公开(公告)号：HK18996A

公开(公告)日：1996-02-09

申请号：HK18996

申请日：1996-02-01

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORGE DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  ECKES DI CHARLOTTE

IPC: C07C309/65 ,  C07C309/66 ,  C09K9/02 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation-sensitive mixture is described which contains sulphonic acid derivatives of the general formula I in which R denotes an alkyl, haloalkyl or aryl radical, R denotes a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R -SO2-O-)nX-, R denotes a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl or heteroylenedialkyl group, an alkylene, alkenylene, alkynylene, cycloalkylene or arylene group, X denotes an alkyl, cycloalkyl or aryl group R -SO2-O-substituted by 1 to 3 sulphonyloxy groups, Y denotes O, S, CO, CO-O, SO2, SO2-O, NR , CO-NH, O-CO-NR , NH-CO-NR or NR -CO-O, Z denotes 0, CO-NR , O-CO-NR or NH-CO-NR , R denotes an acyl radical, R denotes a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, R denotes an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, k denotes an integer from 0 to 4, m denotes an integer greater than 1 and n denotes an integer from 1 to 3, where R and Y can have identical or different meanings in repeating groups (R -Y-). On irradiation, the compounds form sulphonic acids and can be cleaved by means of these. In combination with alkali-soluble binders, they give positive-working mixtures, which are used, in particular, in recording materials for UV radiation and energy-rich radiations. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.

公开(公告)号：DE4125042A1

公开(公告)日：1993-02-04

申请号：DE4125042

申请日：1991-07-29

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  MEIER WINFRIED DIPL ING ,  SPIESS WALTER DR ,  PRZYBILLA KLAUS-JUERGEN DR

IPC: G03F7/00 ,  C04B41/50 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027

Abstract: The invention relates to a negative-working radiation-sensitive mixture containing a) a compound containing at least one -CBr3 group bonded to an atom which is not itself bonded to a hydrogen atom, b) an alkoxymethylated melamine and c) a polymeric binder containing phenolic OH groups which is insoluble in water, but soluble or at least swellable in aqueous-alkaline solutions, which is characterised in that (1) it has an absorption of at 248 nm, (2) the CBr3 group of compound a) is bonded to the sulphur atom of a sulphonyl group and compound a) is present in the mixture in an amount of from 0.2 to 10 % by weight, based on the total amount of components b) and c), (3) the ratio by weight between components b) and c) is between 50 : 50 and 5 : 95, and (4) component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, where the homopolymer or copolymer has a material removal rate of from 200 to 3,000 nm/min at 21 DEG C in an aqueous-alkaline developer containing 2.38 % by weight of tetramethylammonium hydroxide. n

公开(公告)号：DE4006190A1

公开(公告)日：1991-08-29

申请号：DE4006190

申请日：1990-02-28

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  MEIER WINFRIED DIPL ING

IPC: G03F7/004 ,  C07D233/84 ,  G03F7/016 ,  G03F7/038 ,  H01L21/027

Abstract: A description is given of a negative-working radiation-sensitive composition which contains as essential constituents a) a compound which forms a strong acid on irradiation and has the general formula where R is a radical R -SO2- or R -C(O)-, R and R are, independently of one another, an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical, b) a compound containing at least two acid-crosslinkable reactive groups, and c) a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solutions. The radiation-sensitive composition according to the invention is notable for a high sensitivity over a wide spectral range. It also has high thermal stability and does not form corrosive photolysis products on exposure to light.

公开(公告)号：HK123597A

公开(公告)日：1997-09-12

申请号：HK123597

申请日：1997-06-26

Applicant: HOECHST AG

Inventor： DAMMEL RALPH DR ,  DOESSEL KARL-FRIEDRICH DR ,  LINGNAU JUERGEN DR ,  THEIS JUERGEN DR

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：DE58909782D1

公开(公告)日：1997-04-10

申请号：DE58909782

申请日：1989-06-16

Applicant: HOECHST AG

Inventor： DAMMEL RALPH DR ,  DOESSEL KARL-FRIEDRICH DR ,  LINGNAU JUERGEN DR ,  THEIS JUERGEN DR

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：HK25396A

公开(公告)日：1996-02-16

申请号：HK25396

申请日：1996-02-08

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  CHARLOTTE ECKES DI

IPC: C07D207/408 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  C07D207/40 ,  C07D207/404 ,  C07D207/44 ,  C07D207/452 ,  C07D317/24 ,  C09K9/02 ,  G03F7/004

Abstract: A radiation-sensitive mixture is described which contains compounds of the general formula I in which R denotes an alkyl, highly fluorinated alkyl, perfluoroalkyl or aryl radical, R denotes a hydrogen atom, an alkyl or aryl radical, one of the groups (R -SO2-O-)nX- or R O-, R and R are identical or different and denote alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals in which 1 to 3 aliphatic CH2 or CH groups can be replaced by NR , O, S, CO, CO-O, CO-NH, O-CO-NH, CO-NH-CO, NH-CO-NH, SO2, SO2-O, SO2-NH; or alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals or are connected with one another to give a heterocyclic ring, R denotes an acyl radical, X denotes an alkyl, cycloalkyl or aryl group, R -SO2-O-substituted by 1 to 3 sulphonyloxy groups and n denotes an integer from 1 to 3. On irradiation, the compounds form sulphonic acids and can be cleaved by these. In combination with alkali-soluble binders, they give positive-working mixtures which are used, in particular, in recording materials for UV radiation and energy-rich radiation. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.

