308

    Abstract: Negative-working radiation-sensitive mixt. contains a photo-acid (I), a cpd. (II) with at least 2 gps. crosslinked by acid and a polymeric binder (III), which is insol. in water but dissolves or at least swells in aq. alkaline soln. The improvement is that (III) contains at least 10 wt.percent 2,2,2-trifluoro-1- trifluoromethyl-ethyl (IV) gps. USE/ADVANTAGE - The mixt. is used in recording material and as photoresist in the prodn. of reliefs or structurisation of wafers (claimed). It is suitable for making printing plates or etched mouldings. Suitable substrates include capacitor, semiconductor, laminated PCB and IC materials, esp. Si substrates, Si3N4, GaAs, InP, substrates used in LCD prodn., e.g. glass and ITO, metal plates and foils, esp. Al printing plates, metallised insulating films and papers. The OH gp. of (IV) is nucleophilic enough to crosslink with (II) in the presence of acid, with reactivity similar to that of phenolic OH gps. The mixt. is highly resistant to heat and plasma etching and also has excellent lithographic properties, allowing resolution into the half-micron or in pt. the sub-half-micron range. It is sensitive to a wide range of short-wave visible light and UV radiation in the 190-340 nm range and also to electron and x-radiation and has esp. high sensitivity for UV2 radiation (220-300, esp. 248 nm). It gives accurate reproductions and the resists have steep sid

    3.
    发明专利
    未知

    公开(公告)号：DE4112971A1

    公开(公告)日：1992-10-22

    申请号：DE4112971

    申请日：1991-04-20

    Applicant: HOECHST AG

    Inventor： ROESCHERT HORST DR ,  PAWLOWSKI GEORG DR ,  FUCHS JUERGEN

    IPC: C07D251/24 ,  C07D251/34 ,  G03C1/73 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033

    Abstract: The invention relates to a 2,4,6-tris(2-hydroxyethoxy)- 1,3,5-triazine esterified by two or three (hetero)arylsulphonic acids and a radiation-sensitive positive-working material prepared therewith, which is distinguished by a high resolution and a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and on exposure to light forms no corrosive photolysis products. The invention furthermore relates to a radiation-sensitive recording material prepared therefrom, which is suitable for the preparation of photoresists, electronic components, printing plates, or for etching moulded parts.

    4.
    发明专利
    未知

    公开(公告)号：DE4112969A1

    公开(公告)日：1992-10-22

    申请号：DE4112969

    申请日：1991-04-20

    Applicant: HOECHST AG

    Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  ECKES CHARLOTTE DIPL ING

    IPC: C09K9/02 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: A radiation-sensitive mixture is described which contains sulphonic acid derivatives of the general formula I in which R denotes an alkyl, haloalkyl or aryl radical, R denotes a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R -SO2-O-)nX-, R denotes a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl or heteroylenedialkyl group, an alkylene, alkenylene, alkynylene, cycloalkylene or arylene group, X denotes an alkyl, cycloalkyl or aryl group R -SO2-O-substituted by 1 to 3 sulphonyloxy groups, Y denotes O, S, CO, CO-O, SO2, SO2-O, NR , CO-NH, O-CO-NR , NH-CO-NR or NR -CO-O, Z denotes 0, CO-NR , O-CO-NR or NH-CO-NR , R denotes an acyl radical, R denotes a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, R denotes an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, k denotes an integer from 0 to 4, m denotes an integer greater than 1 and n denotes an integer from 1 to 3, where R and Y can have identical or different meanings in repeating groups (R -Y-). On irradiation, the compounds form sulphonic acids and can be cleaved by means of these. In combination with alkali-soluble binders, they give positive-working mixtures, which are used, in particular, in recording materials for UV radiation and energy-rich radiations. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.

    Acid-cleavable radiation-sensitive compounds radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom
    5.
    发明专利
    Acid-cleavable radiation-sensitive compounds radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom 未知

    公开(公告)号：HK18996A

    公开(公告)日：1996-02-09

    申请号：HK18996

    申请日：1996-02-01

    Applicant: HOECHST AG

    Inventor： PAWLOWSKI GEORGE DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  ECKES DI CHARLOTTE

    IPC: C07C309/65 ,  C07C309/66 ,  C09K9/02 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: A radiation-sensitive mixture is described which contains sulphonic acid derivatives of the general formula I in which R denotes an alkyl, haloalkyl or aryl radical, R denotes a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R -SO2-O-)nX-, R denotes a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl or heteroylenedialkyl group, an alkylene, alkenylene, alkynylene, cycloalkylene or arylene group, X denotes an alkyl, cycloalkyl or aryl group R -SO2-O-substituted by 1 to 3 sulphonyloxy groups, Y denotes O, S, CO, CO-O, SO2, SO2-O, NR , CO-NH, O-CO-NR , NH-CO-NR or NR -CO-O, Z denotes 0, CO-NR , O-CO-NR or NH-CO-NR , R denotes an acyl radical, R denotes a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, R denotes an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, k denotes an integer from 0 to 4, m denotes an integer greater than 1 and n denotes an integer from 1 to 3, where R and Y can have identical or different meanings in repeating groups (R -Y-). On irradiation, the compounds form sulphonic acids and can be cleaved by means of these. In combination with alkali-soluble binders, they give positive-working mixtures, which are used, in particular, in recording materials for UV radiation and energy-rich radiations. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.