公开(公告)号：DE4112969A1

公开(公告)日：1992-10-22

申请号：DE4112969

申请日：1991-04-20

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  ECKES CHARLOTTE DIPL ING

IPC: C09K9/02 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation-sensitive mixture is described which contains sulphonic acid derivatives of the general formula I in which R denotes an alkyl, haloalkyl or aryl radical, R denotes a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R -SO2-O-)nX-, R denotes a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl or heteroylenedialkyl group, an alkylene, alkenylene, alkynylene, cycloalkylene or arylene group, X denotes an alkyl, cycloalkyl or aryl group R -SO2-O-substituted by 1 to 3 sulphonyloxy groups, Y denotes O, S, CO, CO-O, SO2, SO2-O, NR , CO-NH, O-CO-NR , NH-CO-NR or NR -CO-O, Z denotes 0, CO-NR , O-CO-NR or NH-CO-NR , R denotes an acyl radical, R denotes a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, R denotes an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, k denotes an integer from 0 to 4, m denotes an integer greater than 1 and n denotes an integer from 1 to 3, where R and Y can have identical or different meanings in repeating groups (R -Y-). On irradiation, the compounds form sulphonic acids and can be cleaved by means of these. In combination with alkali-soluble binders, they give positive-working mixtures, which are used, in particular, in recording materials for UV radiation and energy-rich radiations. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.

公开(公告)号：HK143196A

公开(公告)日：1996-08-09

申请号：HK143196

申请日：1996-08-01

Applicant: HOECHST AG

Inventor： DOESSEL KARL-FRIEDRICH DR ,  DAMMEL RALPH DR ,  LINGNAU JUERGEN DR

IPC: G03C1/72 ,  C07C39/367 ,  C07C43/225 ,  C07C43/313 ,  C07C43/315 ,  C07C69/16 ,  C07C69/78 ,  C07C69/96 ,  C07F7/18 ,  G03F7/004 ,  G03F7/26 ,  H01L21/027

Abstract: Positive-working radiation-sensitive composition which contains a compound which forms an acid when exposed to high-energy radiation, and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aromatically bound chlorine or bromine and has a pKa of less than 12 or is a derivative of a compound having such a pKa. The claimed composition, in particularly the copying material produced therefrom, has a higher sensitivity and an improved resolution and exhibits, in addition, no image haze after development.

公开(公告)号：DE59203169D1

公开(公告)日：1995-09-14

申请号：DE59203169

申请日：1992-04-09

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  ECKES DI CHARLOTTE

IPC: C07D207/408 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  C07D207/40 ,  C07D207/404 ,  C07D207/44 ,  C07D207/452 ,  C07D317/24 ,  C09K9/02 ,  G03F7/004

Abstract: A radiation-sensitive mixture is described which contains compounds of the general formula I in which R denotes an alkyl, highly fluorinated alkyl, perfluoroalkyl or aryl radical, R denotes a hydrogen atom, an alkyl or aryl radical, one of the groups (R -SO2-O-)nX- or R O-, R and R are identical or different and denote alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals in which 1 to 3 aliphatic CH2 or CH groups can be replaced by NR , O, S, CO, CO-O, CO-NH, O-CO-NH, CO-NH-CO, NH-CO-NH, SO2, SO2-O, SO2-NH; or alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals or are connected with one another to give a heterocyclic ring, R denotes an acyl radical, X denotes an alkyl, cycloalkyl or aryl group, R -SO2-O-substituted by 1 to 3 sulphonyloxy groups and n denotes an integer from 1 to 3. On irradiation, the compounds form sulphonic acids and can be cleaved by these. In combination with alkali-soluble binders, they give positive-working mixtures which are used, in particular, in recording materials for UV radiation and energy-rich radiation. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.

公开(公告)号：DE59201316D1

公开(公告)日：1995-03-16

申请号：DE59201316

申请日：1992-04-09

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG DR ,  DAMMEL RALPH DR ,  ROESCHERT HORST DR ,  SPIESS WALTER DR ,  ECKES DI CHARLOTTE

IPC: C09K9/02 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation-sensitive mixture is described which contains sulphonic acid derivatives of the general formula I in which R denotes an alkyl, haloalkyl or aryl radical, R denotes a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R -SO2-O-)nX-, R denotes a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl or heteroylenedialkyl group, an alkylene, alkenylene, alkynylene, cycloalkylene or arylene group, X denotes an alkyl, cycloalkyl or aryl group R -SO2-O-substituted by 1 to 3 sulphonyloxy groups, Y denotes O, S, CO, CO-O, SO2, SO2-O, NR , CO-NH, O-CO-NR , NH-CO-NR or NR -CO-O, Z denotes 0, CO-NR , O-CO-NR or NH-CO-NR , R denotes an acyl radical, R denotes a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, R denotes an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, k denotes an integer from 0 to 4, m denotes an integer greater than 1 and n denotes an integer from 1 to 3, where R and Y can have identical or different meanings in repeating groups (R -Y-). On irradiation, the compounds form sulphonic acids and can be cleaved by means of these. In combination with alkali-soluble binders, they give positive-working mixtures, which are used, in particular, in recording materials for UV radiation and energy-rich radiations. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.