    Radiation-sensitive mixture, and recording material produced therewith
    7.
    发明专利
    Radiation-sensitive mixture, and recording material produced therewith 未知

    公开(公告)号：DE4305261A1

    公开(公告)日：1994-08-25

    申请号：DE4305261

    申请日：1993-02-20

    Applicant: HOECHST AG

    Inventor： ROESCHERT HORST DR ,  PAWLOWSKI GEORG DR ,  SPIES WALTER DR ,  WENGENROTH HORST DR

    IPC: G03F7/038 ,  G03F7/039

    Abstract: The invention relates to a radiation-sensitive mixture containing a) a binder which is insoluble in water, but is soluble, at least swellable, in aqueous-alkaline solution, b) a compound which forms a strong acid on exposure to actinic radiation, and c) either, for a positive-working mixture, a compound which contains at least one C-O-C or C-O-Si bond which can be cleaved by this acid or, for a negative-working mixture, a compound containing at least two acid-crosslinkable groups, which is characterised in that it additionally contains from 0.01 to 20 % by weight, based on the total weight of compounds a), b) and c), of an additive of the formula I . The invention furthermore relates to a recording material comprising a support (carrier, substrate, base) and a radiation-sensitive coating. The mixture can be used in the production of electronic components, in particular integrated circuits.

    9.
    发明专利
    未知

    公开(公告)号：DE4222968A1

    公开(公告)日：1994-01-20

    申请号：DE4222968

    申请日：1992-07-13

    Applicant: HOECHST AG

    Inventor： WENGENROTH HORST DR ,  ROESCHERT HORST DR ,  SPIES WALTER DR ,  PAWLOWSKI GEORG DR ,  BUHR GERHARD DR

    IPC: G03F7/004 ,  G03F7/022 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  C08L101/02

    Abstract: The invention relates to a radiation-sensitive mixture with: a) an at least swellable binder which is insoluble in water but soluble in an aqueous-alkaline solution; b) a compound which forms an acid under the effect of actinic radiation; and c) a compound containing at least one C-O-C or C-O-Si bond which can be dissociated by an acid; which also contains at least one compound with at least one nitrogen atom in an amine or amide bond in the proportion of 0.1 to 70 mol % in relation to the maximum quantity of acid which can theoretically be generated from compound b). The content of this compound with at lest one nitrogen atom in an amine or amide bond is preferably 0.5 to 50 and especially preferably 1 to 40 mol % in relation to the maximum quantity of acid which can be theoretically generated from compound b). The boiling point of the compound at normal pressure is over 100 DEG C, preferably above 150 and especially preferably above 180 DEG C. The mixture is particularly applicable to the production of electronic components. The invention also concerns a recording material with a substrate and a radiation-sensitive coating.

    10.
    发明专利
    未知

    公开(公告)号：DE4125042A1

    公开(公告)日：1993-02-04

    申请号：DE4125042

    申请日：1991-07-29

    Applicant: HOECHST AG

    Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  MEIER WINFRIED DIPL ING ,  SPIESS WALTER DR ,  PRZYBILLA KLAUS-JUERGEN DR

    IPC: G03F7/00 ,  C04B41/50 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027

    Abstract: The invention relates to a negative-working radiation-sensitive mixture containing a) a compound containing at least one -CBr3 group bonded to an atom which is not itself bonded to a hydrogen atom, b) an alkoxymethylated melamine and c) a polymeric binder containing phenolic OH groups which is insoluble in water, but soluble or at least swellable in aqueous-alkaline solutions, which is characterised in that (1) it has an absorption of at 248 nm, (2) the CBr3 group of compound a) is bonded to the sulphur atom of a sulphonyl group and compound a) is present in the mixture in an amount of from 0.2 to 10 % by weight, based on the total amount of components b) and c), (3) the ratio by weight between components b) and c) is between 50 : 50 and 5 : 95, and (4) component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, where the homopolymer or copolymer has a material removal rate of from 200 to 3,000 nm/min at 21 DEG C in an aqueous-alkaline developer containing 2.38 % by weight of tetramethylammonium hydroxide. n

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